| Organizing Committee Members |
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| Chair |
K. Ishibashi (RIKEN) |
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| Vice Chair |
T. Asano (Kyushu Univ.) |
Y. Miyamoto (Tokyo Inst. of Technol.) |
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| Members |
K. Asakawa (Toshiba) |
H. Kotera (Kyoto Univ.) |
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H. Arimoto (AIST) |
T. Kozawa (Osaka Univ.) |
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|
R. Ebinuma (Canon) |
S. Matsui (Univ. of Hyogo) |
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T. Fukui (Hokkaido Univ.) |
T. Meguro (Tokyo Univ. of Sci.) |
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K. Fujii (Renesas Electronics) |
M. Nagase (Univ. of Tokushima) |
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K. Hane (Tohoku Univ.) |
K. Nozaki (Fujits Labs.) |
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T. Horiuchi (Tokyo Denki Univ.) |
Y. Ochiai (AIST) |
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T. Ichiki (Univ. of Tokyo) |
S. Okazaki (Gigaphoton) |
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S. Ishihara (Univ. of Tokyo) |
J. Tanaka (Hitachi) |
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T. Itani (EIDEC) |
Y. Todokoro (Nara Inst. Sci. & Technol.) |
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M. Komuro (KEK) |
H. Yamaguchi (NTT) |
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| Advisory Members |
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K. Aoyagi (Ritsumeikan Univ.)
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R.F.W. Pease (Stanford Univ.)
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|
C. Y. Chang (Natl. Nano Device Lab.)
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K. Ronse (SEMATECH) |
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R.
Cheung (Univ. of Edinburgh)
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M. Roukes (Caltech)
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Z. Durrani (Imperial College London)
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S.W. Pang (City Univ. of Hong Kong) |
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K. Gamo (Prof. Emeritus,Osaka Univ.)
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R. Shimizu (Osaka Univ.)
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L.R. Harriott (Univ. of
Virginia)
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S. Shoji (Waseda Univ.)
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Y. Horiike (Univ. of Tsukuba)
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H.I. Smith (MIT)
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D. Kern (Univ. of Tubingen)
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T. Sugano (Prof. Emeritus, Univ. of Tokyo)
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J.
Melngailis (Univ. of Meryland)
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T. Tagawa (Osaka Univ.)
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W. Milne (Univ. of Cambridge)
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M. Takai (Prof. Emeritus,Osaka UNiv.)
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| S.-K. Min
(Kyung Hee University.) |
S.
Tedesco (Leti)
|
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| A.R. Neureuther (UC Berkeley) |
J. Wiesner (Nikon Precision) |
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| L.E. Ocola (Nanofabrication Group) |
S. Wurm (SEMATECH) |
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| Steering Committee Members |
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| Chair |
|
|
|
| Vice Chair |
T. Chikyow (NIMS) |
Y. Ono (Univ.of Toyama) |
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| Program |
S. Akita (Osaka Pref. Univ.) |
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|
|
K. Nishiguchi (NTT) |
T. Sato (Toshiba) |
|
| Exhibition |
H. Takemura (GenISys) |
S. Nagahara (Tokyo Electron) |
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| Tressure |
H. Yamashita (NuflareTechnol.) |
|
|
| Contribution |
T. Iwai (Tokyo Ohka) |
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|
| Public |
N. Samoto (JEOL) |
|
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| Local |
T. Asano (Kyushu Univ.) |
A. Kohno (Fukuoka Univ.) |
|
| Overseas |
J.H. Ahn (Hanyang Univ.) |
A. Chen (ASML) |
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|
O.H. Kim (POSTEC) |
J.-K. Shin (Kyungpook Univ.) |
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C.K. Sung (National Tsing Hua Univ.) |
T.-K. Ku (ITRI)Kyungpook National Univ.) |
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|
H.Y. Low (Singapore Univ. of Technol. and Design) |
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| Program Committee Members |
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| Chair |
S. Akita (Osaka Pref. Univ.) |
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| Vice Chair |
K. Nishiguchi (NTT) |
T. Sato (Toshiba) |
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| Vice Chair |
|
M. Nagase (Univ. of Tokushima) |
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| 1-1: Advanced Photolithography |
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|
|
Section Head |
J. Miyazaki (ASML) |
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Sub Head |
A. Yamaguchi (Hitachi) |
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Sub Head |
J.H. Ahn (Hanyang Univ.) |
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H. Futatsuya (Fujitsu Semiconductor) |
