Chairperson:
Vice-Chairpersons:
|
T. Meguro (Tokyo Univ. of Sci.)
S. Akita (Osaka Pref. Univ.)
T. Kozawa (Osaka Univ.)
|
| 1-1:DUV, VUV, EUV Lithography and Metrology |
Section Head:
Sub Head:
Members: |
T. Sato (Toshiba)
S. Nagahara (NEC Electronics)
J.H. Ahn (Hanyang Univ.)
T. Chijimatsu (Fujitsu)
N. Hirayanagi (Nikon),
J. Kitano (Tokyo Electron),
Y. Morikawa (DNP)
M. Suzuki (Canon)
A. Yamaguchi (Hitachi) |
| 1-2:Electron- and Ion-Beam Lithography |
Section Head:
Sub Head:
Members: |
Y. Miyamoto (Tokyo Inst. of Technol.)
J. Yanagisawa (Univ. of Shiga Pref.)
K.-Y. Tsai (National Taiwan Univ.)
S. Babin (aBeam Technology)
M. Kotera (Osaka Inst. of Technol.)
H. Nozue (NuFlare Tech.)
K. Ogino (Fujitsu)
A. Yamada (Advantest)
J. Yamamoto (Hitachi)
Y. Yamamoto (SII Nanotechnology)
H. Yamashita (HOYA) |
| 1-3:Resist Materials and Processing |
Section Head:
Sub Head:
Members: |
T. Kozawa (Osaka Univ.)
H. Oizumi (Selete)
T. Azuma (Toshiba)
M. Endo (Osaka Univ.)
M. Goethals (IMEC)
H. Hada (Tokyo Ohka)
Y. Hirai (JSR)
H. Horibe (Kanazawa Inst. of Technol.)
H. Kudo (Kanagawa Univ.)
S. Masuda (Fuji Film)
K. Nakano (NEC)
K. Nozaki (Fujitsu)
I. Takemoto (Sumitomo Chemical) |
| 2-1:Nanodevices |
Section Head:
Sub Head:
Members: |
Y. Ohno (Nagoya Univ.)
S. Kasai (Hokkaido Univ.)
T.-S. Chao(National Chiao Tung Univ.)
S.W. Hwang (Korea Univ.)
J.-T. Sheu (National Chiao Tung Univ.)
N. Banno (NEC)
N. Fukata (NIMS）
K. Maehashi (Osaka Univ.)
T. Maemoto (Osaka Inst. of Technol.)
K. Nagashio (Univ. of Tokyo)
K. Nishiguchi (NTT)
S. Shingubara (Kansai Univ.) |
| 2-2:Nanofabrication |
Section Head:
Sub Head:
Members: |
M. Masahara (AIST)
T. Hasegawa (NIMS)
T. Asahi (Osaka Univ.)
T. Chikyo (NIMS)
Y. Ishikawa (Univ. of Tokyo)
T. Kobayashi (Riken)
A. Kohno (Fukuoka Univ.)
T. Komeda (Tohoku Univ.)
K. Takase (Nihon Univ.)
X.W. Zhao (Tokyo Univ. of Sci) |
| 2-3:Nanomaterials |
Section Head:
Sub Head:
Members: |
T. Yoshinobu (Tohoku Univ.)
Y. Tajima (Riken)
E.K. Kim (Hanyang Univ.)
J. Fujita (Univ. of Tsukuba)
T. Ishida (AIST)
T. Miyazawa (Univ. of Tokyo)
T. Takenobu (Tohoku Univ.)
K. Tanii (Waseda Univ.) |
| 2-4:Nano-Tool |
Section Head:
Sub Head:
Members: |
M. Nagase (NTT)
S. Akita (Osaka Pref. Univ.)
H. Ina (Canon)
M. Kitazawa (Olympus)
D.-W. Lee (Chonnam National Univ.)
Y. Mitsui (Hitachi Hightechnologies)
M. Miyoshi (Univ. of Tokyo)
T. Ono (Tohoku Univ.)
S. Takahashi (Univ. of Tokyo)
M. Yasutake (SII NanoTechnology)
|
| 3:Nanoimprint, Nanoprint and Rising Lithography |
Section Head:
Sub Head:
Members: |
H. Hiroshima (AIST)
A. Yokoo (NTT)
F.-B. Hsiao (National Cheng Kung Univ.)
Y. Hirai (Osaka Pref. Univ.)
H. Lee (Korea Univ.)
A. Miyauchi (Hitachi)
M. Okinaka (Canon)
N. Sakai (Toyo Gosei)
J. Taniguchi (Tokyo Univ. of Sci.) |
| 4:Bio MEMS, Lab on a Chip |
Section Head:
Sub Head:
Members: |
T. Ichiki (Univ. of Tokyo)
Y. Takamura (JAIST)
G.-B. Lee (Natioal Cheng Kung Univ.)
F.-G. Tseng (National Tsing Hua Univ.)
T. Horiuchi (NTT)
W-T. Liu (National University of Singapore)
H. Takei (Toyo Univ.)
Y. Miyahara (NIMS)
Y. Murakami (Hiroshima Univ.) |
| 5:Microsystem Technology and MEMS |
Section Head:
Sub Head:
Members: |
K. Suzuki (Ritsumeikan Univ.)
T. Ikehara (AIST)
W. Fang (National Tsing Hua Univ.)
J.-W. Hsieh (Asia Pacific Microsystems)
J. Shin (Kyungpook Univ.)
H. Kuwano (Tohoku Univ.)
Y. Suzuki (Nikon)
Z. Rymuza(Warsaw Univ. of Technol.)
H. Takao (Toyohashi Univ. of Technol.)
T. Tsuchiya (Kyoto Univ.)
D.F. Wang (Ibaraki Univ.) |
