SymposiumOrganizerSymposium TitleLink
Symposium AOrganizers:
Seiji Nagahara (Tokyo Electron)
Tomoki Nagai (JSR)
Shinji Okazaki (ALITECS)
Takahiro Kozawa (Osaka Univ.)
EUVL Stochastics Symposium: Overcoming the Challenge of
Stochastics for High Resolution EUV Lithography

For the future EUV lithography for fine patterns including high
NA EUV lithography, EUV induced stochastics issues are still one
of the biggest concerns for reliable patterning for future
semiconductor devices. This EUVL Stochastics Symposium will
highlight the challenges and solutions for stochastics issues for
the future EUV lithography. The symposium will deal with EUV
stochastics from a variety of aspects such as exposure tools,
resist materials, processes, masks, resist stochastics models and
simulations. In addition to the invited talks, the symposium has
an panel discussion by leading experts in the field for further
discussion of the topics.
Symposium BOrganizers:
Daiyu Kondo (Fujitsu)
Atsushi Ando (AIST)
Forefront of low-dimensional nanomaterials
for future applications

Low dimensional nanomaterials including graphene, carbon nanotubes, fullerene, and TMDCs have attracted a great deal of public and academic attentions due to their own characteristic structures and/or physical properties for last few decades. Here, we select the front of the research of these materials for  future applications as a focus area. In this symposium, the latest achievements on low dimensional materials will be  introduced by five invited speakers.

Symposium COrganizer:
Kazuaki Furukawa (Meisei Univ.)
Biological Phenomena and Functions within
Micro- and Nanospace

Thanks to the downsizing of medical devices, we have benefited
in our daily life: thinner needle reduces pain in injection, Lab on a
Chip technology reduces an amount of sample for medical check.
In this symposium, we focus on cutting-edge biological research
in combination with micro and nanostructures. Some new aspects
in biological phenomena within such small spaces will be introduced
by four invited speakers. They must be essential to further developments
in biological devices and applications.
Symposium DOrganizer:
Koji Asakawa (KIOXIA)
Enhancing technology for next generation

The performance of semiconductors has been boosted by on-going reduction of their fabrication sizes.   However, it is realized not only by reduction in lithographic resolution but also strongly by peripheral technologies such as multiple pattering, pattern transfer techniques and high etch durability materials.  This symposium focuses on the emerging materials and technologies that empowers the conventional methods to be finer, harder, and more precise for device fabrication.