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| Abstract Deadline |
July 1, 2013
July 7, 2013
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| Late News Paper Deadline |
| September 15, 2013 |
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Registration Deadline
October 18, 2013 |
Abstract will be published online |
October 28, 2013
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| JJAP Deadline |
| November 30, 2013 |
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| MNC 2014 |
| November 4-7, 2014 |
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Microprocesses and Nanotechnology play an
important role of technical backbone for constructing the advanced information
communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 26th year and is intended to provide a
forum for discussing lithography science and process technology using photon,
electron, ion, other energetic particles and nanomaterials. This conference
covers not only their applications to micro-and nano-structure fabrication
and related physics and devices, but also their fusion applications with
other fields like bio, medical information, and communication technology.
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SCOPE
1.Lithography and Related Technologies and Metrology
1-1: Advanced Photolithography
1-2: Electron and Ion Beam Technologies
1-3: Resist and Directed Self-Assembly
2:Nanotechnology
2-1: Nanocarbons
2-2: Nanodevices
2-3: Nanofabrication
2-4: Inorganic Nanomaterials
2-5: Organic Nanomaterials
2-6: NanoTool
3: Nanoimprint, Nanoprint and Rising Lithography
4: BioMEMS, Lab on a Chip
5: Microsystem Technology and MEMS
SYMPOSIUM
Symposium A: Directed Self-Assembly (DSA) Processes and Modeling
Symposium B: Directed Nanostructure Science
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PLENARY SPEAKERS
Jack J.H. Chen, TSMC, Taiwan
Tetsuo Endoh, Tohoku Univ., Japan
H.-S. Philip Wong , Stanford Univ., USA |
| ON SITE INFORMATION |
 Access to Sapporo City and Royton Sapporo |
| Royton Sappor Floor Map(Technical Exhibition and Poster Session ) |
| Latenews Program and Withdrawn List |
November in Sapporo
Even in the plain areas of Sapporo, leaves turn red and the first snow of
the year is observed. You should make sure to wear warm clothing. In the latter
part of the month, when the romantic White Illumination begins, you will need
coats and gloves.
Average Temperature: 4°C Maximum Snow Accumulation: 13 cm
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On-site registration will be available
November 5, 16:30 - 18:30 (2F Lobby)
November 6, 8:30 - 18:00 (3F Lobby)
November 7, 8:30 - 19:00 (3F Lobby)
November 8, 8:30 - 16:00 (3F Lobby)
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