| Committee Members |
|
|
| Organizing Committee |
| Chair |
S. Kasai (Hokkaido Univ.) |
|
| Vice Chair |
T. Chikyow (NIMS) |
|
| Members |
|
|
| J. Ahn (Hanyang Univ.) |
E.-K. Kim (Hanyang Univ.) |
S. Okazaki (ALITECS) |
| S. Akita (Osaka Pref. Univ.) |
Y.M. Kim (Dankook Univ.) |
Y. Ono (Shizuoka Univ.) |
| H. Arimoto (AIST) |
A. Kohno (Fukuoka Univ.) |
S. Sato (Fujitsu Labs.) |
| K. Asakawa (Toshiba Memory) |
H. Kotera (RIKEN) |
T. Sato (Toshiba Memory) |
| T. Asano (Kyushu Univ.) |
T. Kozawa (Osaka Univ.) |
M. Suzuki (Kyoto Univ.) |
| H. Azuma (Canon) |
S. Matsui (Univ. of Hyogo) |
T. Tsuchiya (Kyoto Univ.) |
| Y. Hirai (Osaka Pref. Univ.) |
T. Meguro (Tokyo Univ. of Sci.) |
H. Yaegashi (Tokyo Electron) |
| T. Horiuchi (Tokyo Denki Univ.) |
Y. Miyamoto (Tokyo Inst. of Technol.) |
H. Yamashita (Nuflare Technol.) |
| T. Ichiki (Univ. of Tokyo) |
M. Nagase (Univ. of Tokushima) |
A. Yamaguchi (Hitachi) |
| K. Ishibashi (RIKEN) |
K. Nishiguchi (NTT) |
H. Yamaguchi (NTT) |
| T. Itani (Osaka Univ.) |
Y. Ochiai (JST) |
|
|
|
|
| Advisory Members |
| K. Aoyagi (Ritsumeikan Univ.) |
D. Kern (Univ. of Tubingen) |
R. Shimizu (Osaka Univ.) |
| A. Boisen (DTU Nanotech) |
M. Komuro (KEK) |
S. Shoji (Waseda Univ.) |
| S. Cabrini (Lawrence Berkeley Natl. Lab.) |
J. Melngailis (Univ. of Meryland) |
H.I. Smith (MIT) |
| C.Y. Chang (Natl. Nano Device Lab.) |
S.-K. Min (Kyung Hee Univ.) |
T. Sugano (Emeritus, Univ. of Tokyo) |
| T. Fukui (Emiritus, Hokkaido Univ.) |
L. Montelius (INL) |
T. Tagawa (Osaka Univ.) |
| K. Gamo (Emeritus,Osaka Univ.) |
L. Muray (KLA Tencor) |
M. Takai (Emeritus,Osaka Univ.) |
| K. Hane (Tohoku Univ.) |
A.R. Neureuther (UC Berkeley) |
S. Tan (INTEL Intel) |
| L.R. Harriott (Univ. of Virginia) |
S.W. Pang (City Univ. of Hong Kong) |
S. Tedesco (Leti) |
| C.L. Henderson (Georgia Tech.) |
R.F.W. Pease (Stanford Univ.) |
J. Wiesner (Nikon Precision) |
| Y. Horiike (Univ. of Tsukuba) |
F. Perez-Murano (IMB-CNM) |
S. Wurm (SEMATECH) |
| S. Ishihara (Univ. of Tokyo) |
K. Ronse (IMEC) |
|
| S.S. Keller (DTU Nanotech) |
M. Roukes (Caltech) |
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|
|
|
| Steering Committee Members |
| Chair |
T. Kozawa (Osaka Univ.) |
|
| Vice Chair |
T. Tsuchiya (Kyoto Univ.) |
|
| Program |
Y. Ono (Shizuoka Univ.) |
|
|
T. Sato (Toshiba Memory) |
K. Nishiguchi (NTT) |
| Exhibition |
H. Takemura (GenISys) |
|
| Treasure |
H. Yamashita (NuFlareTechnol.) |
|
| Contribution |
H. Yamazaki (Tokyo Ohka) |
|
| Public |
S. Nagahara (Tokyo Electron) |
|
| Local |
H. Kaiju (Hokkaido Univ.) |
K. Tomioka (Hokkaido Univ.) |
|
K. Ueno (Hokkaido Univ.) |
|
| Overseas |
A. Chen (ASML) |
S.W. Hwang (Samsung Advanced Inst. of Technol.) |
|
C.K. Sung (National Tsing Hua Univ.) |
