MNC 2012, 25th International Microprocesses and Nanotechnology Conference
Oct. 30-Nov. 2, 2012
, Kobe Meriken Park Oriental Hotel, Kobe, Japan






MNC 2012 Committee Chairs
       
Organizing Chair:
Toshiro Itani
(EIDEC)
Organizing Vice Chair:
Takashi Meguro
(Tokyo Univ. of Sci.) 
Steering Chair:
Jun-ichi Fujita
(Univ. of Tsukuba)
Steering Vice Chair:
Yasuyuki Miyamoto
(Tokyo Inst. of Technol.) 
       
Program Chair:
Yukinori Ono
(Univ. of Toyama)
 Program Vice Chair:
Masao Nagase
(Univ. of Tokushima)
 Program Vice Chair:
Takahiro Kozawa
(Osaka Univ.)

 


Organizing Committee Members
Chair 
Vice Chair
Members
T. Itani (EIDEC)
T. Meguro (Tokyo Univ. of Sci.)

K. Asakawa (Toshiba)
T. Asano (Kyushu Univ.)
H. Arimoto (AIST)   
R. Ebinuma (Canon)
K. Fujii (Renesas Electronics)
T. Fukui (Hokkaido Univ.)
K. Hane (Tohoku Univ.)
N. Hayashi (Dai Nippon Printing)
T. Horiuchi (Tokyo Denki Univ.)
K. Ishibashi (Riken)
A. Ishihama (Sharp)
S. Ishihara (Univ. of Tokyo)


M. Komuro (KEK)
S. Matsui (Univ. of Hyogo)
Y. Ochiai (Toyo Gosei)
M. Ohfuchi (Fujitsu Labs.)
S. Okazaki (Gigaphoton)
S. Shoji (Waseda Univ.)
S. Tagawa (Osaka Univ.)
Y. Todokoro (Nara Inst. Sci. & Technol.)
A. Tokui (Nikon)
H. Yamaguchi (NTT)
S. Zaima (Nagoya Univ.) 
Advisory Members
H. Ahmed (Cambridge Univ.)
G. Ben Assayag (CEMES-CNRS)
Y. Aoyagi (Ritsumeikan Univ.)
C.Y. Chang (Natl. Nano Device Lab.)
R.C. Farrow (New Jersey Inst. of Technol.)
F. Fortagne (Leica Microsystem)
M. Fritze (Univ. of Southern)
K. Gamo (Osaka Univ.)
G. Gruetzner (Micro Resist Technol.)
L.R. Harriott (Univ. of Virginia)
Y. Horiike (NIMS)
O. Joubert (CRS-LTM)
D. Kern (Univ. of Tubingen)
H.W.P. Koops (NaWoTec GmbH)
J. Melngailis (Univ. of Meryland)
S.-K. Min (Kyung Hee Univ.)
A.R. Neureuther (UC Berkeley)
R.F.W. Pease (Stanford Univ.)
R. Shimizu (IIAS)
C. Shih (ERSO/ITRI)
H.I. Smith (MIT)
T. Sugano (Univ. of Tokyo)
M. Takai (Osaka Univ.)
S. Tedesco (Leti)
T. Tsurushima (Kyushu Univ.)
C. Vieu (LAAS-CNRS/INSA)
M. Wang (China Academic Sci.)
Steering Committee Members
Chair
Vice Chair
Program

Exhibition
Tressure
Contribution
Public
Seminar
Local Chair
Overseas
J. Fujita (Univ. of Tsukuba)
Y. Miyamoto (Tokyo Inst. of Technol.)
Y. Ono (Univ.of Toyama)
M. Nagase (Tokushima Univ.)
J. Sachen (GenISys)
H. Yamashita (HOYA)
T. Iwai (Tokyo Ohka)
N. Samoto (JEOL)
H. Yoshida (Hitachi)
S. Matsui (Univ. of Hyogo)
J.H. Ahn (Hanyang Univ.)
O.H. Kim (POSTEC)

C.K. Sung (National Tsing Hua Univ.)


T. Kozawa (Osaka Univ.)

S. Nagahara (Tokyo Electron)






A. Chen (ASML)
J.-K. Shin (Kyungpook National Univ.)
Program Committee Members
Chairperson:
Vice-Chairpersons:

Y. Ono (Univ. of Toyama)
T. Kozawa (Osaka Univ.)
M. Nagase (Univ. of Tokushima)
1-1: Lithography and Metrology
Section Head:
Sub Head:



Members:
T. Sato (Toshiba)
H. Yamashita (HOYA)
J. Ahn (Hanyang Univ.)
K.-Y. Tsai (National Taiwan Univ.)

