{"id":610,"date":"2022-06-03T14:10:54","date_gmt":"2022-06-03T05:10:54","guid":{"rendered":"https:\/\/imnc.jp\/2025\/?page_id=610"},"modified":"2025-12-08T22:56:12","modified_gmt":"2025-12-08T13:56:12","slug":"symp-a","status":"publish","type":"page","link":"https:\/\/imnc.jp\/2025\/symp-a\/","title":{"rendered":"Symp. A"},"content":{"rendered":"\n\n\n\n\t\n\t\n\t\n\t\n\t\n\t\n\t\n\t\n\t\n\t\n\t
Symposium A: Evolving Challenges in Lithography in the AI Era<\/font>
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Dr. Masahiko Harumoto, SCREEN Semiconductor Solutions Co., Ltd., Japan<\/Strong><\/Font>
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Paper Title<\/Font><\/strong>
\nDepth-of-Focus control through effective wet-processes in EUV Lithography
\nShort Biography<\/strong>
\nMasahiko Harumoto, Ph.D. is a senior expert in charge of R&D Strategy Operations at SCREEN Semiconductor Solutions. He received his Ph.D. in Applied Chemistry from the University of Osaka (Japan) working in the lab of Prof. Takahiro Kozawa on study on the mechanism of stochastic defects generation in EUV lithography. He had worked the development of Litho-Track over 20 years, but he joins the strategy group in this year 2025, and creates Lithography related strategies.<\/td>\n<\/tr>\n
Mr. Wataru Shibayama, Nissan Chemical Corporation, Japan<\/Strong><\/Font>
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Paper Title<\/Font><\/strong>
\nFunctional surface treatment primer (FSTP\u00ae) with new advanced lithographic technologies
\nShort Biography<\/strong>
\nWataru Shibayama graduated Tokyo university of agriculture and technology as master degree.
\nThen he joined Nissan Chemical corporation as the chemical researcher for advanced lithography process in 2007.
\nHis current main research focuses the development of new organic & inorganic photoresist-related materials for next generation lithography process.<\/td>\n<\/tr>\n
Dr. Arame Thiam, Tokyo Electron Europe, Belgium
\nInvited Speaker has changed from Dr. Arame Thiam to Dr. Symashree Roy, imec, Belgium.
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Paper Title<\/Font><\/strong>
\nEnablement of Metal Logic EUV Patterning towards manufacturability
\nShort Biography<\/strong>
\nDr Arame Thiam received her M.Sc. and PhD in Microelectronics and Nanotechnologies from the University of Lille 1 (France). After starting her career in CEA-Leti Grenoble Patterning group working on e-beam lithography, she joined Imec in 2015. Her focus was lithography process development support of Imec Interconnects, Beyond CMOS, OIO and Quantum computing programs. Since 2022, she works at Tokyo Electron Belgium supporting High NA EUV lithography joint-development work with imec, focusing on patterning exploration.
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Dr. Symashree Roy, imec, Belgium.<\/Strong><\/Font>
\n<\/strong>Dr. Syamashree Roy obtained her PhD in spintronics from the University of Nottingham (UK). Following the completion of her doctoral studies, she joined IMEC\u2019s \u00c5ngstr\u00f6m Patterning program in 2022, where she contributed to the process development and optimization of back-end-of-line interconnect layers. She is currently responsible for supporting and advancing IMEC\u2019s technology roadmap for metal-logic PNR, with a particular focus on High-NA patterning exploration.<\/td>\n<\/tr>\n
Prof. Jiyoung Kim, University of Texas, USA
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Paper Title<\/Font><\/strong>
\nDry EUV Photoresist Deposited by Molecular-Atomic Layer Deposition
\nShort Biography<\/strong>
\nDr. Jiyoung Kim is a Professor in Materials Science and Engineering at the University of Texas at Dallas, with over 30 years of expertise in semiconductor process, device and characterization particularly related to atomic layer deposition (ALD), including advanced EUV resist development using ALD\/VPI processes. Dr. Kim has served several conference and symposium chairs, including 2013 ALD conference. He has about 400 peer-reviewed journal and proceeding papers, and his works have been cited more than 13,000 times<\/td>\n<\/tr>\n
Prof.Greg Denbeaux, University at Albany, USA
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Paper Title<\/Font><\/strong>
\nElectron and acid range measurements in chemically amplified EUV photoresists
\nShort Biography<\/strong>
\nGreg Denbeaux studied free electron lasers and x-ray microscopy for his PhD from Duke University in 1999. He was a staff scientist at Lawrence Berkeley National Laboratory until becoming faculty at the College of Nanoscale Science and Engineering, Albany, New York. Currently, he studies fundamentals of photoresists including stochastic effects, outgassing, and secondary electron interactions. He also has a research program in nanoparticle detection, quantification, identification and transport, all aimed at defectivity reduction in semiconductor manufacturing. He has published over 200 papers on this research which have been cited over 2,500 times. He has organized the IEUVI Resist Technical Working Group (TWG) for the last few years.