H.Y. Low (Singapore Univ. of Technol. and Design) |
|
J.-K. Shin (Kyungpook Univ.) |
C.-Y. Lo (Natl. Tsing Hua Univ.) |
|
| Program Committee Members |
| Chair |
Y. Ono (Shizuoka Univ.) |
|
| Vice Chair |
T. Sato (Toshiba Memory) |
K. Nishiguchi (NTT) |
|
| 1-1: Photolithography and Patterning |
| Section Head |
T. Uchiyama (Toshiba Memory) |
|
| Sub Head |
J. Miyazaki (ASML) |
A. Yamaguchi (Hitachi) |
| Members |
J. Ahn (Hanyang Univ.) |
T. Harada (Univ. of Hyogo) |
| Y. Morikawa (DNP) |
H.-K. Oh (Hanyang Univ.) |
K. Oyama (Tokyo Electron) |
| G. Vandenberghe (IMEC) |
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|
|
| 1-2: Electron and Ion Beam Technologies |
| Section Head |
H. Yamashita (NuflareTechnol.) |
|
| Sub Head |
J. Yamamoto (Hitachi) |
H.S. Kim （Sun Moon Univ., Korea) |
| Sub Head |
K.-Y. Tsai （Natl. Taiwan Univ.） |
|
| Members |
H. Abe (Toshiba) |
S. Babin (A-Beam) |
| A. Kinomura (Kyoto Univ.) |
M. Kotera (Osaka Inst. of Technol.) |
J. Yanagisawa (Univ. of Shiga Pref.) |
|
| 1-3: Resist and Directed Self-Assembly |
| Section Head |
T. Azuma (EIDEC) |
|
| Sub Head |
T. Nagai (JSR) |
S.O. Kim (KAIST) |
| Members |
H. W. Kim (Samsung) |
D.H. Kim (Ewha Univ.) |
| C. Lim (SK Hynix) |
S.-J. Jeong (SAIT)
|
S. Nagahara (Tokyo Electron) |
| H. Oizumi (Gigaphoton) |
K. Okamoto (Osaka Univ.) |
H. Yamamoto (QST) |
| H. Yoshida (Hitachi) |
K. Yoshimoto (Kyoto Univ.) |
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|
| 2-1 Nanocarbons |
|
|
| Section Head |
D. Kondo (Fujitsu Labs.) |
|
| Sub Head |
S. Okada (Univ. of Tsukuba) |
J.-H. Ahn (Yonsei Univ.) |
| Members |
A. Ando (AIST) |
S. Chiashi (Univ. of Tokyo) |
| G. Kalita (Nagoya Inst. of Technol.) |
M. Katagiri (Panasonic) |
S. Konabe (Hosei Univ.) |
| K. Maehashi (Tokyo Univ. of Agriculture and Technol.) |
K. Matsuda (Kyoto Univ.) |
R. Negishi (Osaka Univ.) |
| T. Takenobu (Nagoya Univ.) |
M. Tanemura (Nagoya Inst. of Technol.) |
K. Ueno (Saitama Univ.) |
| K. Yanagi (Tokyo Metropolitan Univ.) |
|
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|
|
| 2-2: Nanodevices |
|
|
| Section Head |
T. Yanagida (Kyushu Univ.) |
|
| Sub Head |
Y. Ishikawa (Nara Inst. of Sci. and Technol.) |
| Members |
N. Banno (NEC) |
Y. Chen (Fudan Univ.) |
| S. Hara (Hokkaido Univ.) |
Y. Hotta (Univ. of Hyogo) |
T. Maemoto (Osaka Inst. of Technol.) |
| T. Nozaki (AIST) |
M. Seki (Univ. of Tokyo) |
K. Takei (Osaka Pref. Univ.) |
| K. Uchida (Keio Univ.) |
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|
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| 2-3: Nanofabrication |
| Section Head |
S. Shingubara (Kansai Univ.) |
|
| Sub Head |
K. Takase (Nihon Univ.) |
|
| Sub Head |
Y.J. Hong (Sejong Univ.) |
|
| Members |
