MNC 2016, November 8-11, 2016 29th International Microprocesses and Nanotechnology Conference ANA Crowne Plaza Kyoto, Kyoto, Japan Pre-Registration site was closed. On-site registration will be available at the Conference.   We strongly recommend you to secure an accommodation as early as possible as November is the tourist period in Kyoto.    MNC 2016 Announcement Abstract Deadline July 1, 2016 July 6, 2016 Closed   Late News Paper Deadline September 15, 2016 Closed  Registration Deadline October 18, 2016 Closed Abstract will be published online October 31, 2016  JJAP Special Issue Deadline November 30, 2016  Next Conference November 6-9, 2017 Ramada Plaza Jeju Hotel, Jeju Island, Korea  Sister Conference MNC 2015 Web Site EIPBN 2016_Pittsburgh, PA, USA, May 31- June 2, 2016   MNE 2016_Vienna, Austria, September 19-23, 2016 Conference Site ANA Crowne Plaza Kyoto, Kyoto, Japan Satellite Event A2nd French-Japanese Workshop on Micro & Nanotechnology, Kyoto Univ, Japan, November 8, 2016     Home About MNC 2016 Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century. The MNC conference is now in its 29th year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology. Dec. 28, 2016 linked MNC 2017 Web Site. Oct.31, 2016 Updated Floor Plan Oct.13, 2016 Updated Plenary and Invited List Sep. 28, 2016 Updated Program including Late News Paper August 12, 2016 Updated Session Schedule &  Program August 3, 2016 Updated Registration and Hotel Accomodation site. July 1, 2016 Extended Deadline for Submission of Abstract : July 6, 2015 1.Lithography and Related Technologies and Metrology 　1-1: Advanced Photolithography 　1-2: Electron and Ion Beam Technologies 　1-3: Resist and Directed Self-Assembly 2:Nanotechnology 　2-1: Nanocarbons 　2-2: Nanodevices 　2-3: Nanofabrication 　2-4: Inorganic Nanomaterials 　2-5: Organic Nanomaterials 　2-6: NanoTool 3: Nanoimprint, Nanoprint and Rising Lithography 4: BioMEMS, Lab on a Chip 5: Microsystem Technology and MEMS Symp. A: Metrology and Inspection for Advanced Patterning Symp. B: Forefront of Graphene & Related 2D Materials Symp. C:Nanosensors and Their Promises for IoT Society Symp. D: Innovation from Open Facility Dr. Lars Liebmann, GLOBALFOUNDRIES, USA Prof. Kaustav Banerjee, UCSB, USA Dr. Sangyoon Lee, Samsung Electronics, Korea

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