Symposium A
AI × High-NA EUV × Novel Materials × Sustainability
Symposium A: AI × High-NA EUV × Novel Materials × Sustainability |
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Prof. Takahiro Kozawa, The University of Osaka, Japan | |
Dr. Arame Thiam, Tokyo Electron Europe, Belgium  Paper Title Novel Patterning Technologies enabling High NA EUV Logic and DRAM features scaling Short Biography Dr Arame Thiam is Senior Process Engineer at Tokyo Electron Belgium. She supports High NA EUV lithography joint learning program with imec, focusing on patterning exploration for Logic advanced technology nodes. After starting her career in CEA-Leti Grenoble Patterning group working on e-beam lithography, she joined Imec in 2015. Her focus was lithography process development support of Imec Interconnects, Beyond CMOS, OIO and Quantum computing programs. She received her M.Sc. and PhD in Microelectronics and Nanotechnologies from the University of Lille 1 (France). |
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Prof. Tsumoru Shintake, Okinawa Institute of Science and Technology, Japan |
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Dr. Anuja De Silva, Lam Research, USA |
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Dr. Toshiaki Tanigaki, Hitachi, Ltd., Japan |
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Dr. Luciana Meli, IBM Research, USA |
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Dr. Ivan Pollentier, imec, Belgium |
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