MNC 2014
27th International Microprocesses and Nanotechnology Conference
November 4-7, 2014, Hilton Fukuoka Sea Hawk, Fukuoka, Japan

Online registration and hotel accomodation site is available.

Hilton Fukuoka Sea Hawk accmodation site is available.

Program ver 2
Session Schedule

Floor Map

MNC 2015
Toyama International Conference Center,
Toyama, Japan
November 10-13, 2015 

MNC 2013 Web Site
Abstract Deadline
July 1, 2014

July 6, 2014
Closed

Late News Paper Deadline
September 15, 2014
Closed

 Registration Deadline
October 17, 2014


Abstract will be published online
October 27, 2014


 JJAP Special Issue Deadline
November 30, 2014


Sister Conference
MNC 2013 Web Site
  MNE 2014 _Lausanne, September 22-26, 2014
Conference Site
Hilton Fukuoka Sea Hawk



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MNC 2014
Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 27th year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
Nov.4-7 During Conference
secretariat@imnc.jp / +81-3-3420-1800 (03-3420-1800)
MNC 2014 Conference site map and access 

Oct. 31 Updated Floor Map (Eratta version)

Oct. 30 Prof. Seiichi Hata (Nagoya Univ.) who is an invited speaker was changed to Assistant Prof. Mizue Mizoshiri in 6C-4: Process and Characterization I.

Oct. 17 Pre-Registration site was closed. On-site registration will be available at the Conference.
Technical Seminar in Japanese Registration Desk
November 4, 12:20 - 15:00 (1F Lobby)

Conference Registration Desk
November 4, 15:30 - 18:30 (1F Lobby)
November 5, 8:30 - 12:10 (1F Lobby)
November 5, 12:20 - 18:00 (3F Lobby)
November 6, 8:30 - 18:00 (3F Lobby)
November 7, 8:30 - 16:00 (3F Lobby)


Sep. 30 Updated Program ver 2 including Late News Paper's program
Sep. 9 Updated Submission site of JJAP (MNC special issue) and JJAP instraction site
August 14 Updated Program ver 1 and Session Schedule
  Updated Technical seminer in Japanese site.
August 13 Updated Registration and Hotel Accomodation site.
  Updated Hilton Fukuoka Sea Hawk (Conference site) Accomodation site.
SCOPE
Symposium B ''Hybrid Nanosystem''
1.Lithography and Related Technologies and Metrology
 1-1: Advanced Photolithography
 1-2: Electron and Ion Beam Technologies
 1-3: Resist and Directed Self-Assembly
2:Nanotechnology
 2-1: Nanocarbons
 2-2: Nanodevices
 2-3: Nanofabrication
 2-4: Inorganic Nanomaterials
 2-5: Organic Nanomaterials
 2-6: NanoTool
3: Nanoimprint, Nanoprint and Rising Lithography
4: BioMEMS, Lab on a Chip
5: Microsystem Technology and MEMS
PLENARY SPEAKERS
Ffabrication, science, and applications of Van der Waals Heterostructures
James Hone (Columbia Univ., USA) 

Nanotechnology to Develop “the Magic Bullet” for Targeted Cancer Therapy
Kazunori Kataoka (Univ. of Tokyo, Japan)

Adding New Capabilities to CMOS Integrated Circuits via Field-Assisted Directed Assembly of Nanowire and 2D Crystal Materials
Theresa Mayer (Penn State Univ., USA);
Alphabetical Order
SYMPOSIUM
Symposium A ''Advanced Patterning''
Symposium B ''Hybrid Nanosystem''





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