1-1: Lithography and Metrology
This session focuses on DUV, EUV, Immersion Lithography, and Computational Lithography including OPC, SMO, DFM. In addition, Metrology such as SEM and Scatterometry, and Mask related topics are included.
Electron- and Ion-Beam Lithography Electron and ion beam technologies such as lithography, metrology, inspection and repair tools. Other related technologies using charged particle beams are also welcome.
1-2: Resist Materials and Processing
Resist materials(EUV, immersion, double patterning, DUV, EB, X-ray, multilayer, inorganic, molecular glass, directed self-assembly etc.), antireflective coatings, polyimide, adhesive, and other materials related to lithography. resist processes(PEB，development, rinse，resist removal, etching etc.), characterization, line edge roughness, trade-off problem, outgassing, modeling and simulation of resist process (exposure, acid diffusion, development etc.). materials and processes for the production of flat-panel display, photonics devices, and electronics packaging.
Nanocabons, such as carbon nanotube, fullerene, graphene and nanomaterials containing graphite and diamond, and their related technologies including growth, fabrications, nanoelectronics, nanophotonics, nanomechanics, devices and integration.
Nanodevices utilizing nanostructures and nanomaterials. The target is more
Moore, more than Moore, and beyond CMOS: nanoscale transistors, memories,
sensors, and new conceptual electrical/magnetic devices. Optical devices
such as LEDs, lasers, and detectors promising for optical interconnection
and other advanced applications are included. Energy harvesting devices,
e.g., solar cells, thermoelectric elements, and piezoelectric elements,
are also in our scope.
Fabrication of nanostructures. Fabrication techniques such as scanning
probe techniques, self-organizing techniques, etc. Physics and chemistry
in nanofabrication processes. Etching, deposition, and related subsurface
processing using photon, electron- and ion-beams, plasma, and thermal energy.
Emerging technologies are also welcome.
Theory, properties, characterization and application of nanomaterials such as semiconductor materials, functional oxides,spintronics materials, layered structure, quantum dots, nano-particles, nanowires, and organic, molecules. Materials prepared by atomic layer control, self-organized or bottom-up approach is also included.
2-4: Nano Tool
Nano-electromechanical system (NEMS), Nano-mechanics, Nanometrology, Metrology
and repair for nanosystem, Novel observation and fabrication methods based
on microscopic techniques, such as scanning probe microscopy (SPM), scanning
electron microscopy (SEM) and focused ion beam (FIB).
3: Nanoimprint, Nanoprint and Rising Lithography
This session focuses nanoimprint system, process, material, applications and related inspection and metrology. Other novel nano-patterning technologies are also included.
4: BioMEMS, Lab on a Chip
Micro/Nano Electromechanical Systems (M/NEMS) are now widely applied to Chemical, Biochemical, Medical and Environmental fields, and a new research field called μ-TAS or Lab-on-a-Chip is expanding. Fusion of microelectronic devices with materials and methods in those fields is expected to open up new scientific and business areas. Papers are solicited in the following areas (but not limited): (1) MEMS/NEMS devices for Chemical, Biochemical, Medical and Environmental fields, (2) μ-TAS and Lab-on-a-chip, (3) Bio-chips for DNA, proteins and cells, (4) Fabrication technologies for (1), (2), (3).
5: Microsystem Technology and MEMS
Technologies for fabrication, design, and characterization of micro electromechanical
systems (MEMS) which include sensors, microactuators, optical devices,
RF devices, etc. Integration and packaging techniques are also welcome.