MNC 2010, 23rd International Microprocesses and Nanotechnology Conference
November 9-12, 2010, Rihga Royal Hotel Kokura, Fukuoka, Japan
Program (817KB)
inculuding Tentative Time Schedule (August 12)
Session Schedule.html
Final Call for Paper (408KB)(May 18, 2010)
As for notice of acceptance or rejection, we will inform you by e-mail around August 5.
Online Registration and Hotel Accomodation Site.
Abstract Deadline
June 30, 2010
July 6, 2010
Late News Paper Deadline
September 15, 2010
 Registration Deadline
October 20, 2010
 JJAP Deadline
November 30, 2010
MNC 2009
 
  MNE 2010

in Japanese Site
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Microprocesses and Nanotechnology play an important role of technical backbone for constructing the advanced information communications society with ubiquitous net works of the 21st century.
The MNC conference is now in its 23rd year and is intended to provide a forum for discussing lithography science and process technology using photon, electron, ion, other energetic particles and nanomaterials. This conference covers not only their applications to micro-and nano-structure fabrication and related physics and devices, but also their fusion applications with other fields like bio, medical information, and communication technology.
SCOPE
1: Lithography, and Related Technologies
1-1: DUV, EUV Lithography
1-2: Electron- and Ion-Beam Lithography　
1-3: Resist Materials and Processing
2: Nanotechnology
2-0　Nanocarbon
2-1: Nanodevice
2-2: Nanofabrication
2-3: Nanomaterials
2-4: Nano Tool
3: Nanoimprint, Nanoprint and Rising Lithography
4: Bio MEMS, Lab on a Chip
5: Microsystem Technology and MEMS

Symp. A: Cost-Effective Efficient Litho Technologies
- Holding the Keys to "Green Lithography"
MNC 2010 Plenary Speakers 
     
 Prof. Masayoshi Esashi
Tohoku Univ. 

''Prospect of Micro/
Nanotechnology for
Fusion in Microelectronics"		 Dr. Michael Roukes
Kavli Nanoscience Inst.
California Inst. of Technol.

''Large-Scale Integration
of Nanosystem''		  Dr. Sam Sivakumar
INTEL CORPORATION

 ''Managing the Technical and
Economic Challenges of
Next-Generation Lithography''

 






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