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| Abstract Deadline |
July 1, 2014
July 6, 2014
Closed
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| Late News Paper Deadline |
 September 15, 2014
Closed
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Registration Deadline
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October 17, 2014
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| Abstract will be published online |
October 27, 2014
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| JJAP Special Issue Deadline |
November 30, 2014
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MNC 2014
Microprocesses and Nanotechnology play an important role of technical backbone
for constructing the advanced information communications society with ubiquitous
net works of the 21st century.
The MNC conference is now in its 27th year and is intended to provide a
forum for discussing lithography science and process technology using photon,
electron, ion, other energetic particles and nanomaterials. This conference
covers not only their applications to micro-and nano-structure fabrication
and related physics and devices, but also their fusion applications with
other fields like bio, medical information, and communication technology.
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| Nov.4-7 |
 MNC 2014 Conference site map and access
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| Oct. 31 |
Updated Floor Map (Eratta version)
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| Oct. 30 |
Prof. Seiichi Hata (Nagoya Univ.) who is an invited speaker was changed
to Assistant Prof. Mizue Mizoshiri in 6C-4: Process and Characterization
I.
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| Oct. 17 |
Pre-Registration site was closed. On-site registration will be available
at the Conference.
Technical Seminar in Japanese Registration Desk
November 4, 12:20 - 15:00 (1F Lobby)
Conference Registration Desk
November 4, 15:30 - 18:30 (1F Lobby)
November 5, 8:30 - 12:10 (1F Lobby)
November 5, 12:20 - 18:00 (3F Lobby)
November 6, 8:30 - 18:00 (3F Lobby)
November 7, 8:30 - 16:00 (3F Lobby)
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| Sep. 30 |
Updated Program ver 2 including Late News Paper's program |
| Sep. 9 |
Updated Submission site of JJAP (MNC special issue) and JJAP instraction site |
| August 14 |
Updated Program ver 1 and Session Schedule |
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Updated Technical seminer in Japanese site. |
| August 13 |
Updated Registration and Hotel Accomodation site. |
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Updated Hilton Fukuoka Sea Hawk (Conference site) Accomodation site. |
SCOPE
Symposium B ''Hybrid Nanosystem''
1.Lithography and Related Technologies and Metrology
1-1: Advanced Photolithography
1-2: Electron and Ion Beam Technologies
1-3: Resist and Directed Self-Assembly
2:Nanotechnology
2-1: Nanocarbons
2-2: Nanodevices
2-3: Nanofabrication
2-4: Inorganic Nanomaterials
2-5: Organic Nanomaterials
2-6: NanoTool
3: Nanoimprint, Nanoprint and Rising Lithography
4: BioMEMS, Lab on a Chip
5: Microsystem Technology and MEMS
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PLENARY SPEAKERS |
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Ffabrication, science, and applications of Van der Waals Heterostructures
James Hone (Columbia Univ., USA)
Nanotechnology to Develop “the Magic Bullet” for Targeted Cancer Therapy
Kazunori Kataoka (Univ. of Tokyo, Japan)
Adding New Capabilities to CMOS Integrated Circuits via Field-Assisted Directed Assembly of Nanowire and 2D Crystal Materials
Theresa Mayer (Penn State Univ., USA);
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| Alphabetical Order |
SYMPOSIUM
Symposium A ''Advanced Patterning''
Symposium B ''Hybrid Nanosystem''
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MNC 2013 Web Site
