MNC 2015, November 10-13, 2015
28th International Microprocesses and Nanotechnology Conference
Toyama International Conference Center, Toyama, Japan

On-line registration & Hotel accomodation site is available.

Abstract Deadline
July 1, 2015


Late News Paper Deadline
September 15, 2015

 Registration Deadline
October 21, 2015

Abstract will be published online
November 2, 2015

 JJAP Special Issue Deadline
November 30, 2015

 Next Conference
November 8-11, 2016
Kyoto, Japan 
Sister Conference
MNC 2014 Web Site
  MNE 2015_The Netherlands
September 21-24, 2015
Conference Site
Toyama International Conference Center

Home のページです

About MNC 2015 
Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 28th year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
Sep. 29, 2015 Updated Program including Late News Paper
August 12, 2015 Updated Registration and Hotel Accomodation site.
Updated Session Schedule &  Program
July 1, 2015 Extended Deadline for Submission of Abstract : July 6, 2015
Symposium A: Symposium on "Big Data" for Advanced Patterning
Symposium C: Next Generation Lab on a Chip
1.Lithography and Related Technologies and Metrology
 1-1: Advanced Photolithography
 1-2: Electron and Ion Beam Technologies
 1-3: Resist and Directed Self-Assembly
 2-1: Nanocarbons
 2-2: Nanodevices
 2-3: Nanofabrication
 2-4: Inorganic Nanomaterials
 2-5: Organic Nanomaterials
 2-6: NanoTool
3: Nanoimprint, Nanoprint and Rising Lithography
4: BioMEMS, Lab on a Chip
5: Microsystem Technology and MEMS


Symposium A: Symposium on "Big Data" for Advanced Patterning

Symposium B: Two Dimensional Nanomaterials

Symposium C: Next Generation Lab on a Chip

Jos Benschop (ASML, The Netherlands)

Dmitri B. Strukov (UC Santa Barbara, USA) 

Masaaki Nishijo(Ministry of Education, Culture, Sports, Science and Technology, Japan)

Copyright(c) Since 2015, 28th International Microprocesses and Nanotechnology Conference, All Rights Reserved.