Symposium A
Evolving Challenges in Lithography in the AI Era
Symposium A: Evolving Challenges in Lithography in the AI Era |
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Dr. Anuja De Silva, LAM Research, USA Paper Title Short Biography |
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Ms. Andreia Figueiredo dos Santos, SCREEN SPE Germany Paper Title Short Biography |
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Mr. Wataru Shibayama, Nissan Chemical Corporation, Japan  Paper Title Functional surface treatment primer (FSTP®) with new advanced lithographic technologies Short Biography Wataru Shibayama graduated Tokyo university of agriculture and technology as master degree. Then he joined Nissan Chemical corporation as the chemical researcher for advanced lithography process in 2007. His current main research focuses the development of new organic & inorganic photoresist-related materials for next generation lithography process. |
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Dr. Arame Thiam, Tokyo Electron Europe, UK  Paper Title Enablement of Metal Logic EUV Patterning towards manufacturability Short Biography Dr Arame Thiam received her M.Sc. and PhD in Microelectronics and Nanotechnologies from the University of Lille 1 (France). After starting her career in CEA-Leti Grenoble Patterning group working on e-beam lithography, she joined Imec in 2015. Her focus was lithography process development support of Imec Interconnects, Beyond CMOS, OIO and Quantum computing programs. Since 2022, she works at Tokyo Electron Belgium supporting High NA EUV lithography joint-development work with imec, focusing on patterning exploration. | |
Prof. Jiyoung Kim, University of Texas, USA Paper Title Short Biography | |
Prof.Greg Denbeaux, University at Albany, USA Paper Title Short Biography | |
Prof. Takeo Ejima, Tohoku University, Japan Paper Title Short Biography | |
Dr. Jo Finders, ASML, The Netherlands Paper Title Short Biography | |