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H. Kawai (Nikon) |
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K. Oyama (Tokyo Electron) |
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Y. Morikawa (DNP) |
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M. Shibuya (Tokyo Polytechnic Univ.) |
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T. Uchiyama (Toshiba) |
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G. Vandenberghe (IMEC) |
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| 1-2: Electron and Ion Beam Technologies |
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|
Section Head |
H. Yamashita (NuflareTechnol.) |
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Sub Head |
J. Yamamoto (Hitachi) |
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Sub Head |
K.-Y. Tsai (National Taiwan Univ.) |
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S. Babin (A-Beam) |
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A. Kinomura (AIST) |
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M. Kotera (Osaka Inst. of Technol.) |
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S. Ogawa (AIST) |
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H. Nozue (NuflareTechnol.) |
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A. Yamada (Advantest) |
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J. Yanagisawa (Univ. of Shiga Pref.) |
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| 1-3: Resist and Directed Self-Assembly |
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Section Head |
S. Nagahara (Tokyo Electron) |
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Sub Head |
T. Azuma (Toshiba) |
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R. Gronheid (Imec) |
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T. Hirayama (Tokyo Ohka) |
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J. Kon (Fujitsu) |
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H. Oizumi (Gigaphoton) |
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K. Okamoto (Hokkaido Univ.) |
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T. Yamaguchi (NTT) |
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H. Yamamoto (Osaka Univ.) |
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H. Yoshida (Hitachi) |
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K. Yoshimoto (Kyoto Univ.) |
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2-1 Nanocarbons
|
|
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Section Head |
M. Tanemura (Nagoya Inst. of . Technol.) |
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Sub Head |
D. Kondo (Fujitsu Labs.) |
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Sub Head |
J.-H. Ahn (Yonsei Univ.) |
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H. Ago (Kyushu Univ.) |
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S. Chiashi (Univ. of Tokyo) |
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G. Kalita (Nagoya Inst. of Technol.)
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K. Hirahara (Osaka Univ.) |
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K. Maehashi (Tokyo Univ. of Agriculture. and Technol.) |
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S. Okada (Univ. of Tsukuba) |
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T. Takenobu (Waseda Univ.) |
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K. Ueno (Saitama Univ.) |
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| 2-2: Nanodevices |
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|
Section Head |
Y. Ishikawa (Nara Inst. of Sci. and Technol.) |
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Sub Head |
H. Ikeda (Shizuoka Univ.) |
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|
Sub Head |
J.-T. Sheu (National Chiao Tung Univ.) |
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Sub Head |
S. W. Hwang (Samsung Advanced Inst. of Technol. ) |
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N. Banno (Leap) |
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Y. Chen (Fudan Univ.) |
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N. Clement (CNRS) |
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T. Maemoto (Osaka Inst. of Technol.) |
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K. Nishiguchi (NTT) |
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T. Tanaka (Saga Univ.) |
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T. Yanagida (Osaka Univ.) |
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| 2-3: Nanofabrication |
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|
Section Head |
S. Shingubara (Kansai Univ.) |
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Sub Head |
K. Takase (Nihon Univ.) |
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T. Hasegawa (NIMS) |
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R. Hasunuma (Tsukuba Univ.) |
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K.-B. Kim (Seoul Natl. Univ.) |
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A. Kohno (Fukuoka Univ.) |
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Y. Liu (AIST) |
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K. Makihara (Nagoya Univ.) |
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T. Shinada (Tohoku Univ.) |
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K. Tomioka (Hokkaido Univ.) |
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| 2-4: Inorganic Nanomaterials |
