MNC 2018, November 13-16, 2018
31st International Microprocesses and Nanotechnology Conference
Sapporo Park Hotel, Sapporo, Japan

Late News Papaer      Deadline: Sep. 10, 2018

July 1 → July 5, 2018

September 10, 2018

October 19, 2018

November 5, 2018

November 30, 2018

October 28-31, 2019       Hiroshima, Japan

 MNC 2016, Nov. 8-11           ANA Crowne Plaza  Kyoto, Japan
Sister Conference
 MNE 2018, Sep. 24-27          Copenhagen  Denmark
 EIPBN 2018   May 29-June 1, 2018            Puerto Rico
Conference Site
 Conference Site  Sapporo Park Hotel              Sapporo, Japan
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About MNC 2018
Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 31st year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
1.Lithography and Related Technologies and Metrology
 1-1: Photolithography and Patterning
 1-2: Electron and Ion Beam Technologies
 1-3: Resist and Directed Self-Assembly
 2-1: Nanocarbons
 2-2: Nanodevices
 2-3: Nanofabrication
 2-4: Inorganic Nanomaterials
 2-5: Organic Nanomaterials
 2-6: NanoTool
3: Nanoimprint, Hybrid-NIL, Biomimetics, and Functional Surfaces
4: BioMEMS, Lab on a Chip, and Nanobiotechnology
5: Microsystem Technology and MEMS

Symp. A: Nano-Metrology for Exploring the Limit
Symp. B: Recent Progress of Atomic Layer Processing (ALP) Technology
Symp. C: Thermal and electronic properties of nanoscale interfaces
Symp. D: BioMEMS, Lab on a Chip, and Nanobiotechnology
 Plenary Speakers  
AI Based Self-Driving Vehicles and Its Relation with Nano Electronics
Tsuguo Nobe
(Intel and Nagoya Univ., Japan)

EUV Lithography at Threshold of High-Volume Manufacturing and Beyond
Anthony Yen (ASML, USA)


Materials Innovation and Integration for New Computing Paradigms
Kirsten Moselund
(IBM Research Zurich)


MNC 2018_Infomation of Supporting Membership, Sponsorship and Technical Exhibition

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