MNC 2018, November 13-16, 2018
31st International Microprocesses and Nanotechnology Conference
Sapporo Park Hotel, Sapporo, Japan





Area Title Name Affiliation
Plenary Tsuguo Nobe Intel, Japan
Anthony Yen ASML, USA
Kirsten Moselund IBM Research Zurich, Switzealnd
Symp. A: Nano-Metrology for Exploring the Limit Redouane Borsali CNRS-CERMAV, France
Gian Lorusso imec, Belgium
Joe Kline NIST, USA
Takeshi Kato Hitachi High-Technologies Corporation, Japan
Atsushi Momose Tohoku University, Japan
Tetsuo Harada University of Hyogo, Japan
1-1: Photolithography and Patterning Geert Vandenberghe imec, Belgium
Hiroki Kawada Hitachi High-Technologies Corporation, Japan
1-3: Resist and Directed Self-Assembly Hyo Seon Suh imec, Belgium
2-1: Nanocarbons Deepak Venkateshvaran Univ. of Cambridge, UK
2-2: Nanodevices Masakazu Nakamura Nara Institute of Science and Technology (NAIST), Japan
2-3: Nanofabrication Yao-Jen Lee National Nano Device Labs. (NDL), Taiwan
2-4: Inorganic Nanomaterials Jun Akedo AIST, Japan
Kazuhito Tsukagoshi NIMS, Japan
Yun Li Nanjing University, China
2-5: Organic Nanomaterials Yong-Young Noh Dongguk University, Korea
Kenji Hirai Hokkaido University, Japan
2-6: Nano-Tool Shinichi Ogawa AIST, Japan
5: Microsystem Technology and MEMS Yoshihiko Fuji Toshiba Corporation, Japan
Ryo Takigawa Kyushu University


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