| Plenary | |||
| 11P-1-1 | Wed., 9:50-10:30, Nov. 11 | Trends of Nanotechnology for Society (Plenary) | M.Nishijo, Ministry of Education, Culture, Sports, Sci. and Technol., Japan |
| 11P-1-2 | Wed., 10:50-11:30, Nov. 11 | Bio-Inspired Computing with Memristors (Plenary) | D.B. Strukov, UC Santa Barbara, USA |
| 11P-1-3 | Wed., 11:30-12:10, Nov. 11 | EUV Lithography, Status and Prospects (Plenary) | J. Benschop, ASML, The Netherlands |
| Advanced Photolithography | |||
| 13A-10-1 | Fri., 13:30-14:00, Nov. 13 | Extending EUV Lithography to Sub-8nm Resolution (Invited) | J.T. Neumann and R. Garreis, Carl Zeiss SMT, Germany |
| Electron and Ion Beam Technologies | |||
| 12A-6-1 | Thurs., 13:30-14:00, Nov. 12 | Multi-beam SEM Technology for High Speed Imaging and Defect Inspection (Invited) | T. Kemen, D. Zeidler and G. Dellemann, Carl Zeiss Microscopy, Germany |
| 12A-6-2 | Thurs., 14:00-14:30, Nov. 12 | EBM-9000 : Features and Requirements in Electron-Beam Mask Writer for Product Mask Fabrication of 16 nm Half-Pitch Generation and Beyond (Invited) | H. Takekoshi, T. Kamikubo, S. Yoshitake, K. Saito and M. Suganuma, NuFlare Technologies, Japan |
| Resist and Directed Self-Assembly | |||
| 11A-3-1 | Wed., 15:55-16:25, Nov. 11 | High-sensitivity Metal-based Resists for EUV Lithography (Invited) | J.J. Santillan, M. Toriumi and T. Itani, EIDEC, Japan |
| Nanocarbons | |||
| 11C-2-1 | Wed., 13:30-14:00, Nov. 11 | Carbon Nanomaterials for Energy Harvesting and Storage in Autonomous Electronics(Invited) | G. Amaratunga, Univ. of Cambridge, UK |
| 13C-8-1 | Fri., 9:00-9:30, Nov. 13 | Wearable Electronics Using Carbon Hybrid Nanostructures (Invited) | J.-U. Park, UNIST, Korea |
| 13C-9-1 | Fri., 10:45-11:15, Nov. 13 | Improving Composite Properties and Biosensors Sensitivity Using Low Cost Nanostructured Carbons (Invited) | P. Jagadale 1, F.R. Hernandez 2, D. Demarchi 1 and A. Tagliaferro 1, 1 Politecnico Torino, Italy and 2 Univ. of Houston, USA |
| Nanodevices | |||
| 12B-4-1 | Thurs., 9:00-10:10, Nov. 12 | Semiconductor Nanowires for Optoelectronic Device Applications (Invited) | H. Tan, Australian Natl. Univ., Australia |
| Nanofabrication | |||
| 11B-3-1 | Wed., 15:55-16:25, Nov. 11 | Growth and Doping Control of Ge/Si and Si/Ge Core-shell Nanowires (Invited) | N. Fukata 1, M. Yu 1, W. Jevasuwan 1, M. Mitome 1, Y. Bando 1 and Z.L. Wang 2, 1 NIMS, Japan and 2 Georgia Inst. of Technol., USA |
| 12B-6-1 | Thurs., 13:30-14:00, Nov. 12 | Van der Waals Epitaxial Growth of Semiconductor Nanostructures (Invited) | Y.J. Hong, Sejong Univ., Korea |
| 13B-8-1 | Fri., 9:00-9:30, Nov. 13 | Si-based Light Trapping Nano-structures for Device Applications (Invited) | Jun Xu, Nanjing Univ., China |
| Inorganic Nanomaterials I | |||
| 11C-3-1 | Wed., 15:35-16:05, Nov. 11 | I-III-VI2 Colloidal Semiconductor Quantum Dots; The Present and The Future (Invited) | T. Omata, Osaka Univ., Japan |
| 11B-2-5 | Wed., 14:50-15:20, Nov. 11 | Photon Upconversion in Organic Nanomaterials (Invited) | N. Yanai 1,2, 1 Kyushu Univ. and 2 JST-PRESTO, Japan |
| Nanoimprint, Nanoprint and Rising Lithography | |||
| 12D-4-1 | Thurs., 9:00-9:30, Nov. 12 | 2D or not 2D – the Challenge of 3D Topography (Invited) | H. Schift, Paul Scherrer Inst., Switzerland |
| BioMEMS, Lab on a Chip II | |||
| 11D-3-1 | Wed., 15:25-15:55, Nov. 11 | Micro and Nano Robotics and Biomedical Applications (Invited) | F. Arai, Nagoya Univ., Japan |
| 11D-2-1 | Wed., 13:30-14:00, Nov. 11 | Single Cell and Molecule Analysis by Micro- and Nanofluidic Devices (Invited) | N. Kaji 1,2 and Y. Baba 1,2, 1 Nagoya Univ. and 2 AIST, Japan |
| Microsystem Technology and MEMS I | |||
