| Organizing Committee |
| Chair |
Y. Miyamoto (Tokyo Inst. of Technol.) |
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| Vice Chair |
H. Kotera (Kyoto Univ.) |
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| Members |
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| S. Akita (Osaka Pref. Univ.) |
T. Itani (EIDEC) |
Y. Ono (Toyama Univ.) |
| H. Arimoto (AIST) |
S. Kasai (Hokkaido Univ.) |
S. Sato (Fujitsu Labs.) |
| T. Asano (Kyushu Univ.) |
E.K. Kim (Hanyang Univ.) |
T. Sato (Toshiba) |
| K. Asakawa (Toshiba) |
T. Kozawa (Osaka Univ.) |
M. Suzuki (Kyoto Univ.) |
| H. Azuma (Canon) |
S. Matsui (Univ. of Hyogo) |
J. Tanaka (Hitachi) |
| T. Chikyow (NIMS) |
T. Meguro (Tokyo Univ. of Sci.) |
Y. Todokoro (Nara Inst. Sci. & Technol.) |
| Y. Hirai (Osaka Pref. Univ.) |
M. Nagase (Univ. of Tokushima) |
T. Tsuchiya (Kyoto Univ.) |
| T. Horiuchi (Tokyo Denki Univ.) |
K. Nishiguchi (NTT) |
H. Yaegashi (Tokyo Electron) |
| T. Ichiki (Univ. of Tokyo) |
H. Nozue (Nuflare Technol.) |
H. Yamaguchi (NTT) |
| K. Ishibashi (RIKEN) |
Y. Ochiai (JST) |
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| S. Ishihara (Univ. of Tokyo) |
S. Okazaki (GIGAPHOTON) |
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|
|
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| Advisory Members |
| K. Aoyagi (Ritsumeikan Univ.) |
D. Kern (Univ. of Tubingen) |
R. Shimizu (Osaka Univ.) |
| H. Bruckl (Danube Univ. Krems) |
M. Komuro (KEK) |
S. Shoji (Waseda Univ.) |
| C.Y. Chang (Natl. Nano Device Lab.) |
J. Melngailis (Univ. of Meryland) |
H.I. Smith (MIT) |
| R. Cheung (Univ. of Edinburgh) |
W. Milne (Univ. of Cambridge) |
T. Sugano (Prof. Emeritus, Univ. of Tokyo) |
| Z. Durrani (Imperial College London) |
S.-K. Min (Kyung Hee University.) |
T. Tagawa (Osaka Univ.) |
| T. Fukui (Hokkaido Univ.) |
A.R. Neureuther (UC Berkeley) |
M. Takai (Prof. Emeritus,Osaka UNiv.) |
| K. Gamo (Prof. Emeritus,Osaka Univ.) |
L.E. Ocola (Nanofabrication Group) |
S. Tedesco (Leti) |
| C.W. Hagen (Delft Univ. of Technol.) |
R.F.W. Pease (Stanford Univ.) |
G.P. Watson (Princeton Univ.) |
| L.R. Harriott (Univ. of Virginia) |
K. Ronse (IMEC) |
J. Wiesner (Nikon Precision) |
| J.G. Hartley (NuFlare Technol. America) |
M. Roukes (Caltech) |
S. Wurm (SEMATECH) |
| K. Hane (Tohoku Univ.) |
S.W. Pang (City Univ. of Hong Kong) |
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| Y. Horiike (Univ. of Tsukuba) |
U. Staufer (Delft Univ. of Technol.) |
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| |
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| Steering Committee Members |
| Chair |
Y. Ono (Univ.of Toyama) |
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| Vice Chair |
M. Suzuki (Kyoto Univ.) |
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| Program |
M. Nagase (Univ. of Tokushima) |
T. Sato (Toshiba) |
|
T. Tsuchiya (Kyoto Univ.) |
K. Nishiguchi (NTT) |
| Exhibition |
H. Takemura (GenISys) |
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| Tressure |
H. Yamashita (NuflareTechnol.) |
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| Contribution |
T. Iwai (Tokyo Ohka) |
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| Public |
S. Nagahara (Tokyo Electron) |
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| Seminar |
A. Yokoo (NTT) |
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| Local |
M. Hori (Univ.of Toyama) |
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| Overseas |
J.H. Ahn (Hanyang Univ.) |
A. Chen (ASML) |
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O.H. Kim (POSTEC) |
J.-K. Shin (Kyungpook Univ.) |
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C.K. Sung (National Tsing Hua Univ.) |
H.Y. Low (Singapore Univ. of Technol. and Design) |
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|
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| Program Committee Members |
| Chair |
M. Nagase (Univ. of Tokushima) |
