MNC 2016, November 8-11, 2016
29th International Microprocesses and Nanotechnology Conference
ANA Crowne Plaza Kyoto, Kyoto, Japan

Pre-Registration site was closed. On-site registration will be available at the Conference.



 
We strongly recommend you to secure an accommodation as early as possible as November is the tourist period in Kyoto.
 
 MNC 2016 Announcement
Abstract Deadline
July 1, 2016
July 6, 2016
Closed
 

Late News Paper Deadline
September 15, 2016
Closed


 Registration Deadline
October 18, 2016

Closed

Abstract will be published online
October 31, 2016


 JJAP Special Issue Deadline
November 30, 2016


 Next Conference
November 6-9, 2017
Ramada Plaza Jeju Hotel, Jeju Island, Korea 
Year After Conference
November 6-9, 2018
Sapporo, Japan
Sister Conference
MNC 2015 Web Site
  MNE 2016_Vienna, Austria, September 19-23, 2016
Conference Site
ANA Crowne Plaza Kyoto, Kyoto, Japan
Satellite Event
A2nd French-Japanese Workshop on Micro & Nanotechnology, Kyoto Univ, Japan, November 8, 2016
   
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About MNC 2016
Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 29th year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
Oct.31, 2016 Access to Kyoto and Conference Site.
Oct.31, 2016 Updated Floor Plan
Oct.13, 2016 Updated Plenary and Invited List
Sep. 28, 2016 Updated Program including Late News Paper
August 12, 2016 Updated Session Schedule &  Program
August 3, 2016 Updated Registration and Hotel Accomodation site.
July 1, 2016 Extended Deadline for Submission of Abstract : July 6, 2015

1.Lithography and Related Technologies and Metrology
 1-1: Advanced Photolithography
 1-2: Electron and Ion Beam Technologies
 1-3: Resist and Directed Self-Assembly
2:Nanotechnology
 2-1: Nanocarbons
 2-2: Nanodevices
 2-3: Nanofabrication
 2-4: Inorganic Nanomaterials
 2-5: Organic Nanomaterials
 2-6: NanoTool
3: Nanoimprint, Nanoprint and Rising Lithography
4: BioMEMS, Lab on a Chip
5: Microsystem Technology and MEMS

Symp. A: Metrology and Inspection for Advanced Patterning
Symp. B: Forefront of Graphene & Related 2D Materials
Symp. C:Nanosensors and Their Promises for IoT Society
Symp. D: Innovation from Open Facility
Dr. Lars Liebmann, GLOBALFOUNDRIES, USA
Prof. Kaustav Banerjee, UCSB, USA
Dr. Sangyoon Lee, Samsung Electronics, Korea





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