Symposium D

Enhancing Technology for Next Generation Lithography
Organizer: Koji Asakawa (KIOXIA)

Invited Speaker's Name and AffiliationPaper TitleShort Biography
Prof. Teruaki Hayakawa, NIMS and Tokyo Tech., Japan
Prof. Takuya Isono, Hokkaido Univ., Japan
Post-Polymerization Modification of PS-b-PMMA: A Strategy for Fine-Tuning the Microphase-Separated NanostructuresTakuya Isono is an Associate Professor at Faculty of Engineering, Hokkaido University, Japan. He received his Ph.D. degree from Graduate School of Chemical Sciences and Engineering, Hokkaido University in 2014, majoring in polymer chemistry. He then started his research career as an Assistant Professor at Hokkaido University, and since April 2021, he has been in the current position. His research interests are centered on the precise polymer synthesis and are focused mainly on the development of novel block copolymer materials for various applications, such as drug delivery, stretchable organic devices, and nanopatterning.
Dr. Katie lutker-Lee, TEL Technology Center, America, USA
Leveraging Selective Deposition to Enable Next Generation EUV Lithography and Novel Patterning IntegrationKatie received her BS Chem at the University of Michigan and her PhD in physical chemistry from the University of California, Berkeley. She joined Tokyo Electron in 2014 and is currently a senior process engineer at TEL Technology Center, America specializing in BEOL dielectric and patterning plasma etch. Her current focus is developing processes to support the next generation of chip development.
Prof. Masaru Nakagawa, Tohoku Univ., Japan
UV nanoimprint lithography with laser-drilled screen printing, fluorescence alignment, and hybridized resist materials.Masaru Nakagawa received his Doctor of Engineering degree in 1997 from Sophia University. He worked at Tokyo Institute of Technology as an assistant professor (1997–2002) and an associate professor (2002–2008). Since 2008, he has been a full professor of Tohoku University. He was the Steering Committee Chair of a research group of Single-Nanometer Figuration and the Structure-Induced Property in The Japan Society of Applied Physics (2015-2020). He is now the manager of center at Materials–Measurement Hybrid Research Center in Institute for Multidisciplinary Research of Advanced Materials (IMRAM). His research interests include functional monolayers, hybridized and metallized resist materials, and materials and processes for advanced nanoimprint lithography.
Dr. Michele Perego, IMM CNR, Unit of Agrate Brianza, Italy
Nanostructured Materials via Sequential Infiltration Synthesis in Block-Copolymer Thin FilmsMichele Perego is currently working as Research Director at CNR-IMM in Agrate Brianza. He received his PhD in Physics, Applied Physics and Astrophysics in 2004 from Università degli Studi di Milano. He is the coordinator of a research group working on the development of new bottom-up approaches for the synthesis of functional nanostructured materials with typical feature dimension below 20 nm. His research activity focuses on the investigation of fundamental issues related to the self-assembly processes in block copolymers thin films and on the use of these macromolecules to synthesize and manipulate functional nanostructures for microelectronics, optoelectronics and photovoltaic applications.
Mr. Narikatsu Sasao, Kioxia, Japan
Dr. Ruben Waldman, Intermolecular, USA