MNC 2012, 25th International Microprocesses and Nanotechnology Conference
Oct. 30-Nov. 2, 2012
, Kobe Meriken Park Oriental Hotel, Kobe, Japan

MNC 2013
November 4-7, 2013
oyton Sapporo, Hokkaido, Japan

Program (September 27)
Session Schedule
Floor plan_Poster_Technical Exhibition
Access Map
Prof. Ichiro Yamashita who is an Invited Speaker was changed to Dr. Maki Hiraoka in BioMEMS Session(October 25)
Onsite registration will be available at conference site during Oct. 30-Nov. 2.

Technical Seminar in Japanese and English
Registration Desk (4F Lobby)
October 30, 12:30 - 16:30

Conference Registration Desk
October 30, 16:30- 18:30
October 31, 8:30 - 18:00
November 1, 8:30 - 19:00
November 2, 8:30 - 16:00
Abstract Deadline
July 1, 2012
July 6, 2012

Late News Paper Deadline
September 15, 2012
 Registration Deadline
October 15, 2012

Online registration and hotel accommodation site is available.

Abstract will be published online
October 22, 2012

 JJAP Deadline
November 30, 2012
Sister Conference
MNC 2011
  MNE 2012
Conference Site
Kobe Meriken Park Oriental Hotel

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Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 25th year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
1:Lithography and Related Technologies and Metrology
 1-1: Lithography and Metrology
 1-2: Resist Materials and Processing
2: Nanotechnology
 2-0 Nanocarbons
 2-1: Nanodevices
 2-2: Nanofabrication
 2-3: Nanomaterials
 2-4: Nano Tool
3: Nanoimprint, Nanoprint and Rising Lithography
4: BioMEMS, Lab on a Chip
5: Microsystem Technology and MEMS
Symposium on Patterning Innovation for Sub-20 nm Devices
Symp. A: Extreme Ultraviolet Lithography and Lithography Extensions
Symp. B: Nanoimprint
Symp. C: Directed Self Assembly

(alphabetical order)
Masaru Kitsuregawa, Univ. of Tokyo, Japan
Paul F. Nealey, Univ. of Chicago, USA
Kurt Ronse, IMEC, Belgium

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