MNC 2018, November 13-16, 2018
31st International Microprocesses and Nanotechnology Conference
Sapporo Park Hotel, Sapporo, Japan





Area Title Name Affiliation
 Plenary AI Based Self-Driving Vehicles and Its Relation with Nano Electronics  Tsuguo Nobe  Intel and Nagoya University, Japan
 Anthony Yen  ASML, USA
 Kirsten Moselund  IBM Research Zurich, Switzealnd
 Symp. A: Nano-Metrology for Exploring the Limit Thin Films and Nanoparticles made from the Self-Assembly of Carbohydrates block copolymers  Redouane Borsali  University of Grenoble Alpes, France
CD SEM Metrology for the 5nm Technology Node and Beyond
 Gian Lorusso  imec, Belgium
X-ray based dimensional metrology for the semiconductor industry  Joe Kline  NIST, USA
 Takeshi Kato  Hitachi High-Technologies Corporation, Japan
X-ray nanoscopic phase imaging with grating interferometry  Atsushi Momose  Tohoku University, Japan
Development of EUV Phase Imaging Microscope for Mask-3D-Effect and Defect Evaluation  Tetsuo Harada  University of Hyogo, Japan
Symp. B: Recent Progress of Atomic Layer Processing (ALP) Technology      
Symp. C: Thermal and Electronic Properties of Nanoscale Interfaces(Tentative Title)     Shannon Yee  Georgia Institute of Technology, USA
   Weigang Ma  Tsinghua University, China
Symp. D: BioMEMS, Lab on a Chip, and Nanotechnology (Tentative Title)       Yoshikazu Hirai  Kyoto University, Japan
   Tetsuji Shimizu  AIST, Japan
   Kiichiro Tomoda  Osaka Medical College, Japan
   Tomohiro Hayashi  Tokyo Institute of Technology, Japan
 1-1: Photolithography and Patterning EUV material challenges and solutions  Geert Vandenberghe  imec, Belgium
 Hiroki Kawada  Hitachi High-Technologies Corporation, Japan
 1-2: Electron and Ion Beam      
 1-3: Resist and Directed Self-Assembly Defect reduction strategies for directed self-assembly process  Hyo Seon Suh  imec, Belgium
 2-1: Nanocarbons  Deepak Venkateshvaran  Univ. of Cambridge, UK
     Akimitsu Narita  Max Planck Institute for Polymer Research, Germany
 2-2: Nanodevices  Masakazu Nakamura  Nara Institute of Science and Technology (NAIST), Japan
 2-3: Nanofabrication Etched Ge Surface Treatment for Ge NW/fin FETs  Yao-Jen Lee  National Nano Device Labs. (NDL), Taiwan
 2-4: Inorganic Nanomaterials  Jun Akedo  AIST, Japan
 Kazuhito Tsukagoshi  NIMS, Japan
 Yun Li  Nanjing University, China
 2-5: Organic Nanomaterials Composite nanomaterial semiconductor inks for high performance printed transistors and near infrared photodectors  Yong-Young Noh  Dongguk University, Korea
Coordination Polymers Boost Nano- and Micro-Fabrication  Kenji Hirai  Hokkaido University, Japan
 2-6: Nano-Tool  Shinichi Ogawa  AIST, Japan
 3: Nanoimprint, Hybrid-NIL, Biomimetics, and Functional Surfaces     M.S.M. Saifullah   A*STAR, Singapore
 4: BioMEMS, Lab on a Chip, and Nanobiotechnology     Koji Ikuta  University of Tokyo, Japan
   Kenjiro Kimura  Kobe University, Japan
 5: Microsystem Technology and MEMS Highly sensitive spintronic strain-gauge sensor and Spin-MEMS microphone  Yoshihiko Fuji  Toshiba Corporation, Japan
Surface activated bonding of LiNbO3 and Si for optical microsystem  Ryo Takigawa  Kyushu University, Japan


Copyright(c) Since 2018, 31stt International Microprocesses and Nanotechnology Conference, All Rights Reserved.