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| Vice Chairs |
T. Sato (Toshiba) |
T. Tsuchiya (Kyoto Univ.) |
|
K. Nishiguchi (NTT) |
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| 1-1: Advanced Photolithography |
| Section Head |
J. Miyazaki (ASML) |
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| Sub Head |
A. Yamaguchi (Hitachi) |
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| Sub Head |
J. Ahn (Hanyang Univ.) |
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|
H. Futatsuya (Fujitsu Semiconductor) |
M. Shibuya (Tokyo Polytechnic Univ.) |
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H. Kawai (Nikon) |
T. Uchiyama (Toshiba) |
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Y. Morikawa (DNP) |
G. Vandenberghe (IMEC) |
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K. Oyama (Tokyo Electron) |
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| 1-2: Electron and Ion Beam Technologies |
| Section Head |
H. Yamashita (NuflareTechnol.) |
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| Sub Head |
J. Yamamoto (Hitachi) |
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| Sub Head |
K.-Y. Tsai (National Taiwan Univ.) |
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|
A. Kinomura (Kyoto Univ.) |
J. Yanagisawa (Univ. of Shiga Pref.) |
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H. Abe (Toshiba) |
M. Kotera (Osaka Inst. of Technol.) |
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H. Nozue (Nuflare) |
S. Babin (A-Beam) |
| 1-3: Resist and Directed Self-Assembly |
| Section Head |
S. Nagahara (Tokyo Electron) |
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| Sub Head |
T. Azuma (EIDEC) |
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|
R. Gronheid (imec) |
K. Okamoto (Hokkaido Univ.) |
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T. Yamaguchi (NTT) |
J. Kon (Fujitsu) |
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H. Yamamoto (Osaka Univ.) |
T. Nagai (JSR) |
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H. Yoshida (Hitachi) |
H. Oizumi (GIGAPHOTON) |
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K. Yoshimoto (Kyoto Univ.) |
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2-1 Nanocarbons
|
| Section Head |
M. Tanemura (Nagoya Inst. of Technol.) |
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| Sub Head |
D. Kondo (Fujitsu Labs.) |
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| Sub Head |
J.-H. Ahn (Yonsei Univ.) |
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|
S. Chiashi (Univ. of Tokyo) |
S. Okada (Univ. of Tsukuba) |
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K. Hirahara (Osaka Univ.) |
T. Takenobu (Waseda Univ.) |
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G. Kalita (Nagoya Inst. of Technol.) |
K. Ueno (Saitama Univ.) |
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K. Maehashi (Tokyo Univ. of Agri. and Technol. ) |
K. Yanagi (Tokyo Metropolitan Univ.) |
| 2-2: Nanodevices |
| Section Head |
T. Yanagida (Kyushu Univ.) |
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| Sub Head |
Y. Ishikawa (Nara Inst. of Sci. and Technol.) |
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| Sub Head |
J.-T. Sheu (Natl. Thiao Tung Univ.) |
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| Sub Head |
S. W. Hwang (Samsung Advanced Inst. of Technol. ) |
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N. Banno (NEC) |
T. Nozaki (AIST) |
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Y. Chen (Fudan Univ.) |
H. Ohta (Hokkaido Univ.) |
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S. Hara (Hokkaido Univ.) |
K. Uchida (Keio Univ.) |
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T. Maemoto (Osaka Inst. of Technol.) |
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| 2-3: Nanofabrication |
| Section Head |
S. Shingubara (Kansai Univ.) |