H. Futatsuya (Fujitsu)
H. Kawai (Nikon)
M. Kotera (Osaka Inst. of Technol.)
J. Miyazaki (ASML)
Y. Tanaka (Renesas Electronics)
H. Nozue (Nuflare)
K. Ogino (Fujitsu Semiconductor)
M. Shibuya (Tokyo Polytechnic Univ.)
A. Yamada (Advantest)
A. Yamaguchi (Hitachi)
J. Yamamoto (Hitachi)
J. Yanagisawa (Univ. of Shiga Pref.)
1-2:Resist Materials and Processing
Section Head:
Sub Head:

Members:
S. Nagahara (Tokyo Electron)
T. Azuma (Toshiba)

R. Gronheid (IMEC)
T. Hirayama (Tokyo Ohka)
H. Kudo (Kansai Univ.)
K. Nozaki (Fujitsu)
H. Oizumi (Hitachi)
K. Okamoto (Hokkaido Univ.)
T. Yamaguchi (NTT)
H. Yamamoto (Osaka Univ.)
2-0:Nanocarbon
Section Head:
Sub Head:


Members:
K. Maehashi (Osaka Univ.)
D. Kondo (Fujitsu Labs.)


S. Chiashi (Univ. of Tokyo)
J. Fujita (Univ. of Tsukuba)
H. Fukidome (Tohoku Univ.)
K. Hirahara (Osaka Univ.)
S. Okada (Univ. of Tsukuba)
T. Takenobu (Waseda Univ.)
M. Tanemura (Nagoya Inst. of Technol.)
K. Ueno (Saitama Univ.)
2-1:Nanodevices 
Section Head:
Sub Head:





Members:
K. Nishiguchi (NTT)
S. Kasai (Hokkaido Univ.)
S. W. Hwang (Samsung Advanced Inst. of Technol.)
J.-T. Sheu (National Chiao Tung Univ.)

N. Banno (Leap)
N. Clement (CNRS)
H. Ikeda (Shizuoka Univ.)
Y. Ishikawa (Nara Inst. of Sci. and Technol.)
T. Maemoto (Osaka Inst. of Technol.)
T. Suemasu (Univ. of Tsukuba)
T. Yanagida (Osaka Univ.)
2-2:Nanofabrication
Section Head:
Sub Head:


Members:
S. Shingubara (Kansai Univ.)
A. Kohno (Fukuoka Univ.)

T. Asahi (Ehime Univ.)
T. Hasegawa (NIMS)
T. Hasunuma (Tsukuba Univ.)
K.-B. Kim (Seoul Natl. Univ.)
K. Kita (Univ. of Tokyo)
Yongxun Liu (AIST)
T. Shinada (Waseda Univ.)
K. Takase (Nihon Univ.)
2-3:Nanomaterials
Section Head:
Sub Head:


Members:
T. Chikyo (NIMS)
T. Ishida (AIST)
E.-K. Kim (Hanyang Univ.)

M. Kiguchi (Tokyo Inst. of Technol.)
Y. Matsumoto (Tokyo Inst. of Technol.)
K. Noda (Kyoto Univ.)
T. Ohzono (AIST)
Y. Sakuma (NIMS)
T. Tanii (Waseda Univ.)
K. Terabe (NIMS)
N. Zettsu (Nagoya Univ.)
X.W. Zhao (Tokyo Univ. of Sci)
2-4:Nano-Tool
Section Head:
Sub Head:


Members:
S. Akita (Osaka Pref. Univ.)
T. Ono (Tohoku Univ.)

M. Kitazawa (Olympus)
D.-W. Lee(Chonnam National Univ.)
T. Matsumoto (Canon)
Y. Mitsui (Hitachi Hightechnologies)
M. Miyoshi (Univ. of Tokyo)
S. Takahashi (Univ. of Tokyo)
3:Nanoimprint, Nanoprint and Rising Lithography
Section Head:
Sub Head:







Members:
H. Hiroshima (AIST)
A. Yokoo (NTT)
F.-Y. Chang (National Taiwan Univ.)
E.-S. Lee (Korea Institute of Machinery and Materials)
H. Lee (Korea Univ.)
H.Y. Low (Institute of Materials Research and Engineering)

Y. Hirai (Osaka Pref. Univ.)
A. Miyauchi (Hitachi)
M. Okinaka (Canon)
N. Sakai (Sumsung Yokohama Res. Inst.)
J. Taniguchi (Tokyo Univ. of Sci.)
4:BioMEMS, Lab on a Chip
Section Head:
Sub Head:



Members:
T. Ichiki (Univ. of Tokyo)
A. Matsumoto (Tokyo Medical and Dental Univ.)
F.-G. Tseng (National Tsing Hua Univ.)

K. Furukawa (NTT)
K. Tawa (AIST)
O.C. Jeong (Inje Univ.)
K.K. Lee (Ajou Univ.)
Y. Murakami (Toyohashi Univ. of Technology)
Y. Takamura (JAIST)
M. Tokeshi (Hokkaido Univ.)
K. Yasuda (Tokyo Medical and Dental Univ.)
T. Yamaguchi (JSR Life Sci.)
5:Microsystem Technology and MEMS
Section Head:
Sub Head:





Members:
H. Takao (Kagawa Univ.)
N. Miki (Keio Univ.)
J.-W. Hsieh (Asia Pacific Microsystems)
S.-H. Kong (Kyungpook National Univ.)
W. Fang (National Tsing Hua Univ.)

T. Ando (Ritsumeikan Univ.)
D. Fujisawa (Mitsubishi Electric)
E. Iwase (Waseda Univ.)
A. Koga (Toshiba)
Y.-C. Lin (Tohoku Univ.)
T. Namazu (Univ. of Hyogo)
T. Sakata (NTT)
M. Sohgawa (Osaka Univ.)



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