Symposium A
AI × High-NA EUV × Novel Materials × Sustainability
Symposium A: AI × High-NA EUV × Novel Materials × Sustainability Organizers Tetsuo Harada (Univ. of Hyogo), Kentaro Matsunaga (Kioxia), Keiichiro Hitomi (Hitachi), Makoto Sakakibara (Hitachi High-Tech), Kuen-Yu Tsai (Natl. Taiwan Univ.), Junichi Yanagisawa (Univ. of Shiga Pref.), Toru Fujimori (Hitachi High-Tech), Julius Santillan (AIST), Fumihiko Hirose (Yamagata Univ.) and Seiji Nagahara (ASML) |
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Prof. Takahiro Kozawa, The University of Osaka, Japan |
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Dr. Arame Thiam, Tokyo Electron Europe, Belgium  Paper Title Novel Patterning Technologies enabling High NA EUV Logic and DRAM features scaling Short Biography Dr Arame Thiam is Senior Process Engineer at Tokyo Electron Belgium. She supports High NA EUV lithography joint learning program with imec, focusing on patterning exploration for Logic advanced technology nodes. After starting her career in CEA-Leti Grenoble Patterning group working on e-beam lithography, she joined Imec in 2015. Her focus was lithography process development support of Imec Interconnects, Beyond CMOS, OIO and Quantum computing programs. She received her M.Sc. and PhD in Microelectronics and Nanotechnologies from the University of Lille 1 (France). |
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Prof. Tsumoru Shintake, Okinawa Institute of Science and Technology, Japan |
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Dr. Anuja De Silva, Lam Research, USA |
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Dr. Toshiaki Tanigaki, Hitachi, Ltd., Japan  Paper Title Electromagnetic Field Observations for Novel Materials by Electron Holography Short Biography Toshiaki Tanigaki is a Principal Researcher at Hitachi, Ltd.’s Research and Development Group. He received his PhD from Ritsumeikan University in 2004 and was a visiting researcher at RIKEN under Dr. Akira Tonomura’s FIRST Program from 2010 to 2014. Joining Hitachi in 2014, he became a Project Leader in 2019. His research centers on advanced electron microscopy, including a 1.2 MV aberration-corrected holography electron microscope, for high-precision imaging of electromagnetic fields and their applications in physics, materials science, and industry. He received the Seto Award from the Japanese Society of Microscopy in 2023. |
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Dr. Luciana Meli, IBM Research, USA |
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Dr. Ivan Pollentier, imec, Belgium  Paper Title The importance of the atmospheric environment in EUV post-exposure events for metal oxide resists : from stability to optimization Short Biography Ivan Pollentier joined imec in 1993 after receiving a PhD in Physics engineering at the University of Gent (Belgium), where he was involved in lithography engineering and development of i-line, DUV and 193nm processes towards imec’s device programs. Since 2007, he is involved in resist and process related fundamental research in the field of EUV lithography. |
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Prof. D. Howard Fairbrother, Johns Hopkins University, USA  Paper Title Dry Processing and Development Strategies for Advanced Lithography and Patterning Short Biography Dr. D(avid) Howard Fairbrother is Professor of Chemistry at Johns Hopkins University, where his materials research focuses on surface chemistry, electron-surface interactions and more recently the development of dry processes for semiconductor technologies. He received his B.A. in Chemistry from the University of Oxford, England, and his Ph.D. in Chemistry from Northwestern University. He joined the Department of Chemistry at Johns Hopkins in 1997 following postdoctoral research at the University of California, Berkeley. |
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Dr. Cheng Wang, Lawrence Berkeley National Laboratory, USA | |
