| Organizing Committee | ||
| Chair | H. Kotera (Kyoto Univ.) | |
| Vice Chair | E.-K. Kim (Hanyang Univ.) | S. Kasai (Hokkaido Univ.) |
| Members | ||
| J. Ahn (Hanyang Univ.) | S. Ishihara (Univ. of Tokyo) | Y. Ono (Univ. of Toyama) |
| S. Akita (Osaka Pref. Univ.) | T. Itani (EIDEC) | S.W. Hwang (Samsung Advanced Inst. of Technol.) |
| H. Arimoto (AIST) | T. Kozawa (Osaka Univ.) | S. Sato (Fujitsu Labs.) |
| T. Asano (Kyushu Univ.) | S. Matsui (Univ. of Hyogo) | T. Sato (Toshiba) |
| K. Asakawa (Toshiba) | T. Meguro (Tokyo Univ. of Sci.) | Y. Shimamoto (Hitachi) |
| H. Azuma (Canon) | Y. Miyamoto (Tokyo Inst. of Technol.) | M. Suzuki (Kyoto Univ.) |
| T. Chikyow (NIMS) | M. Nagase (Univ. of Tokushima) | Y. Todokoro (Nara Inst. Sci. & Technol.) |
| Y. Hirai (Osaka Pref. Univ.) | K. Nishiguchi (NTT) | T. Tsuchiya (Kyoto Univ.) |
| T. Horiuchi (Tokyo Denki Univ.) | H. Nozue (NuFlare Technol. America) | H. Yaegashi (Tokyo Electron) |
| T. Ichiki (Univ. of Tokyo) | Y. Ochiai (JST) | H. Yamaguchi (NTT) |
| K. Ishibashi (RIKEN) | S. Okazaki (GIGAPHOTON) | |
| Advisory Members | ||
| Members | ||
| K. Aoyagi (Ritsumeikan Univ.) | D. Kern (Univ. of Tubingen) | U. Staufer (Delft Univ. of Technol.) |
| H. Bruckl (Danube Univ. Krems) | M. Komuro (KEK) | T. Sugano (Emeritus, Univ. of Tokyo) |
| C.Y. Chang (Natl. Nano Device Lab.) | J. Melngailis (Univ. of Meryland) | T. Tagawa (Osaka Univ.) |
| T. Fukui (Hokkaido Univ.) | S.-K. Min (Kyung Hee Univ.) | M. Takai (Emeritus,Osaka Univ.) |
| K. Gamo (Emeritus,Osaka Univ.) | A.R. Neureuther (UC Berkeley) | S. Tedesco (Leti) |
| M.A. Guillorn (IBM Thomas J. Watson Res. Ctr) | S.W. Pang (City Univ. of Hong Kong) | G.P. Watson (Princeton Univ.) |
| C.W. Hagen (Delft Univ. of Technol.) | R.F.W. Pease (Stanford Univ.) | J. Wiesner (Nikon Precision) |
| K. Hane (Tohoku Univ.) | K. Ronse (IMEC) | S. Wurm (SEMATECH) |
| L.R. Harriott (Univ. of Virginia) | M. Roukes (Caltech) | U. Staufer (Delft Univ. of Technol.) |
| J.G. Hartley (NuFlare Technol. America) | R. Shimizu (Osaka Univ.) | T. Sugano (Emeritus, Univ. of Tokyo) |
| T. Hastings (Univ. of Kentucky) | S. Shoji (Waseda Univ.) | |
| Y. Horiike (Univ. of Tsukuba) | H.I. Smith (MIT) | |
| Steering Committee Members | ||
| Chair | M. Suzuki (Kyoto Univ.) | |
| Vice Chair | J. Ahn (Hanyang Univ.) | T. Kozawa (Osaka Univ.) |
| Program | T. Tsuchiya (Kyoto Univ.) | T. Sato (Toshiba) |
| K. Nishiguchi (NTT) | S.W. Hwang (Samsung Advanced Inst. of Technol.) | |
| Exhibition | H. Takemura (GenISys) | |
| Treasure | H. Yamashita (NuFlareTechnol.) | |
| Contribution | T. Iwai (Tokyo Ohka) | |
| Public | S. Nagahara (Tokyo Electron) | |
