MNC 2009 Session Schedule
Monday, November 16, 2009
Tuesday, November 17
| Room P (3F) | update Nov. 11, 2009 | |
|---|---|---|
| 17P-1:Opening Session 9:30-9:50: Opening Remark and 2008 Award Presentation 9:50-10:30 S. Wurm (SEMATEC, USA) 10:30-11:10 A. Neureuter (Univ. of CA, Berkeley, USA) 11:10-11:50 T. Fukui (Hokkaido Univ.) | ||
| Lunch | ||
| Room A (3F) | Room B (3F) | Room C (3F) |
| 17A-2: 13:30-15:20 DUV, EUV Lithography and Metrology | 17B-2: 13:30-15:10 Symp. B. Graphene: Growth & Characterization I | 17C-2: 13:30-15:20 Nanoimprint, Nanoprint and Rising Lithography I |
| 17A-2: 15:20-15:35, Author's Interview | ||
| Room D-1 and D-2 (2F) | ||
| Coffee Break | ||
| Room A (3F) | Room B (3F) | Room C (3F) |
| 17A-3: 15:40-17:50 Bio MEMS, Lab on a Chip | 17B-3: 15:30-17:10 Symp. B. Graphene: Growth & Characterization II | 17C-3: 15:40-17:30 Nanoimprint, Nanoprint and Rising Lithography II |
| 17A-3: 17:50-18:05, Author's Interview | 17B-2, 3: 17:10-17:25, Author's Interview | 17C-2, 3: 17:30-17:45, Author's Interview |
| Hokkaido Univ. RCIQE Lab. Tour | ||
| 18:20 - 20:00 Capacity: 30 persons Reservation: on-site registration at registration desk | ||
Wednesday, November 18
| Room A (3F) | Room B (3F) | Room C (3F) |
|---|---|---|
| 18A-4: 9:00-10:40 Dr. Hiroshi Ito Tribute Symp. A. Computational Lithography I | 18B-4: 9:00-10:30 Nanomaterials I | 18C-4: 9:00-10:40 Microsystem Technology and MEMS I |
| Room D-1 and D-2 (2F) | ||
| Coffee Break | ||
| Room A (3F) | Room B (3F) | Room C (3F) |
| 18A-5: 11:00-12:40 Symp. A. Computational Lithography II | 18B-5: 11:00-12:50 Nanomaterials II | 18C-5: 11:00-12:40 Microsystem Technology and MEMS II |
| 18C-4, 5: 12:40-12:55, Author's Interview | ||
| Lunch | ||
| 13:20-13:50 Bio MEMS, Lab on a Chip | ||
| 18A-6: 14:00-15:30 Symp. A. Computational Lithography III | 18B-6: 13:50-15:30 Nanomaterials III | 18C-6: 13:50-16:00 NanoTool |
| 18A-4, 5, 6: 15:30-15:45, Author's Interview | 18B-4, 5, 6: 15:30-15:45, Author's Interview | 18C-6: 16:00-16:15, Author's Interview |
| Room D-1 and D-2 (2F) | ||
| 18D-7: 16:00-18:00 Poster Session I Room D-1: DUV, EUV Lithography and Metrology, Electron- and Ion-Beam Lithography, Resist Materials and Processing, Nanodevices, Nanofabrication, Room D-2: Nanomaterials, Nano-Tool, Nanoimprint, Nanoprint and Rising Lithography, Bio MEMS, Lab on a Chip, Microsystem Technology and MEMS | ||
| Room A (3F) | ||
| 18:15-20:15 Banquet | ||
Thursday, November 19
| Room A (3F) | Room B (3F) | Room C (3F) |
|---|---|---|
| 19A-8: 9:00-10:50 Nano-Carbon Devices | 19B-8: 9:00-10:40 Nanofabrication I | 19C-8: 9:00-10:50 Electron- and Ion-Beam Lithography |
| 19C-8: 10:50-11:05, Author's Interview | ||
| Room D-1 and D-2 (2F) | ||
| Coffee Break | ||
| Room A (3F) | Room B (3F) | Room C (3F) |
| 19A-9: 11:10-12:50 Nanowire Devices | 19B-9: 11:00-12:50 Nanofabrication II | 19C-9: 11:10-13:00 Resist Materials and Processing I |
| 19A-8, 9: 12:50-13:05, Author's Interview | 19B-8, 9: 12:50-13:05, Author's Interview | |
| Lunch | ||
| Room D-1 and D-2 (2F) | Room C (3F) | |
| 19D-10: 14:10-16:10 Poster Session II Room D-1: Nanodevices, Nanofabrication, Nanomaterials, Room D-2: Nano-Tool, Nanoimprint, Nanoprint and Rising Lithography, Bio MEMS, Lab on a Chip, Microsystem Technology and MEMS | 19C-10: 14:10-16:10 Resist Materials and Processing II | |
| 19C-9, 10: 16:10-16:25, Author's Interview | ||