MNC 2010, 23rd International Microprocesses and Nanotechnology Conference
November 9-12, 2010, Rihga Royal Hotel Kokura, Fukuoka, Japan




　
PLENARY SPEAKERS 
  
   
 Prof. Masayoshi Esashi
(Tohoku Univ.) 		 Dr. Michael Roukes
(Kavli Nanoscience Inst.
California Inst. of Technol.) 		   Dr. Sam Sivakumar
(INTEL)		  
 ''Prospect of Micro/
Nanotechnology for
Fusion in Microelectronics"		 ''Large-Scale Integration
of Nanosystem'' 		  ''Managing the Technical and
Economic Challenges of
Next-Generation Lithography''		  

SPECIAL KEYNOTE LECTURE

''Toward Self-Powered Nanosystems: Nanogenerators, Piezotronics and Piezo-Phototronics''
　　Zhong Lin Wang(Georgia Institute of Technology)

''MEB ML2 Performance,　Expectation, and Plan at TSMC''
　　Burn Lin（Senior director of micropatterning division at TSMC) 

''EUV Lithography: Status and Challenges''
　　Ichiro Mori (Selete)

SESSION INVITED SPEAKERS
 
Symposium A
Cost-Effective Efficient Litho Technologies
- Holding the Keys to "Green Lithography"
'Lithography – Green and Getting Greener "
　　Harry J. Levinson (GlobalFoundries)

''Lithography Strategy for 2x Memory Device and beyond Aiming at Cost-effectiveness''
　　Suigen Kyoh (Toshiba)
''Environmentally-Friendly Immersion Scanner: NSR-S620D''
　　Motokatsu Imai (Nikon)

''Cost effective shrink with EUV Update on ASML's NXE Platform''
　　Christian Wagner / Rudy Peters (ASML)　

''Realizing Laser Produced Plasma EUV Source for HVM''
　　James Bonafede (Cymer)

"Cost-Effective Litho/Track Technologies"
　　Minoru Kubota (Tokyo Electron)

"Materials Development for Cost Effective Lithography and Patterning Extensions."
　　Ralph R. Dammel (AZ Electronic Materials)

''Use Efficiency of Photon, Electron, and Proton in Chemically Amplified Resists -Resist Design for Cost Effective Lithography''
　　Takahiro Kozawa (Osaka Univ.)

''Next Generation Computational Lithography''
　　Robert Socha(ASML)

''CD-SEM Metrology for Cost-Effective Lithography Techniques''
　　Atsuko Yamaguchi (Hitachi)

''Graphoepitaxy of Amphiphilic Liquid Crystalline Diblock Copolymers''
　　Toru Yamaguchi (NTT)

''Research and Development on Process Science and CD Control in High-Throughput UV Nanoimprint''
　　Shinji Matsui (Univ. of Hyogo)

1-3:Resist Materials and Processing
　　Vivek M. Prabhu (NIST)　  Withdrawn

2-0: Nano Carbon
''A New Transfer Process of Epitaxial Graphene''
　　Akihiro Hashimoto (Fukui Univ.)

2-2:Nanofabrication
''Scaling Issues on Direct High-k/Si and Size Effects on Ni Silicides for　Si Nanowires''
　　Kuniyuki Kakushima (Tokyo Inst. of Technol.)

2-4: Nano Tool
"Conformational Dynamics of Biological Molecules Captured by High-Speed AFM"
　　Takayuki Uchihashi (Kanazawa Univ.)

3:Nanoimprint, Nanoprint and Rising Lithography
''3-D Hierarchical Micro and nano - structures via Nanoimprinting''
　　Hong Yee Low (IMRE)

''Process Simulation in Nanoimprint Lithography''
　　Yoshihiko Hirai (Osaka Pref. Univ.)

4: Bio MEMS, Lab on a Chip
''Applications of Lab-on-a-Chip Devices in Biotechnology, Medicine and Clinical Diagnostics''
　　Manabu Tokeshi (Nagoya Univ.)

5:Microsystem Technology and MEMS
''Human Activity Monitoring by MEMS Sensing Fusion''
　　Kazusuke Maenaka (Univ. of Hyogo)

''Prof. Franco Cerrina Tribute''
 　 Sunao Ishihara (Univ. of Tokyo)


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