MNC 2022

	MNC 2021 Award List
	Outstanding Paper SD1030 Applying stochastic simulation to study defect formation in EUV photoresists Lawrence S. Melvin III 1, Ulrich Welling 2, Yudhishthir Kandel 1, Zachary A. Levinson 1, Hironobu Taoka 3, HansJurgen Stock 2 and Wolfgang Demmerle 2 1 Synopsys Inc., USA, 2 Synopsys GmbH, Germany and 3 Nihon Synopsys G.K., Japan
	Most Impressive Presentation Award 29B-2-3 11:20 Design of Scanning Path for Dynamic Virtual Cathode Tool Ken Sasaki, Tatsuki Nomura and Takayuki Hoshino, Hirosaki Univ., Japan
	Young Author’s Award 29B-2-4 11:40 Characterization of nanogap with gold nanoparticle dimer controlled by four-point bending for electrical and optical single molecule measurement Yuanzhi Chang, Takayuki Sumitomo, Akio Uesugi, Koji Sugano and Yoshitada Isono, Kobe Univ., Japan
	Young Author’s Award 28C-2-2 11:20 Highly sensitive passive glucose sensor based on parity-time (PT) symmetric resonators T. Takamatsu 1, Y. Shijie 1, T. Xiao 1, L. Hu 1, Y. Cui 1, Q. Zhang 1 and T. Miyake 1,2, 1 Waseda Univ. and 2 JST-PRESTO, Japan
	Audience Award Keynote-11 High NA EUV lithography: Current status and outlook for the future Harry Levinson, HJL Lithography, USA
	Audience Award Keynote-13 Evolution of patterning materials towards the Moore's Law 2.0 Era Dario L. Goldfarb, IBM Watson Res. Center, USA