| Local Arrengement | D. Kobayashi (Ritsumeikan Univ.) | K. Takei (Osaka Pref. Univ.); |
| K. Sugano (Kobe Univ) | R. Yokokawa (Kyoto Univ.) | |
| Overseas | A. Chen (ASML) | O.H. Kim (POSTEC) |
| J.-K. Shin (Kyungpook Univ.) | C.K. Sung (National Tsing Hua Univ.) | |
| H.Y. Low (Singapore Univ. of Technol. and Design) | ||
| Program Committee Members | ||
| Chair | T. Tsuchiya (Kyoto Univ.) | |
| Vice Chair | S.W. Hwang （Samsung Advanced Inst. of Technol.) | Y. Ono (Shizuoka Univ.) |
| K. Nishiguchi (NTT) | T. Sato (Toshiba) | |
| 1-1: Advanced Photolithography | ||
| Section Head | J. Miyazaki (ASML) | |
| Sub Head | A. Yamaguchi (Hitachi) | |
| Sub Head | J. Ahn （Hanyang Univ.) | |
| Members | H. Futatsuya (Fujitsu Semiconductor) | K. Oyama (Tokyo Electron) |
| H. Kawai (Nikon) | T. Uchiyama (Toshiba) | |
| Y. Morikawa (DNP) | G. Vandenberghe (IMEC) | |
| 1-2: Electron and Ion Beam Technologies | ||
| Section Head | H. Yamashita (NuflareTechnol.) | |
| Sub Head | J. Yamamoto (Hitachi) | K.-Y. Tsai （Natl. Taiwan Univ.） |
| Sub Head | H.S. Kim (Sun Moon Univ.) | |
| Members | H. Abe (Toshiba) | M. Kotera (Osaka Inst. of Technol.) |
| S. Babin（A-Beam) | H. Nozue (Nuflare Technol. America) | |
| A. Kinomura (Kyoto Univ.) | J. Yanagisawa (Univ. of Shiga Pref.) | |
| 1-3: Resist and Directed Self-Assembly | ||
| Section Head | T. Azuma (EIDEC) | |
| Sub Head | T. Nagai (JSR) | S.O. Kim (KAIST) |
| Members | R. Gronheid (IMEC) | T. Yamaguchi (NTT) |
| J. Kon (Fujitsu) | H. Yamamoto (Osaka Univ.) | |
| S. Nagahara (Tokyo Electron) | H. Yoshida (Hitachi) | |
| H. Oizumi (Gigaphoton) | K. Yoshimoto (Kyoto Univ.) | |
| K. Okamoto (Hokkaido Univ.) | ||
| 2-1 Nanocarbons | ||
| Section Head | D. Kondo (Fujitsu Labs.) | |
| Sub Head | S. Okada (Univ. of Tsukuba) | J.-H. Ahn （Yonsei Univ.） |
| Members | G. Kalita (Nagoya Inst. of Technol.) | M. Takamura (NTT) |
| A. Ando (AIST) | T. Takenobu (Nagoya Univ.) | |
| S. Konabe (Tokyo Univ. of Sci.) | M. Tanemura (Nagoya Inst. of Technol.) | |
| K. Matsuda (Kyoto Univ.) | K. Ueno (Saitama Univ.) | |
| K. Maehashi (Tokyo Univ. of Agri. and Technol.) | K. Yanagi (Tokyo Metropolitan Univ.) | |
| R. Negishi (Osaka Univ.) | ||
| 2-2: Nanodevices | ||
| Section Head | T. Yanagida (Kyushu Univ.) | |
| Sub Head | Y. Ishikawa (Nara Inst. of Sci. and Technol.) | Y.S. Yu (Hankyung Natl. Univ.) |
| Members | N. Banno (NEC) | T. Nozaki (AIST) |
| Y. Chen (Fudan Univ.) | M. Seki (Univ. of Tokyo) | |
| S. Hara (Hokkaido Univ.) | K. Takei (Osaka Pref. Univ.) | |
| Y. Hotta (Univ. of Hyogo) | K. Uchida (Keio Univ.) | |
| T. Maemoto (Osaka Inst. of Technol.) | ||
| 2-3: Nanofabrication | ||