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| Sub Head |
K. Takase (Nihon Univ.) |
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|
T. Hasegawa (Waseda Univ.) |
Y. Liu (AIST) |
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R. Hasunuma (Tsukuba Univ.) |
K. Makihara (Nagoya Univ.) |
|
K.-B. Kim (Seoul Natl. Univ.) |
H. Tanaka (Kyushu Inst. of Technol.) |
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A. Kohno (Fukuoka Univ.) |
K. Tomioka (Hokkaido Univ.) |
| 2-4: Inorganic Nanomaterials |
| Section Head |
K. Terabe (NIMS) |
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| Sub Head |
T. Ohno (Tohoku Univ.) |
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| Sub Head |
E.-K. Kim (Hanyang Univ.) |
Y. Naitou (AIST) |
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T. Higuchi (Tokyo Univ. of Sci.) |
X.W. Zhao (Tokyo Univ. of Sci.) |
|
K. Kobayashi (NIMS) |
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| 2-5: Organic Nanomaterials |
| Section Head |
S. Takami (Tohoku Univ.) |
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| Sub Head |
H. Kasai (Tohoku Univ.) |
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|
Y. Shirai (NIMS) |
K. Noda (Keio Univ.) |
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N. Hiroshiba (Tohoku Univ.) |
Y. Masuhara (Yamagata Univ.) |
| 2-6: NanoTool |
| Section Head |
R. Kometani (Univ. of Tokyo) |
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| Sub Head |
K. Sugano (Kobe Univ.) |
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|
T. Hoshino (Univ. of Tokyo) |
Y.-H. Lin (Chang Gung Univ.) |
|
S. Hotta (Hitachi) |
T. Namazu (Univ. of Hyogo) |
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T. Kawano (Toyohashi Univ. of Technol.) |
Y. Sugiyama (Hitachi Hi-tech. Sci.) |
|
O. Kubo (Osaka Univ.) |
Y. Yamanishi (Shibaura Inst. of Technol.) |
| 3: Nanoimprint, Nanoprint and Rising Lithography |
| Section Head |
A. Yokoo (NTT) |
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| Sub Head |
J. Taniguchi (Tokyo Univ. of Sci.) |
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| Sub Head |
F.-Y. Chang (Natl. Taiwan Univ. of Sci. and Technol.) |
| Sub Head |
H. Lee (Korea Univ.) |
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| Sub Head |
E.-S. Lee (Korea Inst. of Machinery and Materials) |
| Sub Head |
H.Y. Low (Singapore Univ. of Technol. and Design) |
|
Y. Hirai (Osaka Pref. Univ.) |
M. Okada (Univ. of Hyogo) |
|
H. Hiroshima (AIST) |
M. Okinaka (Canon) |
|
A. Miyauchi (Hitachi) |
N. Sakai (Samsung R&D Inst. Japan) |
| 4: BioMEMS, Lab on a Chip |
| Section Head |
K. Tawa (Kwansei Gakuin Univ.) |
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| Sub Head |
H. Nagai (AIST) |
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| Sub Head |
F.-G. Tseng (National Tsing Hua Univ.) |
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|
K. Furukawa (NTT) |
Y. Murakami (Toyohashi Univ. of Technol.) |
|
H. Hisamoto (Osaka Pref. Univ.) |
Y. Takamura (JAIST) |
|
T. Ichiki (Univ. of Tokyo) |
M. Tokeshi (Hokkaido Univ.) |
|
A. Matsumoto (Tokyo Medical and Dental Univ.) |
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| 5: Microsystem Technology and MEMS |
| Section Head |
T. Namazu (Univ. of Hyogo) |
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| Sub Head |
T. Tsuchiya (Kyoto Univ.) |
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| Sub Head |
D. Dao (Griffith University) |
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| Sub Head |
S.H. Kong (Kyungpook Univ.) |
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|
Y. Hasegawa (Hiroshima City Univ.) |
S. Nagasawa (Shibaura Inst. of Technol.) |
|
M. Ikeuchi (Univ. of Tokyo) |
T. Sakata (Josai Univ.) |
|
E. Iwase (Waseda Univ.) |
R. Takigawa (Kyushu Univ.) |
|
T. Kobayashi (Ritsumeikan Univ.) |
Y. Tomizawa (Toshiba) |
|
S. Miyake (Kobelco) |
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