MNC 2010, 23rd International Microprocesses and Nanotechnology Conference
November 9-12, 2010
, Rihga Royal Hotel Kokura, Fukuoka, Japan






MNC 2010 Committee Chairs
       
Organizing Chair:
Tanemasa Asano
(Kyushu Univ.)
Organizing Vice Chair:
Hiroshi Yamaguchi
(NTT) 
Steering Chair:
Toshiro Itani
(Selete) 
Steering Vice Chair:
Yasuyuki Miyamoto
(Tokyo Inst. of Technol.) 
       
Program Chair:
Takashi Meguro
(Tokyo Univ. of Sci.) 
 Program Vice Chair:
Seiji Akita
(Osaka Pref. Univ.)
Program Vice Chair:
Takahiro Kozawa
(Osaka Univ.) 
 


Organizing Committee Members
Chair 
Vice Chair

Members
T. Asano (Kyushu Univ.)
H. Yamaguchi (NTT)

H. Arimoto (AIST) @@
R. Ebinuma (Canon)
K. Fujii (Renesas Electronics)
T. Fukui (Hokkaido Univ.)
N. Fukushima (Toshiba)
K. Hane (Tohoku Univ.)
N. Hayashi (Dai Nippon Printing)
T. Horiuchi (Tokyo Denki Univ.)
K. Ishibashi (Riken)
A. Ishihama (Sharp)
S. Ishihara (Univ. of Tokyo)

M. Kameyama (Nikon)



M. Komuro (NEDO)
S. Matsui (Univ. of Hyogo)
I. Mori (Selete)
Y. Ochiai (Toyo Gosei)
S. Okazaki (EUVA)
S. Sato (Fujitsu Labs.)
S. Shoji (Waseda Univ.)
S. Tagawa (Osaka Univ.)
Y. Todokoro (Nara Inst. Sci. & Technol.)
A. Tokui (Nikon)
S. Zaima (Nagoya Univ.) 
Advisory Members
H. Ahmed (Cambridge Univ.)
Y. Aoyagi (Ritsumeikan Univ.)
C.Y. Chang (Natl. Nano Device Lab.)
S.Y. Chou (Princeton Univ.)
E. Dobisz (Hitachi San Jose Res.)
M. Feldman (Louisiana State Univ.)
F. Fortagne (Leica Microsystem)
K. Gamo (Osaka Univ.)
M. Gentili (Inovation & Technol. Management)
S. De Gendt (IMEC)
L.R. Harriott (Univ. of Virginia)
Y. Horiike (NIMS)
O. Joubert (CRS-LTM)
D. Kern (Univ. of Tubingen)
H.W.P. Koops (NaWoTec GmbH)
J. Melngailis (Univ. of Meryland)
S.-K. Min (Kyung Hee Univ.)
A.R. Neureuther (UC Berkeley)
R.F.W. Pease (Stanford Univ.)
K. Ronse (IMEC)
F. Schellenberg (Widerkehr and Associates)
R. Shimizu (IIAS)
C. Shih (ERSO/ITRI)
H.I. Smith (MIT)
T. Sugano (Univ. of Tokyo)
M. Takai (Osaka Univ.)
S. Tedesco (Leti)
T. Tsurushima (Kyushu Univ.)
M. De Vittorio (Univ. of Salento)
M. Wang (China Academic Sci.)
J. Wiesner (Nikon Precision)
N. Yokoyama (Fujitsu Labs.)
Steering Committee Members
Chair
Vice Chair
Program
Secretary&Tressure
Seminar
Public
Exhibition&Sponsor

Place
Overseas

T. Itani (Selete)
Y. Miyamoto (Tokyo Inst. of Technol.)
T. Meguro (Tokyo Univ. of Sci.)
Y. Ono (NTT)
S. Akita (Osaka Pref. Univ.)
T. Kozawa (Osaka Univ.)
N. Samoto (JEOL)
K. Tohmezuka (Tokyo Electron)
M. Arikawa (Frontier Carbon)
J.H. Ahn (Hanyang Univ.)
O.H. Kim (POSTEC)



J. Fujita (Univ. of Tsukuba)
J. Fujita (Univ. of Tsukuba)
H. Yamashita (HOYA)
N. Taneichi (Tokyo Ohka)


A. Chen (ASML)
C.K. Sung (National Tsing Hua Univ.)
Program Committee Members
Chairperson:
Vice-Chairpersons:

T. Meguro (Tokyo Univ. of Sci.)
S. Akita (Osaka Pref. Univ.)
T. Kozawa (Osaka Univ.)
1-1:DUV, EUV Lithography and Metrology
Section Head:
Sub Head:


Members:
T. Sato (Toshiba)
S. Nagahara (Renesas Electronics)
J. Ahn (Hanyang Univ.)

H. Futatsuya (Fujitsu Microelectronics)
M. Shibuya (Tokyo Polytechnic Univ.)
J. Kitano (Tokyo Electron) )
J. Miyazaki (ASML)

H. Mohri (DNP)
T. Yahiro (Nikon)
A. Yamaguchi (Hitachi)
1-2:Electron- and Ion-Beam Lithography
Section Head:
Sub Head:


Members:
Y. Miyamoto (Tokyo Inst. of Technol.)
J. Yanagisawa (Univ. of Shiga Pref.)
K.-Y. Tsai (National Taiwan Univ.)

