{"id":721,"date":"2021-06-21T12:18:57","date_gmt":"2021-06-21T03:18:57","guid":{"rendered":"http:\/\/imnc.jp\/2021\/?page_id=721"},"modified":"2021-08-24T19:00:42","modified_gmt":"2021-08-24T10:00:42","slug":"symposium-d","status":"publish","type":"page","link":"http:\/\/imnc.jp\/2021\/symposium-d\/","title":{"rendered":"Symposium D"},"content":{"rendered":"

Enhancing Technology for Next Generation Lithography
\nOrganizer: Koji Asakawa (KIOXIA)
\n<\/span><\/strong><\/span>The performance of semiconductors has been boosted by on-going reduction of their fabrication sizes.\u00a0\u00a0 However, it is realized not only by reduction in lithographic resolution but also strongly by peripheral technologies such as multiple pattering, pattern transfer techniques and high etch durability materials.\u00a0 This symposium focuses on the emerging materials and technologies that empowers the conventional methods to be finer, harder, and more precise for device fabrication.
\n\n\n\n\n\t\n\n\t\n\t\n\t\n\t\n\t\n\t
Session Time<\/th>Name, Affiliation, Paper Title and Short Biography<\/th>\n<\/tr>\n<\/thead>\n
28A-5-1\t
\n17:15
\n<\/td>		Prof. Masaru Nakagawa, Tohoku Univ., Japan<\/strong>
\nUV nanoimprint lithography with laser-drilled screen printing, fluorescence alignment, and hybridized resist materials
\n\"\"
\nMasaru Nakagawa received his Doctor of Engineering degree in 1997 from Sophia University. He worked at Tokyo Institute of Technology as an assistant professor (1997\u20132002) and an associate professor (2002\u20132008). Since 2008, he has been a full professor of Tohoku University. He was the Steering Committee Chair of a research group of Single-Nanometer Figuration and the Structure-Induced Property in The Japan Society of Applied Physics (2015-2020). He is now the manager of center at Materials\u2013Measurement Hybrid Research Center in Institute for Multidisciplinary Research of Advanced Materials (IMRAM). His research interests include functional monolayers, hybridized and metallized resist materials, and materials and processes for advanced nanoimprint lithography.<\/td>\n<\/tr>\n
28A-5-2\t
\n17:45
\n<\/td>		Prof. Teruaki Hayakawa, Tokyo Tech., Japan<\/strong>
\nChemically Tailored Block Copolymers For Patternable Nanostructured Materials
\n\"\"
\nTeruaki Hayakawa is a Professor in the Department of Materials Science and Engineering, School of Materials and Chemical Technology of the Tokyo Institute of Technology. He received B.Sc. (1995), M.S. (1997), and Ph.D. (2000) degrees from Yamagata University for research in the fields of polymer chemistry. Before joining the Tokyo Institute of Technology in 2003, he worked at the National Institute of Advanced Industrial Science and Technology (AIST) as a researcher (2000-2003). Since September 2017, he has been in his current position. He has been engaged in developing directed self-assembly block copolymer materials, high thermal conductive epoxy materials, mesoporous polymer materials, and wholly aromatic condensation polymers based on precision polymerization and nanostructure control of bulk and thin-film polymers.<\/td>\n<\/tr>\n
28A-5-3\t
\n18:15
\n<\/td>		Mr. Norikatsu Sasao, Kioxia, Japan<\/strong>
\nDevelopment of non-expanding Polymers after Vapor Phase Infiltration and Evaluation of their Etch-resistance (Invited)
\n\"\"
\nNorikatsu Sasao started his career studying on polymer science in the industry after receiving his M.S. degree in applied chemistry from Waseda University (Japan) in 2004. He is currently a specialist at the Institute of Memory Technology Research and Development in KIOXIA Corporation.<\/td>\n<\/tr>\n
28A-5-4\t
\n18:45
\n<\/td>		Dr. Michele Perego, IMM CNR, Unit of Agrate Brianza, Italy<\/strong>
\nNanostructured Materials via Sequential Infiltration Synthesis in Block-Copolymer Thin Films
\n\"\"
\nMichele Perego is currently working as Research Director at CNR-IMM in Agrate Brianza. He received his PhD in Physics, Applied Physics and Astrophysics in 2004 from Universit\u00e0 degli Studi di Milano. He is the coordinator of a research group working on the development of new bottom-up approaches for the synthesis of functional nanostructured materials with typical feature dimension below 20 nm. His research activity focuses on the investigation of fundamental issues related to the self-assembly processes in block copolymers thin films and on the use of these macromolecules to synthesize and manipulate functional nanostructures for microelectronics, optoelectronics and photovoltaic applications.
\n<\/td>\n<\/tr>\n
29A-1-2\t
\n9:30
\n<\/td>		Dr. Katie lutker-Lee, TEL Technology Center, America, USA<\/strong>
\nLeveraging Selective Deposition to Enable Next Generation EUV Lithography and Novel Patterning Integration
\n\"\"
\nKatie received her BS Chem at the University of Michigan and her PhD in physical chemistry from the University of California, Berkeley. She joined Tokyo Electron in 2014 and is currently a senior process engineer at TEL Technology Center, America specializing in BEOL dielectric and patterning plasma etch. Her current focus is developing processes to support the next generation of chip development.
\n<\/td>\n<\/tr>\n
29A-1-3\t
\n10:00
\n<\/td>		Prof. Takuya Isono, Hokkaido Univ., Japan<\/strong>
\nPost-Polymerization Modification of PS-b-PMMA: A Strategy for Fine-Tuning the Microphase-Separated Nanostructures
\n\"\"
\nTakuya Isono is an Associate Professor at Faculty of Engineering, Hokkaido University, Japan. He received his Ph.D. degree from Graduate School of Chemical Sciences and Engineering, Hokkaido University in 2014, majoring in polymer chemistry. He then started his research career as an Assistant Professor at Hokkaido University, and since April 2021, he has been in the current position. His research interests are centered on the precise polymer synthesis and are focused mainly on the development of novel block copolymer materials for various applications, such as drug delivery, stretchable organic devices, and nanopatterning.<\/td>\n<\/tr>\n<\/tbody>\n<\/table>\n<\/p>\n","protected":false},"excerpt":{"rendered":"Enhancing Technology for Next Generation Lithography Organizer: Koji Asakawa (KIOXIA) The performance of semic […]","protected":false},"author":1,"featured_media":980,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"page-noside.php","meta":[],"_links":{"self":[{"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/pages\/721"}],"collection":[{"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/comments?post=721"}],"version-history":[{"count":9,"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/pages\/721\/revisions"}],"predecessor-version":[{"id":927,"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/pages\/721\/revisions\/927"}],"wp:featuredmedia":[{"embeddable":true,"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/media\/980"}],"wp:attachment":[{"href":"http:\/\/imnc.jp\/2021\/wp-json\/wp\/v2\/media?parent=721"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}