Special Talk

Dr. Harry J. Levinson, HJL Lithography, USA

Short Biograpy
Harry J. Levinson is currently a lithography consultant. He is the author of three books: Lithography Process Control, Principles of Lithography, and Extreme Ultraviolet Lithography. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE’s Board of Directors. He received the Society’s 2014 Directors’ Award. In 2022 he received the SPIE Frits Zernike Award in Microlithography. Levinson is currently Editor-in-Chief of the Journal of Micro/Nanopatterning, Materials and Metrology (JM3). His Ph.D. thesis addressed certain phenomena involving the interactions of light and matter. For this work, he received the Wayne B. Nottingham Prize in surface science.
Paper Title
Lithography at the end of scaling
Abstract
Within a decade, transistor performance and interconnect impedence will block further scaling of the minimum feature size in integrated circuits. To reach ultimate dimensions, full enablement of high-NA EUV lithography with high levels of productivity will be needed. Issues related to masks, resist materials, EUV light sources, and computational lithography will also need to be addressed. Curvy features offer the potential to improve both scaling and performance, but many technology elements need to be developed. To realize the benefits of backside interconnect, lithographers will need to be able to align wafers on both sides. Accompanying the use of advanced packaging are a number of issues involving lithography that need to be addressed. Should solutions be found that enable smaller transistor or interconnect dimensions than in current roadmaps, there are a number of potential patterning solutions. Further improvements in productivity and energy efficiency are being pursued, regardless.

We are delighted to announce that the MNC2025 Outstanding Review and Tutorial Award is being presented to Dr. Harry J. Levinson of HJL Lithography for the exceptional paper titled "High-NA EUV lithography: current status and outlook for the future."
This paper, published in the JJAP MNC Special Issue in 2022 after his keynote talk in MNC2021, has achieved remarkable recognition with over 21,600 downloads, highlighting its significant impact and relevance in the field of lithography.

Harry J. Levinson 2022 Jpn. J. Appl. Phys. 61 SD0803.
https://iopscience.iop.org/article/10.35848/1347-4065/ac49fa

Dr. Levinson's paper offers a comprehensive and insightful review of the current status and future outlook of High-NA EUV lithography.
The careful attention to detail and the thorough citation of relevant literature make this paper an invaluable resource for researchers, engineers and people works in the field.
Dr. Levinson's ability to distill complex concepts into clear and accessible language ensures that the paper is not only informative but also highly readable.

The paper's thorough analysis covers critical aspects such as technological advancements, challenges, and potential solutions in high-NA EUV lithography.
Dr. Levinson's expertise and deep understanding of the subject matter are evident throughout the paper, making it a cornerstone reference for anyone involved in the field.

In recognition of the paper's significant contributions to the understanding and advancement of advanced lithography, we are honored to present Dr. Harry J. Levinson with the MNC2025 Outstanding Review and Tutorial Award.
This award not only celebrates Dr. Levinson's outstanding contributions but also underscores the importance of continued research and innovation in this critical area of technology.
Congratulations to Dr. Harry J. Levinson on this well-deserved recognition.