| Section Head | S. Shingubara (Kansai Univ.) | |
| Sub Head | K. Takase (Nihon Univ.) | Y.J. Hong (Sejong Univ.) |
| Sub Head | J.J. Lee (KIMM) | |
| Members | T. Hasegawa (Waseda Univ.) | K. Makihara (Nagoya Univ.) |
| R. Hasunuma (Tsukuba Univ.) | H. Tanaka (Kyushu Inst. of Technol.) | |
| A. Kohno (Fukuoka Univ.) | K. Tomioka (Hokkaido Univ.) | |
| Y. Liu (AIST) | ||
| 2-4: Inorganic Nanomaterials | ||
| Section Head | M. Osada (NIMS) | |
| Sub Head | M. Suzuki (AIST) | K. Kyhm (Pusan Natl. Univ.) |
| J.-W. Choi (KIST) | S. Nahm (Korea Univ.) | |
| J. Hamagami (Kanto Gakuin) | T. Taniguchi (NIMS) | |
| 2-5: Organic Nanomaterials | ||
| Section Head | S. Takami (Tohoku Univ) | |
| Sub Head | H. Kasai (Tohoku Univ) | H. Sohn (Chosun Univ.) |
| Members | N. Hiroshiba (Tohoku Univ.) | Y. Shirai (NIMS) |
| K. Noda (Keio Univ.) | ||
| 2-6: NanoTool | ||
| Section Head | R. Kometani (Univ. of Tokyo) | |
| Sub Head | K. Sugano (Kobe Univ) | H.-J. Lee (KIMM) |
| Members | T. Hoshino (Univ. of Tokyo) | Y.-H. Lin (Chang Gung Univ.) |
| S. Hotta (Hitachi) | T. Namazu (Univ. of Hyogo) | |
| T. Kawano (Toyohashi Univ. of Technol.) | Y. Sugiyama (Hitachi Hi-tech. Sci.) | |
| O. Kubo (Osaka Univ.) | Y. Yamanishi (Kyushu Univ.) | |
| 3: Nanoimprint, Nanoprint and Rising Lithography | ||
| Section Head | A. Yokoo (NTT) | |
| Sub Head | J. Taniguchi (Tokyo Univ. of Sci.) | H. Lee (Korea Univ.) |
| Sub Head | F.-Y. Chang （Natl. Taiwan Univ. of Sci. and Technol.） | E.-S. Lee （Korea Inst. of Machinery and Materials） |
| Sub Head | H.Y. Low （Inst. of Materials Res. and Eng.） | |
| Members | Y. Hirai (Osaka Pref. Univ.) | M. Okada (Univ. of Hyogo) |
| H. Hiroshima (AIST) | M. Okinaka (Canon) | |
| A. Miyauchi (Hitachi) | N. Sakai (Samsung Electronics) | |
| 4: BioMEMS, Lab on a Chip | ||
| Section Head | A. Matsumoto (Tokyo Medical and Dental Univ.) | |
| Sub Head | T. Akagi (Univ. of Tokyo) | |
| Members | K. Furukawa (Meisei Univ.) | H. Hisamoto (Osaka Pref. Univ.) |
| Y. Murakami (Toyohashi Univ. of Technol.) | H. Nagai (AIST) | |
| Y. Takamura (JAIST) | K. Tawa (Kwansei Gakuin Univ.) | |
| M. Tokeshi (Hokkaido Univ.) | ||
| 5: Microsystem Technology and MEMS | ||
| Section Head | T. Namazu (Aichi Inst. of Technol.) | |
| Sub Head | S. Nagasawa (Shibaura Inst. of Technol.) | D. Dao (Griffith Univ.) |
| Sub Head | S.H. Kong (Kyungpook Natl. Univ.) | |
| Members | Y. Hasegawa (Hiroshima City Univ.) | T. Nakakubo (Canon) |
| M. Ikeuchi (Univ. of Tokyo) | T. Sakata (Josai Univ.) | |
| K. Iwami (Tokyo Univ. of Agri. and Technol. ) | R. Takigawa (Kyushu Univ.) | |
| E. Iwase (Waseda Univ.) | Y. Tomizawa (Toshiba) | |
| S. Miyake (Kobe City College of Technol.) | ||