MNC 2018, November 13-16, 2018 31st International Microprocesses and Nanotechnology Conference Sapporo Park Hotel, Sapporo, Japan Sister Conference           Conference Site     Home About MNC 2018 Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century. The MNC conference is now in its 31st year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology. Nov. 9 Transportation from New Chitose Airport   Sapporo Subway Nanboku Line from Sapporo to Nakajima Koen   One-Week Weather Forecasts in Sapporo A MNC 2018 Floor Plan(PDF) updated   On site Registration will be available during Nov. 13- Nov. 16 October 4 from Organizing Chair about Sapporo September 10 Sapporo Park Hotel (Conference Venue) is open as usual. August 18 A MNC 2018 PROGRAM has been updated. August 10 A site ''On-line REGISTRATION & Hotel Accommodation'' is available. An author notification has been sent out on August 10. A DSA 2018 Program has been updated. 1.Lithography and Related Technologies and Metrology 　1-1: Photolithography and Patterning 　1-2: Electron and Ion Beam Technologies 　1-3: Resist and Directed Self-Assembly 2:Nanotechnology 　2-1: Nanocarbons 　2-2: Nanodevices 　2-3: Nanofabrication 　2-4: Inorganic Nanomaterials 　2-5: Organic Nanomaterials 　2-6: NanoTool 3: Nanoimprint, Hybrid-NIL, Biomimetics, and Functional Surfaces 4: BioMEMS, Lab on a Chip, and Nanobiotechnology 5: Microsystem Technology and MEMS Symp. A: Nano-Metrology for Exploring the Limit Symp. B: Recent Progress of Atomic Layer Processing (ALP) Technology Symp. C: Thermal and electronic properties of nanoscale interfaces Symp. D: BioMEMS, Lab on a Chip, and Nanobiotechnology   AI Based Self-Driving Vehicles and Its Relation with Nano Electronics Tsuguo Nobe (Intel and Nagoya Univ., Japan)   EUV Lithography at Threshold of High-Volume Manufacturing and Beyond Anthony Yen (ASML, USA)   Materials Innovation and Integration for New Computing Paradigms Kirsten Moselund (IBM Research Zurich)

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