Special Talk

Dr. Harry J. Levinson, HJL Lithography, USA

Short Biograpy
Harry J. Levinson is currently a lithography consultant. He is the author of three books: Lithography Process Control, Principles of Lithography, and Extreme Ultraviolet Lithography. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE’s Board of Directors. He received the Society’s 2014 Directors’ Award. In 2022 he received the SPIE Frits Zernike Award in Microlithography. Levinson is currently Editor-in-Chief of the Journal of Micro/Nanopatterning, Materials and Metrology (JM3). His Ph.D. thesis addressed certain phenomena involving the interactions of light and matter. For this work, he received the Wayne B. Nottingham Prize in surface science.
Paper Title
Lithography at the end of scaling
Abstract
Within a decade, transistor performance and interconnect impedence will block further scaling of the minimum feature size in integrated circuits. To reach ultimate dimensions, full enablement of high-NA EUV lithography with high levels of productivity will be needed. Issues related to masks, resist materials, EUV light sources, and computational lithography will also need to be addressed. Curvy features offer the potential to improve both scaling and performance, but many technology elements need to be developed. To realize the benefits of backside interconnect, lithographers will need to be able to align wafers on both sides. Accompanying the use of advanced packaging are a number of issues involving lithography that need to be addressed. Should solutions be found that enable smaller transistor or interconnect dimensions than in current roadmaps, there are a number of potential patterning solutions. Further improvements in productivity and energy efficiency are being pursued, regardless.