Symposium A

EUVL Stochastics Symposium: Overcoming the Challenge of Stochastics for High Resolution EUV Lithography
Organizers: Seiji Nagahara (Tokyo Electron), Tomoki Nagai (JSR), Shinji Okazaki (ALITECS) and Takahiro Kozawa (Osaka Univ.)

For the future EUV lithography for fine patterns including high NA EUV lithography, EUV induced stochastics issues are still one of the biggest concerns for reliable patterning for future semiconductor devices. This EUVL Stochastics Symposium will highlight the challenges and solutions for stochastics issues for the future EUV lithography. The symposium will deal with EUV stochastics from a variety of aspects such as exposure tools, resist materials, processes, masks, resist stochastics models and simulations. In addition to the invited talks, the symposium has an panel discussion by leading experts in the field for further discussion of the topics.


Invited Speaker's Name and AffiliationPaper TitleShort Biography
Prof. Takeo Watanabe, University of Hyogo, Japan
Fundamental Study of the Origin of the Stochastics in EUV ResistTakeo Watanabe received his Ph.D. from Osaka City University in 1990. He is Full Professor, Director of Center for EUV, and Dean Laboratory of Advanced Science and Technology for Industry, University of Hyogo. He is an expert of the EUV lithographic technology, including optics, exposure tool, mask and resist related technologies. He has authored over 200 technical papers, and he is international affairs, and the organizing and program committee members, of the International Conference of Photopolymer Science and Technology (ICPST). He is also Conference Chair of the International Conference of Photomask Japan. And he is a program committee member of EIPBN.
Mr. Toshiyuki Hisamura, Xilinx, USA
Optimization of EUV process for 7nm Versal productionToshiyuki (Toshi) Hisamura is Principal Engineer and Senior Manager of Xilinx, Inc. (USA) who has been managing lithography and mask technology development group since he joined the company in 2000. Prior to that, he held a variety roles involving international business development at Toppan Printing.
Hisamura holds two U.S. patents (one pending). He earned a bachelor's degree from Waseda University in 1987.
Dr. David Medeiros, Entegris, USA
Addressing the Defectivity Challenges of EUV LithographyDavid Medeiros joined Entegris as a Senior Director of Engineering in the office of the CTO in April of 2021. Previously he spent six years at GLOBALFOUNDRIES, first as the Senior Director of Patterning at Fab 8, and later as the Vice President of Global Engineering. Prior to GF, he spent seventeen years at IBM, culminating as the Director of Patterning R&D. His career began in the semiconductor industry as a synthetic chemist at Shipley Company. David holds a PhD in Chemistry from the University of Texas, Austin and a BS in Chemistry from the University of Massachusetts, Amherst.
Hakaru Mizoguchi, Gigaphoton, Japan
Ekinci Yasin, Paul Scherrer Institute, Switzerland
Stochastic challenges for the ultimate resolution in photolithographyYasin Ekinci is head of the Laboratory of Micro and Nanotechnology at Paul Scherrer Institute, Switzerland. He obtained his PhD in Max-Planck Institute for Dynamics and Self-Organization, Göttingen, Germany in 2003. In 2004, he joined Paul Scherrer Institute as a postdoctoral researcher. Between 2006 and 2012 he worked as a postdoctoral researcher and subsequently as a senior scientist and a lecturer in Department of Materials at ETH Zürich. He is at PSI since 2009 working on various topics of nanoscience and technology, including EUV lithography, resist materials, lensless imaging, plasmonics, semiconductor nanostructures, and nanofluidics. He is author/co-author of more than 220 papers and 7 patent applications. He is a fellow of SPIE.
Prof. Mark Neisser, Tan Kah Kee Innovation Laboratory, China
The Lithography Roadmap and the Impact of StochasticsMark Neisser is Technology Director for the Industrialization Platform at the Tan Kah Kee Innovation laboratory at Xiamen University in Xiamen, China. He is also adjunct professor in the College of Semiconductor Science and Technology at Xiamen University. He has worked in the semiconductor industry for over thirty years including managing R&D at IBM, AZ Electronic Materials and SEMATECH. He received his B.S. degree in chemistry from the Cornell University and his M.S. and Ph.D. degrees from the University of Michigan. He is the author of more than 30 patents, over 100 journal papers and has co-authored two book chapters. He is the chairman of the IRDS roadmap lithography committee.
Keiichiro Hitomi, Hitachi, Japan
Hirokazu Matsumoto, ZEON, JapanThe study of chain scission type photo resist for EUV lithographyHirokazu Matsumoto is the General Manager of Specialty Chemical Lab, ZEON CORPTATION. He is leading the material development in the Electronics field, including dry etching gas, insulation materials, photo resist, EB resist, and EUV resist.
Dr. Toru Fujimori, FUJIFILM Corporation, Japan
The status of stochastic issues - Photon stochastic and Chemical stochastic - TORU FUJIMORI, is Manager of FUJIFILM Corporation to manage for photo resist development group.
He received B.S. and M.S. degrees in organic chemistry from Saitama University, Japan, in 1989 and 1991, respectively. In 1991, he joined FUJIFILM Corporation as a researcher in synthetic organic chemistry laboratories.
He has been studying for synthesizing new materials for photo films for 3 years, and then for semiconductor materials (photo resist materials) for 8 years. In 2002, He has moved to electronic materials research laboratories to study color resist for image sensor for 6 years. Since 2008, he has been studying photo resist materials for KrF, ArF, ArF immersion, EB and EUV lithography as a research manager. From 2014 to 2016, he was senior researcher at EIDEC (EUVL Infrastructure Development Center, Inc.) as an assignee from FUJIFILM.
He has filed over 200 patents in this field, described a lot of papers, presentations and chapter of the photo resist text book.
Prof. Yusa Muroya, Osaka University, Japan
Study on beam-induced transient reaction process of carboxylic acids used as ligands of metal oxide nanocluster resistsYusa Muroya was received Ph.D degrees in engineering from Univ. of Tokyo, Japan, in 2007, and is now working at Institute of Scientific and Industrial Research, Osaka University, Japan. His research interest includes fundamental and application study of quantum beam-induced physical chemistry and chemistry of condensed inorganic/organic matters relating to nuclear engineering and next generation lithography, such as subcritical- and supercritical- fluids, solutions containing complex and nanoparticles. Applying various beam sources such as an electron linear accelerator and a femtosecond laser, he is advancing to elucidate key roles of short-lived transient intermediates played for the functional expressions.
Prof. Takahiro Kozawa, Osaka Univ., Japan
Takahiro Kozawa is a professor of the Institute of Scientific and Industrial Research (ISIR), Osaka

