MNC 2018, November 13-16, 2018
31st International Microprocesses and Nanotechnology Conference
Sapporo Park Hotel, Sapporo, Japan

Area Title Name Affiliation
 Plenary AI Based Self-Driving Vehicles and Its Relation with Nano Electronics  Tsuguo Nobe  Intel and Nagoya University, Japan
 Anthony Yen  ASML, USA
 Kirsten Moselund  IBM Research Zurich, Switzealnd
 Symp. A: Nano-Metrology for Exploring the Limit Thin Films and Nanoparticles made from the Self-Assembly of Carbohydrates block copolymers  Redouane Borsali  University of Grenoble Alpes, France
CD SEM Metrology for the 5nm Technology Node and Beyond
 Gian Lorusso  imec, Belgium
X-ray based dimensional metrology for the semiconductor industry  Joe Kline  NIST, USA
 Takeshi Kato  Hitachi High-Technologies Corporation, Japan
X-ray nanoscopic phase imaging with grating interferometry  Atsushi Momose  Tohoku University, Japan
Development of EUV Phase Imaging Microscope for Mask-3D-Effect and Defect Evaluation  Tetsuo Harada  University of Hyogo, Japan
Symp. B: Recent Progress of Atomic Layer Processing (ALP) Technology      
Symp. C: Thermal and Electronic Properties of Nanoscale Interfaces(Tentative Title)     Shannon Yee  Georgia Institute of Technology, USA
   Weigang Ma  Tsinghua University, China
Symp. D: BioMEMS, Lab on a Chip, and Nanotechnology (Tentative Title)       Yoshikazu Hirai  Kyoto University, Japan
   Tetsuji Shimizu  AIST, Japan
   Kiichiro Tomoda  Osaka Medical College, Japan
   Tomohiro Hayashi  Tokyo Institute of Technology, Japan
 1-1: Photolithography and Patterning EUV material challenges and solutions  Geert Vandenberghe  imec, Belgium
 Hiroki Kawada  Hitachi High-Technologies Corporation, Japan
 1-2: Electron and Ion Beam      
 1-3: Resist and Directed Self-Assembly Defect reduction strategies for directed self-assembly process  Hyo Seon Suh  imec, Belgium
 2-1: Nanocarbons  Deepak Venkateshvaran  Univ. of Cambridge, UK
     Akimitsu Narita  Max Planck Institute for Polymer Research, Germany
 2-2: Nanodevices  Masakazu Nakamura  Nara Institute of Science and Technology (NAIST), Japan
 2-3: Nanofabrication Etched Ge Surface Treatment for Ge NW/fin FETs  Yao-Jen Lee  National Nano Device Labs. (NDL), Taiwan
 2-4: Inorganic Nanomaterials  Jun Akedo  AIST, Japan
 Kazuhito Tsukagoshi  NIMS, Japan
 Yun Li  Nanjing University, China
 2-5: Organic Nanomaterials Composite nanomaterial semiconductor inks for high performance printed transistors and near infrared photodectors  Yong-Young Noh  Dongguk University, Korea
Coordination Polymers Boost Nano- and Micro-Fabrication  Kenji Hirai  Hokkaido University, Japan
 2-6: Nano-Tool  Shinichi Ogawa  AIST, Japan
 3: Nanoimprint, Hybrid-NIL, Biomimetics, and Functional Surfaces     M.S.M. Saifullah   A*STAR, Singapore
 4: BioMEMS, Lab on a Chip, and Nanobiotechnology     Koji Ikuta  University of Tokyo, Japan
   Kenjiro Kimura  Kobe University, Japan
 5: Microsystem Technology and MEMS Highly sensitive spintronic strain-gauge sensor and Spin-MEMS microphone  Yoshihiko Fuji  Toshiba Corporation, Japan
Surface activated bonding of LiNbO3 and Si for optical microsystem  Ryo Takigawa  Kyushu University, Japan

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