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|
Section Head |
K. Terabe (NIMS) |
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Sub Head |
Y. Matsumoto (Tohoku Univ.) |
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Sub Head |
E.K. Kim (Hanyang Univ.) |
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G.-S. Heo (Korea Inst. of Industrial Technol.) |
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T. Higuchi (Tokyo Univ. of Sci.) |
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K. Kobayashi (NIMS) |
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T. Ohno (Tohoku Univ.) |
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Y. Naitou (AIST) |
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|
X.W. Zhao (Tokyo Univ. of Sci.) |
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| 2-5: Organic Nanomaterials |
|
|
Section Head |
S. Takami (Tohoku Univ.) |
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|
Sub Head |
H. Kasai (Tohoku Univ.) |
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R. Hayakawa (NIMS) |
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K. Noda (Keio Univ.) |
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Y. Takenaka (AIST) |
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Y. Masuhara (Yamagata Univ.) |
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J. Matsui (Yamagata Univ.) |
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| 2-6: NanoTool |
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|
Section Head |
R. Kometani (Univ. of Tokyo) |
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Sub Head |
K. Sugano (Kobe Univ.) |
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T. Hoshino (Univ. of Tokyo) |
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S. Hotta (Hitachi) |
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T. Ichii (Kyoto Univ.) |
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O. Kubo (Osaka Univ.) |
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T. Kawano (Toyohashi Univ. of Technol.) |
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|
Y.-H. Lin（Chang Gung Univ.) |
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T. Namazu (Univ. of Hyogo) |
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Y. Sugiyama (Hitachi Hi-Tech. Sci.) |
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Y. Yamanishi (Shibaura Inst. of Technol.) |
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| 3: Nanoimprint, Nanoprint and Rising Lithography |
|
|
Section Head |
A. Yokoo (NTT) |
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Sub Head |
J. Taniguchi (Tokyo Univ. of Sci.) |
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|
Sub Head |
F.-Y. Chang (National Taiwan Univ. of Sci. and Technol.) |
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|
Sub Head |
H. Lee (Korea Univ.) |
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|
Sub Head |
E.-S. Lee (Korea Inst. of Machinery and Materials) |
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|
Sub Head |
H.Y. Low (Singapore Univ. of Technol. and Design) |
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Y. Hirai (Osaka Pref. Univ.) |
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H. Hiroshima (AIST) |
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A. Miyauchi (Hitachi) |
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M. Okinaka (Canon) |
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N. Sakai (Sumsung R&D Inst. Japan) |
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| 4: BioMEMS, Lab on a Chip |
|
|
Section Head |
M. Tokeshi (Hokkaido Univ.) |
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Sub Head |
H. Hisamoto (Osaka Pref. Univ.) |
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Sub Head |
F.-G. Tseng (National Tsing Hua Univ.) |
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K. Furukawa (NTT) |
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T. Ichiki (Univ. of Tokyo) |
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A. Matsumoto (Tokyo Medical and Dental Univ.) |
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Y. Murakami (Toyohashi Univ. of Technol.) |
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Y. Takamura (JAIST) |
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K. Tawa (AIST) |
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| 5: Microsystem Technology and MEMS |
|
|
Section Head |
N. Miki (Keio Univ.) |
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Sub Head |
T. Namazu (Univ. of Hyogo) |
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|
Sub Head |
W. Fang (National Tsing Hua Univ.) |
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Sub Head |
J.-W. Hsieh (Asia Pacific Microsystems) |
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|
Sub Head |
S.H. Kong (Kyungpook Univ.) |
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T. Ando (Ritsumeikan Univ.) |
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D. Fujisawa (Mitsubishi Electric) |
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E. Iwase (Waseda Univ.) |
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M. Kiuchi (Sumitomo Precision Products) |
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S. Nagasawa (Shibaura Univ.) |
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T. Sakata (NTT) |
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M. Sohgawa (Niigata Univ.) |
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Y. Tomizawa (Toshiba) |
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