Symposium A
Evolving Challenges in Lithography in the AI Era
Symposium A: Evolving Challenges in Lithography in the AI Era |
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Dr. Masahiko Harumoto, SCREEN Semiconductor Solutions Co., Ltd., Japan  Paper Title Depth-of-Focus control through effective wet-processes in EUV Lithography Short Biography Masahiko Harumoto, Ph.D. is a senior expert in charge of R&D Strategy Operations at SCREEN Semiconductor Solutions. He received his Ph.D. in Applied Chemistry from the University of Osaka (Japan) working in the lab of Prof. Takahiro Kozawa on study on the mechanism of stochastic defects generation in EUV lithography. He had worked the development of Litho-Track over 20 years, but he joins the strategy group in this year 2025, and creates Lithography related strategies. |
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Mr. Wataru Shibayama, Nissan Chemical Corporation, Japan  Paper Title Functional surface treatment primer (FSTP®) with new advanced lithographic technologies Short Biography Wataru Shibayama graduated Tokyo university of agriculture and technology as master degree. Then he joined Nissan Chemical corporation as the chemical researcher for advanced lithography process in 2007. His current main research focuses the development of new organic & inorganic photoresist-related materials for next generation lithography process. |
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Dr. Arame Thiam, Tokyo Electron Europe, UK  Paper Title Enablement of Metal Logic EUV Patterning towards manufacturability Short Biography Dr Arame Thiam received her M.Sc. and PhD in Microelectronics and Nanotechnologies from the University of Lille 1 (France). After starting her career in CEA-Leti Grenoble Patterning group working on e-beam lithography, she joined Imec in 2015. Her focus was lithography process development support of Imec Interconnects, Beyond CMOS, OIO and Quantum computing programs. Since 2022, she works at Tokyo Electron Belgium supporting High NA EUV lithography joint-development work with imec, focusing on patterning exploration. |
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Prof. Jiyoung Kim, University of Texas, USA Paper Title Short Biography |
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Prof.Greg Denbeaux, University at Albany, USA Paper Title Short Biography |
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Prof. Takeo Ejima, Tohoku University, Japan Paper Title Short Biography |
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Dr. Jo Finders, ASML, The Netherlands Paper Title Short Biography |
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Dr. Douglas J. Guerrero, Brewer Sci., USA  Paper Title Room temperature lithography process Short Biography Douglas Guerrero received a PhD in Organic Chemistry from the University of Oklahoma and completed Post-doctoral work at the University of Texas-Dallas in the field of conducting polymers. He joined Brewer Science in 1995 and has served in several positions within the R&D organization where he led the development and commercialization of several Anti-reflecting coating products. Since 2008, he is a Brewer Science assignee to imec in Leuven, Belgium and currently responsible for Brewer Technology Strategy and Management reporting to the CTO office. Dr. Guerrero is a SPIE Fellow and has published over 80 papers related to materials for lithography. |
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Mr. Kazuki Kasahara, Inpria Corporation, JSR Micro, Inc., USA Paper Title Recent Progress in the Development of Metal Oxide Resists for NextGeneration High-NA EUV Lithography Short Biography |
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