Ariando (Natl. Univ. of Singapore) |
T. Hasegawa (Waseda Univ.) |
| R. Hasunuma (Tsukuba Univ.) |
T. Kawashima (Tohoku Univ.) |
J.J. Lee (KIMM) |
| Y. Liu (AIST) |
T. Shimizu (Kansai Univ.) |
H. Tanaka (Kyushu Inst. of Technol.) |
| K. Tomioka (Hokkaido Univ.) |
J. Xu (Nanjing Univ.) |
|
|
|
|
| 2-4: Inorganic Nanomaterials |
| Section Head |
M. Osada (Nagoya Univ.) |
|
| Sub Head |
M. Suzuki (AIST) |
|
| Members |
A. Funatsu (Kumamoto Univ.) |
J. Kano (Okayama Univ.) |
| M. Tada (Tokyo Inst. of Technol.) |
T. Taniguchi (NIMS) |
T. Tsuchiya (NIMS) |
| E. Yamamoto (Nagoya Univ.) |
|
|
| |
|
|
| 2-5: Organic Nanomaterial |
| Section Head |
R. Hayakawa (NIMS) |
|
| Sub Head |
A. Masuhara (Yamagata Univ.) |
|
| Members |
N. Hiroshiba (Waseda Univ.) |
Y. Jeong （Korea Basic Sci. Inst.) |
F.S. Kim (Chung-Ang Univ.)
|
S. Masuo (Kwansei Gakuin Univ.) |
S. Nagano (Nagoya Univ.) |
| S. Takami (Tohoku Univ.) |
S. Yamamoto (Tohoku Univ.) |
|
|
|
|
| 2-6: NanoTool |
|
|
| Section Head |
R. Kometani (Univ. of Tokyo) |
|
| Sub Head |
K. Sugano (Kobe Univ) |
|
| Members |
T. Hoshino (Hirosaki Univ.) |
S. Hotta (Hitachi Hi-Technol.) |
| O. Kubo (Osaka Univ.) |
T. Namazu (Aichi Inst. of Technol.) |
Y. Sugiyama (Hitachi Hi-Tech Sci.) |
|
|
|
| 3: Nanoimprint, Hybrid-NIL, Biomimetics, and Functional Surfaces |
| Section Head |
A. Miyauchi (Tokyo Medical and Dental) |
|
| Sub Head |
J. Taniguchi (Tokyo Univ. of Sci.) |
H. Lee (Korea Univ.) |
F.-Y. Chang (Natl. Taiwan Univ. of Sci.
and Technol.) |
E.-S. Lee (Korea Inst. of Machinery
and Materials) |
H.Y. Low (Singapore Univ. of Technol.
and Design) |
| Members |
Y. Hirai (Osaka Pref. Univ.) |
J. Mizuno (Waseda Univ.) |
| M. Okada (Asahi Kasei) |
M. Okinaka (Canon) |
N. Sakai (Samsung R&D Inst. Japan) |
| Y. Shimazaki (Hitachi) |
K. Suzuki (AIST) |
|
|
|
|
| 4: BioMEMS, Lab on a Chip, and Nanobiotechnology |
| Section Head |
A. Matsumoto (Tokyo Medical and Dental) |
|
| Sub Head |
A. Miura (Hokkaido Univ.) |
|
| Members |
T. Akagi (Univ. of Tokyo) |
K. Furukawa (Meisei Univ.) |
| T. Hayashi (Tokyo Inst. of Technol.) |
S. Kumagai (Meijo Univ.) |
H. Nagai (AIST) |
| K. Tawa (Kwansei Gakuin Univ.) |
R. Tero (Toyohashi Univ. of Technol.) |
M. Tokeshi (Hokkaido Univ.) |
|
|
|
| 5: Microsystem Technology and MEMS |
| Section Head |
Y. Tomizawa (Toshiba) |
|
| Sub Head |
S. Nagasawa (Shibaura Inst. of Technol.) |
R. Takigawa (Kyushu Univ.) |
| Sub Head |
S.H. Kong (Kyungpook Univ.) |
|
| Members |
Y. Hasegawa (Hiroshima City Univ.) |
K. Iwami (Tokyo Univ. of Agriculture and Technol.) |
| S. Miyake (Kobe City College of Technol.) |
T. Nakakubo (Canon) |
T. Namazu (Aichi Inst. of Technol.) |
| D. Yamane (Tokyo Inst. of Technol.) |
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