S. Babin (aBeam Technology)
M. Kotera (Osaka Inst. of Technol.)
H. Nozue (Nuflare)

K. Ogino (Fujitsu)
A. Yamada (Advantest)
J. Yamamoto (Hitachi)
Y. Yamamoto (SII Nanotechnology)
H. Yamashita (HOYA)
1-3:Resist Materials and Processing
Section Head:
Sub Head:

Members:
T. Kozawa (Osaka Univ.)
H. Oizumi (Selete)

T. Azuma (Toshiba)
K. Maruyama (JSR)
T. Hirayama (Tokyo Ohka)
H. Kudo (Kanagawa Univ.)
S. Masuda (Fuji Film)
K. Nakano (NEC)
K. Nozaki (Fujitsu)
K. Okamoto (Hokkaido Univ.)
I. Takemoto (Sumitomo Chemical)
T. Yamaguchi (NTT)
2-0:Nanocarbon
Section Head:
Sub Head:

Members:
M. Nagase (Tokushima Univ.)
K. Maehashi (Osaka Univ.)

J. Fujita (Univ. of Tsukuba)
H. Fukidome (Tohoku Univ.)
K. Hirahara (Osaka Univ.)
T. Kaneko (Tohoku Univ.)
M. Nagashio (Univ. of Tokyo)
M. Ohfuti (Fujitsu)
T. Takenobu (Waseda Univ.)
M. Tanemura (Nagoya Inst. of Technol.)
2-1:Nanodevices 
Section Head:
Sub Head:




Members:
Y. Ohno (Nagoya Univ.)
K. Nishiguchi (NTT)
T.-S. Chao(National Chiao Tung Univ.)
S. W. Hwang (Korea Univ.)
J.-T. Sheu (National Chiao Tung Univ.)

N. Banno (NEC)
H. Ikeda (Shizuoka Univ.)
S. Kasai (Hokkaido Univ.)
T. Maemoto (Osaka Inst. of Technol.)
2-2:Nanofabrication
Section Head:
Sub Head:

Members:
M. Masahara (AIST)
T. Hasegawa (NIMS)

T. Asahi (Ehime Univ.)
Y. Ishikawa (Univ. of Tokyo)
A. Kohno (Fukuoka Univ.)
T. Kobayashi (Riken)
T. Komeda (Tohoku Univ.)
S. Shingubara (Kansai Univ.)
K. Takase (Nihon Univ.)
T. Hasunuma (Tsukuba Univ.)
2-3:Nanomaterials
Section Head:
Sub Head:


Members:
T. Chikyo (NIMS)
Y. Matsumoto (Tokyo Inst. of Technol.)
E.-K. Kim (Hanyang Univ.)

T. Ishida (AIST)
M. Lippmaa (Univ. of Tokyo)
T. Mano (NIMS)
T. Miyazawa (Univ. of Tokyo)
K. Tanii (Waseda Univ.)
X.W. Zhao (Tokyo Univ. of Sci)
2-4:Nano-Tool
Section Head:
Sub Head:

Members:
S. Akita (Osaka Pref. Univ.)
S.Takahashi (Univ. of Tokyo)

H. Ina (Canon)
M. Kitazawa (Olympus)
D.-W. LeeiChonnam National Univ.)
G. Dai (Physikalisch-Technische)
Y. Mitsui (Hitachi Hightechnologies)
M. Miyoshi (Univ. of Tokyo)
T. Ono (Tohoku Univ.)
M. Yasutake (SII Nano technol.j
3:Nanoimprint, Nanoprint and Rising Lithography
Section Head:
Sub Head:




Members:
H. Hiroshima (AIST)
A. Yokoo (NTT)
F.-B. Hsiao (National Cheng Kung Univ.)
H. Lee (Korea Univ.)
F.-Y. Chang (National Taiwan Univ.)

Y. Hirai (Osaka Pref. Univ.)
A. Miyauchi (Hitachi)
M. Okinaka (Canon)
N. Sakai (Samsung Yokohama Res. Inst.)
J. Taniguchi (Tokyo Univ. of Sci.)
4:Bio MEMS, Lab on a Chip
Section Head:
Sub Head:



Members:
Y. Takamura (JAIST)
Y. Murakami (Hiroshima Univ.)
G.-B. Lee (Natioal Cheng Kung Univ.)
F.-G. Tseng (National Tsing Hua Univ.)

T. Horiuchi (NTT)
T. Ichiki (Univ. of Tokyo)
H. Takei (Toyo Univ.)
Y. Miyahara (Tokyo Medical and Dental Univ.)
5:Microsystem Technology and MEMS
Section Head:
Sub Head:




Members:
T. Ikehara (AIST)
H. Takao (Kagawa Univ.)
J. Hsieh (Asia Pacific Microsystems)
W. Fang (National Tsing Hua Univ.)
J.-K. Shin (Kyungpook Univ.)

Y. Kanamori (Tohoku Univ.)
N. Miki (Keio Univ.)
T. Namazu (Univ. of Hyogo)
M. Sohgawa (Osaka Univ.)
D. Takamuro (Mitsubishi Electric)



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