Symposium A

Evolving Challenges in Lithography in the AI Era

Symposium A: Evolving Challenges in Lithography in the AI Era
Dr. Masahiko Harumoto, SCREEN Semiconductor Solutions Co., Ltd., Japan Paper Title Depth-of-Focus control through effective wet-processes in EUV Lithography Short Biography Masahiko Harumoto, Ph.D. is a senior expert in charge of R&D Strategy Operations at SCREEN Semiconductor Solutions. He received his Ph.D. in Applied Chemistry from the University of Osaka (Japan) working in the lab of Prof. Takahiro Kozawa on study on the mechanism of stochastic defects generation in EUV lithography. He had worked the development of Litho-Track over 20 years, but he joins the strategy group in this year 2025, and creates Lithography related strategies.
Mr. Wataru Shibayama, Nissan Chemical Corporation, Japan Paper Title Functional surface treatment primer (FSTP®) with new advanced lithographic technologies Short Biography Wataru Shibayama graduated Tokyo university of agriculture and technology as master degree. Then he joined Nissan Chemical corporation as the chemical researcher for advanced lithography process in 2007. His current main research focuses the development of new organic & inorganic photoresist-related materials for next generation lithography process.
Dr. Arame Thiam, Tokyo Electron Europe, Belgium Paper Title Enablement of Metal Logic EUV Patterning towards manufacturability Short Biography Dr Arame Thiam received her M.Sc. and PhD in Microelectronics and Nanotechnologies from the University of Lille 1 (France). After starting her career in CEA-Leti Grenoble Patterning group working on e-beam lithography, she joined Imec in 2015. Her focus was lithography process development support of Imec Interconnects, Beyond CMOS, OIO and Quantum computing programs. Since 2022, she works at Tokyo Electron Belgium supporting High NA EUV lithography joint-development work with imec, focusing on patterning exploration.
Prof. Jiyoung Kim, University of Texas, USA Paper Title Dry EUV Photoresist Deposited by Molecular-Atomic Layer Deposition Short Biography Dr. Jiyoung Kim is a Professor in Materials Science and Engineering at the University of Texas at Dallas, with over 30 years of expertise in semiconductor process, device and characterization particularly related to atomic layer deposition (ALD), including advanced EUV resist development using ALD/VPI processes. Dr. Kim has served several conference and symposium chairs, including 2013 ALD conference. He has about 400 peer-reviewed journal and proceeding papers, and his works have been cited more than 13,000 times
Prof.Greg Denbeaux, University at Albany, USA Paper Title Electron and acid range measurements in chemically amplified EUV photoresists Short Biography Greg Denbeaux studied free electron lasers and x-ray microscopy for his PhD from Duke University in 1999. He was a staff scientist at Lawrence Berkeley National Laboratory until becoming faculty at the College of Nanoscale Science and Engineering, Albany, New York. Currently, he studies fundamentals of photoresists including stochastic effects, outgassing, and secondary electron interactions. He also has a research program in nanoparticle detection, quantification, identification and transport, all aimed at defectivity reduction in semiconductor manufacturing. He has published over 200 papers on this research which have been cited over 2,500 times. He has organized the IEUVI Resist Technical Working Group (TWG) for the last few years.
Prof. Takeo Ejima, Tohoku University, Japan Paper Title Short Biography
Dr. Jo Finders, ASML, The Netherlands Paper Title Short Biography
Dr. Douglas J. Guerrero,　Brewer Sci., USA Paper Title Room temperature lithography process Short Biography Douglas Guerrero received a PhD in Organic Chemistry from the University of Oklahoma and completed Post-doctoral work at the University of Texas-Dallas in the field of conducting polymers. He joined Brewer Science in 1995 and has served in several positions within the R&D organization where he led the development and commercialization of several Anti-reflecting coating products. Since 2008, he is a Brewer Science assignee to imec in Leuven, Belgium and currently responsible for Brewer Technology Strategy and Management reporting to the CTO office. Dr. Guerrero is a SPIE Fellow and has published over 80 papers related to materials for lithography.
Mr. Kazuki Kasahara, Inpria Corporation, JSR Micro, Inc., USA Paper Title Recent Progress in the Development of Metal Oxide Resists for NextGeneration High-NA EUV Lithography Short Biography Kazuki Kasahara is Director of Product Integration at Inpria Corporation in Corvallis, Oregon, where he leads the development of Metal Oxide Resists (MOR) for Extreme Ultraviolet (EUV) lithography. He joined JSR Corporation in 2007 and has over 18 years of experience in advanced lithography material research within the JSR Group, including ArF immersion resists, Spin-on-Glass materials, EUV Chemically Amplified Resists (CAR), and MOR. He holds B.S. and M.S. degrees in Engineering from Yokohama National University, Japan. From 2015 to 2017, he was a Visiting Scientist at Cornell University, where he engaged in collaborative research and development on metal resists.