| 13D-8-1 | Fri., 9:00-9:30, Nov. 13 | MEMS_Based Information Communication Technology (Invited) | N. Miki 1,2, 1 Keio Univ. and 2 JST-PRESTO, Japan |
| Symposium A: Symposium on "Big Data" for Advanced Patterning | |||
| 11A-2-1 | Wed., 13:35-14:05, Nov. 11 | Potential of Open Science to Change the Framework of Manufacturing beyond Industry 4.0 (Invited) | K. Hayashi, National Institute of Science and Technology Policy, Japan |
| 11A-2-2 | Wed., 14:05-14:35, Nov. 11 | Technology and Design Co-Optimization for era of ''Big Data'' Low k1 Imaging (Pitch Scale) to Cost Scale (Invited) | J. Kye, Globalfoundries, USA |
| 11A-2-3 | Wed., 14:35-15:05, Nov. 11 | OPC: a Cross Road of Data Flows (Invited) | P.D. Bisschop, IMEC, Belgium |
| 11A-2-4 | Wed., 15:05-15:35, Nov. 11 | Lots of Data at Small Nodes (Invited) | W. Demmerle 1, T. Schmöller 1, H. Taoka 2 and D. Yim 2, 1 Synopsys, Germany and 2 Nihon Synopsys G.K., Japan |
| 13A-8-1 | Fri., 9:00-9:30, Nov. 13 | Holistic Lithography: a Data Driven Framework for Advanced Patterning Optimization (Invited) | S. Hunsche and Y. Zou, ASML/Brion Technologies, USA |
| 13A-8-2 | Fri., 9:30-10:00, Nov. 13 | Litho Turnkey Solution with Smart Data Management (Invited) | T. Matsuyama, H. Aoyama, S. Kudo, H. Kono, A. Sugiyama, P. Seemoon and K. Masaki, Nikon, Japan |
| 13A-9-1 | Fri., 10:15-10:45, Nov. 13 | Advanced Manufacturing Insight : A Framework for Big Data Analytics in Semiconductor Manufacturing (Invited) | B.E. Stine, R. Burch, K. Subramanian and L. Zhu, PDF Solutions, USA |
| 13A-9-2 | Fri., 10:45-11:15, Nov. 13 | Small Number, Big Data - Patterning Challenges for Nano Scale (Invited) | K. Nawa, Tokyo Electron, Japan |
| 13A-9-3 | Fri., 11:15-11:45, Nov. 13 | 'Big data'' in Semiconductor Metrology and Inspection: Why and How? (Invited) | H. Fukuda, Hitachi-Hightechnologies, Japan |
| Symposium B: Two Dimensional Nanomaterials | |||
| 12C-4-1 | Thurs., 9:00-9:30, Nov. 12 | Molecular Beam Epitaxy of Large Area Metal Dichalcogenide 2D Semiconductors and van der Waals Heterostructures on A1N(0001)/Si(111) and Sapphire Substrates (Invited) | A. Dimoulas, N.C.S.R. ''Demokritos'', Greece |
| 12C-5-1 | Thurs., 10:45-11:15, Nov. 12 | Bandgap Engineering and Substitutional Doping of Graphene Nanoribbons (Invited) | R.R. Cloke 1, T. Marangoni 1, G.D. Nguyen 1, T. Joshi 1, D.J. Rizzo 1, C. Bronner 1, T. Cao 1, S.G. Louise 1, M.F. Crommie 1,2 and F.R. Fischer 1,2, 1 Univ. of California Berkeley and 2 Lawrence Berkeley Natl. Lab., USA |
| Symposium C: Next Generation Lab on a Chip | |||
| 12A-4-1 | Thurs., 9:00-9:30, Nov. 12 | Quartz and Glass Analytical Microsystems (Invited) | C. Zhang, E. Freeman, G. Hatipoglu, H. Min, D. Gaddes and S. Tadigadapa, Pennsylvania State Univ., USA |
| 12A-4-2 | Thurs., 9:30-10:00, Nov. 12 | Micro/nano Fabrications for Biophysical Studies of Motor Proteins (Invited) | R. Yokokawa, Kyoto Univ., Japan |
| 12A-4-3 | Thurs., 10:00-10:30, Nov. 12 | Plant-on-a-Chip: Towards Improving Global Crop Productivity (Invited) | H. Hida, Kobe Univ., Japan |
| 12A-5-1 | Thurs., 10:45-11:15, Nov. 12 | Microstructured Meshes as Platforms for Cell Culture and Induction of Self-Assembly-Mediated Organoid Formation (Invited) | O. Kennedy 1, O. Kurosawa 1, S. Yamazaki 1, H. Oana 1, H. Kotera 2 and M. Washizu 1, 1 Univ. of Tokyo and 2 Kyoto Univ., Japan |
| 12A-5-2 | Thurs., 11:15-11:45, Nov. 12 | On-chip Electrical Lysis and Extraction of Cytoplasmic RNA and Genomic DNA from Single Cells (Invited) | H. Shintaku 1,2, K. Kuriyama 2 and J.G. Santiago 2, 1 Kyoto Univ., Japan and 2 Stanford Univ., USA |
| 12A-5-3 | Thurs., 11:45-12:15, Nov. 12 | On-Chip Direct Cytoplasmic Transfer between Live Single Cells (Invited) | K. Wada, RIKEN, Japan |