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Prof. Takeo Ejima, Tohoku University, Japan<\/Strong><\/Font>
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Paper Title<\/Font><\/strong>
\nDevelopment of BEUV Multilayer Mirrors Using Ion Sputtering and Quantum ellipsometry-Based Thickness Control
\nShort Biography<\/strong>
\nEJIMA, Takeo received his Ph.D. in Science from the Graduate School of Science, Tohoku University, with a dissertation on strongly correlated materials investigated by photoemission and inverse photoemission spectroscopies. His research interests focus on the development of advanced optical systems in the vacuum ultraviolet to soft X-ray regions and their applications to material science. He has been actively involved in both instrumentation development and experimental studies, contributing to the progress of spectroscopic techniques for condensed matter physics.<\/td>\n<\/tr>\n
Dr. Jo Finders, ASML, The Netherlands<\/Strong><\/Font>
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Paper Title<\/Font><\/strong>
\nScaling EUV and holistic lithography to support Moore\u2019s Law through the AI era
\nShort Biography<\/strong>
\nBorn in 1963 in Kerkrade, the Netherlands, Jo graduated in Physics with MSc in 1987, and PhD in 1991 from Aachen University of Technology, Germany From 1991- 1994 he worked as a member of technical staff at the Aachen University of technology on the spectroscopic analysis of artificial diamond layers He joined IMEC in 1994. As a member of the micro patterning group he was active in various fields of optical lithography such as resolution enhancement techniques, CD-control and wafer CD-metrology.
\nIn 1997 he joined ASML. Since than he was acting in various areas around DUV and EUV imaging. In June 2006 he was elected as an ASML fellow and in 2018 as an SPIE fellow Currently he is managing the EUV imaging and focus group within system engineering at ASML. Jo holds over 45 patents and has (co) authored more than 100 papers is the field of optical lithography
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Dr. Douglas J. Guerrero,\u3000Brewer Sci., USA<\/Strong><\/Font>
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Paper Title<\/Font><\/strong>
\nRoom temperature process for lithography
\nShort Biography<\/strong>
\nDouglas Guerrero received a PhD in Organic Chemistry from the University of Oklahoma and completed Post-doctoral work at the University of Texas-Dallas in the field of conducting polymers.
\nHe joined Brewer Science in 1995 and has served in several positions within the R&D organization where he led the development and commercialization of several Anti-reflecting coating products. Since 2008, he is a Brewer Science assignee to imec in Leuven, Belgium and currently responsible for Brewer Technology Strategy and Management reporting to the CTO office.
\nDr. Guerrero is a SPIE Fellow and has published over 80 papers related to materials for lithography.
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Mr. Kazuki Kasahara, Inpria Corporation, JSR Micro, Inc., USA<\/Strong><\/Font>
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Paper Title<\/Font><\/strong>
\nRecent Progress in the Development of Metal Oxide Resists for NextGeneration High-NA EUV Lithography
\nShort Biography<\/strong>
\nKazuki Kasahara is Director of Product Integration at Inpria Corporation in Corvallis, Oregon, where he leads the development of Metal Oxide Resists (MOR) for Extreme Ultraviolet (EUV) lithography. He joined JSR Corporation in 2007 and has over 18 years of experience in advanced lithography material research within the JSR Group, including ArF immersion resists, Spin-on-Glass materials, EUV Chemically Amplified Resists (CAR), and MOR.
\nHe holds B.S. and M.S. degrees in Engineering from Yokohama National University, Japan. From 2015 to 2017, he was a Visiting Scientist at Cornell University, where he engaged in collaborative research and development on metal resists.
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<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n\n","protected":false},"excerpt":{"rendered":"","protected":false},"author":2,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"uagb_featured_image_src":{"full":false,"thumbnail":false,"medium":false,"medium_large":false,"large":false,"1536x1536":false,"2048x2048":false,"page_builder_slider_small":false,"size1":false,"size2":false,"size3":false,"size4":false,"size5":false,"size6":false,"size7":false,"size8":false,"size9":false,"size10":false,"size11":false,"size12":false,"size-card":false},"uagb_author_info":{"display_name":"mnc2022","author_link":"https:\/\/imnc.jp\/2025\/author\/mnc2022\/"},"uagb_comment_info":0,"uagb_excerpt":null,"_links":{"self":[{"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/pages\/610"}],"collection":[{"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/users\/2"}],"replies":[{"embeddable":true,"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/comments?post=610"}],"version-history":[{"count":12,"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/pages\/610\/revisions"}],"predecessor-version":[{"id":4401,"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/pages\/610\/revisions\/4401"}],"wp:attachment":[{"href":"https:\/\/imnc.jp\/2025\/wp-json\/wp\/v2\/media?parent=610"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}