MNC 2013 Plenary and Invited Speakers
| Plenary | Strategy and Dreams of the Future Lithography (Plenary) | J.J.H. Chen, TSMC, Taiwan |
| Plenary |
STT-MRAM and NV-Logic for Low Power Systems (Plenary) |
T. Endoh, Tohoku Univ., Japan |
| Plenary | Metal Oxide Resistive Switching Memory (RRAM): Devices, Fabrication, and Self-Assembly Patterning for Random Logic and Memory Devices (SRAM, NAND, RRAM) (Plenary) | H. Yi, Y. Wu, Z. Zhang, H.-Y. Chen, S. Yu, H.-S. P. Wong, Stanford Univ., USA |
| 11 | Performance and Volume Introduction of ASML's NXE Platform (Invited) | Jan-Willem van Horst, ASML, The Netherland |
| 11 | Examination of Patterning Technologies down to sub-10nm Half Pitch (Invited) | S. Mimotogi, Toshiba Corp., Japan |
| 12 | Helium Ion Microscopy (HIM) Technology for Imaging, Characterization,and nano-Fabrication for nano-Device Materials and Structures (Invited) | S. Ogawa, AIST, Japan |
| 13 | Realizing sub-10 nm patterning through industrial and academic approaches (Invited) | I. Mori, T. Itani, S. Inoue and T. Azuma, EIDEC, Japan |
| 21 | Graphenetronics: from Growth to Applications (Invited) | P.-W. Chiu, National Tsing Hua Univ., Taiwan |
| 21 | Synthesis and Applications of Novel Low-Dimensional Nanomaterials (Invited) | H. Zhang, Nanyang Technological Univ., Singapore |
| 22 | Atomically Thin MoS2: a Two Dimensional Semiconductor beyond Graphene (Invited) | A. Castellanos Gomez, Delft Univ. of Technol., The Netherland |
| 23 | Phase Shift Optics for 3D Nanopatterning (Invited) | J.K. Hyun, J. Park, C. Ahn, E. Kim, D. Kim and S. Jeon, KAIST, Korea |
| 23 | Formation of One-dimensionally Self-Aligned Si-based Quantum Dots and Its Application to Light Emitting Diodes (Invited) | K. Makihara and S. Miyazaki, Nagoya Univ., Japan |
| 24 | Novel Functionalities Caused by Mechanical Strain in SnO2-based Materials (Invited) | M. Sakurai 1, K. Liu 1,2 and M. Aono1, 1 NIMS, Japan and 2 Chinese Academy of Sci., China |
| 25 | Molecular- and Polymer-based Electronic Devices on Rigid and Flexible Substrates (Invited) | T. Lee, Seoul National Univ., Korea |
| 25 | Organic Nanoparticles based p-n Junction for Full-spectrum-visible-light Photocatalyst (Invited) | K. Nagai 1, P. Arunachalam 1, S. Zhang 1, T. Iyoda 1 and T. Abe 2, Tokyo Inst. of Technol., Japan |
| 26 | MEMS-in-TEM for Characterization of Materials at the Nanoscale (Invited) | T. Ishida1 and H. Fujita2, 1 Tokyo Inst. of Technol. and 2 Univ. of Tokyo, Japan |
| 3 | Large-area Nanoimprint Lithography and Industrial Applications (Invited) | H. Lan 1,2, Y. Ding 2 and H. Liu 2, 1 Qingdao Technological Univ. and Xi'an Univ., China |
| 4 |
Cell-laden Microfiber for Bottom-up Tissue Engineering (Invited) |
S. Takeuchi, Univ. of Tokyo and JST-ERATO, Japan |
| 5 | Integrated Silicon MEMS Technology and Novel Functional Sensor Devices (Invited) | H. Takao, Kagawa Univ., Japan |
| Symposium A: Directed Self-Assembly (DSA) Processes and Modeling | An Overview of the Computational Requirements for a Full Chip Patterning solution using Directed Self Assembly (Invited) | K. Lai 1, M. Ozlem 1, J.W. Pitera 2, C.-C. Liu 3, M. Guillorn 4, H. Tsai 4 and J. Cheng 2, 1 IBM Semiconductor, 2 IBM Almaden Res. Ctr., 3 IBM Nanotechnol. Ctr. and 4 IBM Yorktown Res. Ctr., USA |
| Fast, Simplified and Predictive Modeling of DSA (Invited) (Invited) | K. Yoshimoto, K. Fukawatase, Y. Hori and T. Taniguchi, Kyoto Univ., Japan | |
| Computational Studies of Defectivity in Directed Self-Assembly (Invited) | T. Iwama 1,2, N. Laachi 2, K.T. Delaney 2, B. Kim 2, R. Bristol 3, D. Shykind 3, C.J. Weinheimer 3 and G.H. Fredrickson 2, 1 Asahi Kasei, Japan and 2 Univ. of California, USA | |
| Process Variatin Analysis for Graphoepitaxial Directed Self-assembly Lithography based on the Dissipative Particle Dynamics Method (Invited) | K. Kodera, Y. Naka, H. Kanai, S. Maeda, S. Tanaka, S. Mimotogi, Y. Seino, H. Yonemitsu, H. Sato and T. Azuma, Toshiba, Japan | |
| Review of Computational Simulations and Parametric Studies for DSA Process Development, DSA-friendly IC Design Exploration and Solution of the Inverse DSA Problem (Invited) |
A. Latypov, G. Garner, M. Preil, G. Schmid, W.-L. Wang, J. Xu and Y. Zou, GLOBALFOUNDRIES, USA | |
| Applicable simulation methods for DSA on OCTA system -From simulation technique to analysis method- (Invited) | H. Morita, AIST, Japan | |
| Symposium B: Directed Nanostructure Science | Single-nanodot Arrays and Single-nanohalf-pitch Lines Formed using PS-PDMS Self-assembly and Electron Beam Drawing (Invited) | S. Hosaka, M. Huda, H. Zhang, T. Komori, Y. Yin, Gunma Univ., JapanGunma Univ., Japan |
| Improvement of Electrical Transport in Directed-assembled Polymeric Nanowires (Invited) | Y. Wakayama, NIMS, Japan | |
| Fabrication and characterization of metallic nanostructures with single nanometer-sized gap (Invited) | K. Ueno, Hokkaido Univ. and JST-PRESTO, Japan | |
| Electroless Plated Nanogap Electrodes and Their Device Applications (Invited) | Y. Majima, Tokyo Inst. of Technol., JST-CREST, Japan and Sunchon Natl. Univ., Korea | |
| Directed Self-assembly of Block Copolymers (Invited) | M. Takenaka, Kyoto Univ., Japan | |
| A master-mold fabrication by EB lithography followed by nanoimprinting and self-aligned double-patterning (Invited) | T. Watanabe, K. Suzuki, H. Iyama, T. Kagatsume, S. Kishimoto, T. Sato and H. Kobayashi, HOYA, Japan | |
| Moiré Analysis of Block Copolymer Self-Assembly (Invited) | S. Sakurai, H. Ohnogi, T. Harada, S. Sasaki and T. Isshiki, Kyoto Inst. of Technol., Japan | |
| Orientation and Position Control of DSA Lithography for Bit-patterned Media (Invited) | R. Yamamoto, M. Kanamaru, K. Sugawara, N. Sasao, Y. Ootera, T. Okino, N. Kihara, Y. Kamata and A. Kikitsu, Toshiba, Japan |