MNC 2009, November 16-19, 2009
22nd International Microprocesses and Nanotechnology Conference
Conference Site: Sheraton Sapporo Hotel, Sapporo, Japan

-Online registration and hotel accommodation site is available.
- Advance Program is available. 

Final Call for Paper(468KB)
Abstract Deadline
June 30, 2009
Late News Paper Deadline
September 15, 2009 
 Registration Deadline
 October 15, 2009
October 26, 2009

 JJAP Deadline
November 30, 2009
Sheraton Sapporo Hotel
(Conference Site)
MNC 2008
  EIPBN 2009 USA, May 25-29, 2009

EIPBN 2010
June 1 - 4, 2010
  MNE 2009 Belgium, September 28-October 1, 2009
  MNE 2010 Genda, 19-22 September, 2010 

in Japanese

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Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 22nd year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
MNC 2010
November 9-12, 2010
Kokura, Kitakyushu, JAPAN

MNC 2009 Session Schedule.htm. update Nov. 11
MNC 2009 PROGRAM.pdf update Nov.r 11
MNC 2009 Technical Exhibition and Poster.jpg
Program Corection update Nov. 12
17A-3-1 15:40-16:10, November 17 Room A has changed to 13:20-13:50, November 18 at Room C.
Invited talk of Bio MEMS session.
Controlling Cellular Microenvironments with
Microfluidics and Nanostructures (Invited)''
Prof. N.L. Jeon, Soul National Univ., Korea

November in Sapporo
Even in the plain areas of Sapporo, leaves turn red and the first snow of the year is observed. You should make sure to wear warm clothing. In the latter part of the month, when the romantic White Illumination begins, you will need coats and gloves.
Average Temperature: 4°C Maximum Snow Accumulation: 13 cm

Registration Desk
(Online registration was closed. Please avail on site registration at conference site.)
16:30- 18:30, November 16
8:30 - 18:00, November 17
8:30 - 19:00, November 18
8:30 - 15:30, November 19

Internet Space
We prepare ''Line'' at lobby.

Tel Number of Secretariat (November 17-19)
Tel: +81-11-893-2679   (Tel: 011-893-2679)
1-1:DUV, EUV Lithography and Metrology
1-2:Electron- and Ion-Beam Lithography
1-3:Resist Materials and Processing
3:Nanoimprint, Nanoprint and Rising Lithography
4:Bio MEMS, Lab on a Chip
5:Microsystem Technology and MEMS

Symp. A. Computational Lithography
Symp. B. Graphene: Growth & Characterization

Sponsored by
The Japan Society of Applied Physics

Committee Chairs:
Organizing Committee Chair:
 S. Shoji (Waseda Univ.)
Steering Committee Chair:
 T. Itani (Selete)
Program Committee Chair:
 T. Meguro (Tokyo Univ. of Sci.)

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