University. He earned his BS and MS degrees in nuclear engineering from the University of Tokyo, and Ph. D. degree in chemical engineering from Osaka University in 1990, 1992, and 2003, respectively. His work is mainly focused on beam-material interaction and beam-induced reactions in resist materials.
Dr. Seiji Nagahara, Tokyo Electron, Japan
Seiji Nagahara is Principal and Chief Scientist in Tokyo Electron Ltd (TEL). He now works for marketing and development of the next generation coater and developer equipment and technologies for future lithography in TEL. Prior to joining TEL, he was a lithographer in Renesas Electronics, NEC Electronics, and NEC. He researched lithography related technologies in a variety of places including IMEC (Belgium), University of California, Berkeley (USA), Argonne National Laboratory (USA), EIDEC (Japan) and Toshiba (Japan) in addition to TEL. He took Bachelor, Master, and Ph.D. degrees in Engineering at Osaka University, Japan. He is active as an author of technical papers, book chapters, and patents in patterning technologies. He also contributes to the academic and technical societies as a committee member including Program Committee Chair of MNC2021.
Mr. Kazuishi Tanno, Tokyo Ohka Kogyo, Japan
Development status of EUV Chemically Amplified ResistHe has been with over 13years R&D experience in advanced lithography material since joined Tokyo Ohka Kogyo Co., Ltd (TOK) in 2008.
He has been engaged in development work related to the resist material and process on ArF lithography, then currently he`s working on EUV lithography development.
Dr. Lawrence Melvin, Synopsys, USA
Shingo Yoshikawa, DNP, Japan