MNC 2020, Nov. 9-12, 2020
33rd International Microprocesses and Nanotechnology Conference
Art Hotel Osaka Bay Tower, Osaka, Japan

1.Lithography and Related Technologies and Metrology
 1-1: Photolithography and Patterning
 1-2: Electron and Ion Beam Technologies
 1-3: Resist and Directed Self-Assembly
 2-1: Nanocarbons
 2-2: Nanodevices
 2-3: Nanofabrication
 2-4: Inorganic Nanomaterials
 2-5: Organic Nanomaterials
 2-6: NanoTool
3: Nanoimprint, Hybrid-NIL, Biomimetics, and Functional Surfaces
4: BioMEMS, Lab on a Chip, and Nanobiotechnology
5: Microsystem Technology and MEMS
6: Atomic Layer Processiong (ALP)

Submitted Abstract Process (Deadline: September 8, 2020) as Late News Paper)    
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Please submit 1 or 2 page of abstract through MNC 2029 web site until September 8    Notice of accept or reject
(Poster, Oral (Small number) or Rejection)
September 20.
(Late News Paper adoption rate is 40% to 70%)
Please send us your authors confirmation through MNC 2019 web site.   Please submit full paper as MNC special issue through JJAP web site until November 31. (It is not obligation, but your contributions are cordially invited.)  
  This describes instructions for the preparation of a camera-ready abstract. Prospective authors are encouraged to submit a 2-page abstract. The abstract must clearly state the purpose, achievement and significance of the work. Please note that the most common cause of rejection of submitted papers is a lack of specific results, e.g. figures and tables, and of the description on experimental /theoretical procedures. The abstract must be prepared following the instruction because it is printed by the photo-offset method. The abstracts are published as the Digest of papers, which will be available for registrants at the conference.
  The abstract should be neatly typed on A4-size or US letter size (8.5 inches x  11 inches) plain white sheets. Type the title on the first line, authors’name(s) on the third line and addresses on the fourth line. Title, author(s) and address(es) should be typed centered. Begin the texts two lines below the last line of the title/author section. The second page should be used for indicating figures, tables and photographs. Caption should be typed underneath the figure and above the table.
 Additional typing guidelines are summarized in Table 1. 
 Sectioning is not always required and is optional.
 An example of the abstract is found in ABSTRACT.EXAMPLE.
Submit the abstract in a PDF format with the copyright form.
Table1. Typing Guidelines for the abstract
PDF File: Please avoid setting up user password and master password in the PDF files. A PDF file must be smaller than 3MByte with no security.
Line spacing: single-spaced.
Format: An A4-size or a 21.6 cm×28 cm is preferable. The first page must include the title of the paper, author(s), affiliation(s), address, e-mail address, and article text.
Font Size: 11 - 12 point font is recommended for text.
Character: Times-Fonts Family and Helvetica-Fonts Family are recommended As for Symbolic Characters such as (α) (μ), please use Symbol-Fonts Family. DO NOT use two byte characters and Asian Fonts, e.g., Japanese, Korean, and Chinese characters, MS Gothic, MS Mincho, Ryumin, Batang etc.

2005 International Microprocesses and Nanotechnology Conference Digest Papers, Page 136-137
H. Shimauchi, Y. Ohno, S. Kishimoto and T. Mizutani, Nagoya University, Japan
Copyright, Since 2005 JSAP, All right reserved

Copyright(c) Since 2020, 33rd International Microprocesses and Nanotechnology Conference, All Rights Reserved.