MNC 2012, 25th International Microprocesses and Nanotechnology Conference Oct. 30-Nov. 2, 2012, Kobe Meriken Park Oriental Hotel, Kobe, Japan MNC 2013 November 4-7, 2013 Royton Sapporo, Hokkaido, Japan Program (September 27) Session Schedule Floor plan_Poster_Technical Exhibition Access Map Prof. Ichiro Yamashita who is an Invited Speaker was changed to Dr. Maki Hiraoka in BioMEMS Session(October 25) Onsite registration will be available at conference site during Oct. 30-Nov. 2. Technical Seminar in Japanese and English Registration Desk (4F Lobby) October 30, 12:30 - 16:30 Conference Registration Desk (4FLobby) October 30, 16:30- 18:30 October 31, 8:30 - 18:00 November 1, 8:30 - 19:00 November 2, 8:30 - 16:00 Abstract Deadline July 1, 2012 July 6, 2012 Late News Paper Deadline September 15, 2012  Registration Deadline October 15, 2012 Online registration and hotel accommodation site is available. Abstract will be published online October 22, 2012  JJAP Deadline November 30, 2012 Sister Conference MNC 2011 EIPBN 2013 Nashville, May 28-31, 2013   MNE 2012 Toulouse (France), September 16-20, 2012 Conference Site Kobe Meriken Park Oriental Hotel Home Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century. The MNC conference is now in its 25th year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology. SCOPE 1:Lithography and Related Technologies and Metrology 　1-1: Lithography and Metrology 　1-2: Resist Materials and Processing 2: Nanotechnology 　2-0　Nanocarbons 　2-1: Nanodevices 　2-2: Nanofabrication 　2-3: Nanomaterials 　2-4: Nano Tool 3: Nanoimprint, Nanoprint and Rising Lithography 4: BioMEMS, Lab on a Chip 5: Microsystem Technology and MEMS SYMPOSIUM Symposium on Patterning Innovation for Sub-20 nm Devices Symp. A: Extreme Ultraviolet Lithography and Lithography Extensions Symp. B: Nanoimprint Symp. C: Directed Self Assembly PLENARY SPEAKERS (alphabetical order) Masaru Kitsuregawa, Univ. of Tokyo, Japan Paul F. Nealey, Univ. of Chicago, USA Kurt Ronse, IMEC, Belgium

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