| MNC 2012 Plenary Speakers and Invitetd Speakers | |||
| Session | Session No | Paper Title | Author and Affiliation |
| Plenary | 31A-1-1 | Big Data Transforms Our Society (Plenary) |
M. Kitsuregawa, Univ. of Tokyo, Japan |
| Plenary | 31A-1-2 | EUV Lithography : Getting Ready for Insertion ? (Plenary) | K. Ronse, IMEC, Belgium |
| Plenary | 31A-1-3 | Directed assembly of block copolymers for applications in lithography and manufacturing (Plenary) | P. Rincon 1,2, H. Suh 1, J.I. Lee 3, M. Bedolla 3, G. Liu 3, C.C. Liu 3, L. Wan 4, R. Ruiz 4, R. Gronheid 2, H.Yoshida 5, P. Nealey 1, 1 Univ. of Chicago, 2 IMEC, 3 Univ. of Wisconsin, 4 HGST, USA and 5 Hitachi, Japan |
| Symp. B: Nanoimprint I | 31A-2-1 | Progress in NaPANIL Project (Invited) | J. Ahopelto, VTT Technical Res. Centre, Finland |
| Symp. B: Nanoimprint I | 31A-2-2 | Nano-imprint based patterning process for high brightness LEDs (Invited) | J. Cho, K. Byeon and H. Lee, Korea Univ., Korea |
| Symp. B: Nanoimprint I | 31A-2-3 | Development of Micro/Nano Imprint with Bulk Metallic Glasses (Invited) | F.-Y. Chang and J. P. Chu, Natl. Taiwan Univ. of Sci. and Technol., Taiwan |
| Symp. B: Nanoimprint II | 31A-3-1 | Progress of Jet and Flash Imprint Lithography for Volume Manufacturing (Invited) | H. Wada, Molecular Imprints, Japan |
| Symp. B: Nanoimprint II | 31A-3-2 | Repairable Nanoimprinted Structures (Invited) | H.Y. Low, Institute of Materials Research and Engineering, Singapore |
| Symp. B: Nanoimprint II | 31A-3-3 | Applying Directed Self-assembling and Nanoimprint lithography for Fabrication of Bit Patterned Media (Invited) | N. Kihara, Y. Ootera, R. Yamamoto, N. Sasao, T. Shimada, H. Hieda, T. Okino, Y. Kamata, and A. Kikitsu, Toshiba, Japan |
| Nano Materiasl I | 31C-2-1 | 2D Oxide Nanosheets: Future High-k Dielectrics from Nano Building Blocks (Invited) | M. Osada 1,2 and T. Sasaki 1,2, 1 NIMS and 2 JST-CREST, Japan |
| Graphen I | 31D-2-1 | Graphene for Future Electronics (Invited) | J.-H. Ahn, Sungkyunkwan Univ., Korea |
| Symp. A: Extrem Ultraviolet Lithography & Extentions I | 1A-4-1 | Recent Activities on EUVL in NewSUBARU (Invited) | H. Kinoshita 1,2 T. Watanabe 1,2 and T. Harada 1,2, 1 Univ. of Hyogo and 2 JST-CREST, Japan |
| Symp. A: Extrem Ultraviolet Lithography & Extentions I | 1A-4-2 | Current Progress of Advanced EUVL Development in EIDEC (Invited) | S. Inoue, H. Watanabe, T. Itani, and I. Mori, EIDEC, Japan |
| Symp. A: Extrem Ultraviolet Lithography & Extentions I | 1A-4-3 | S. Sivakumar, Intel, USA | |
| Symp. A: Extream Ultraviolet Lithography & Extentions II | 1A-5-1 | High CE Technology EUV Source for HVM (Invited) | H. Mizoguchi and T. Saitou, Gigaphoton, Japan |
| Symp. A: Extream Ultraviolet Lithography & Extentions II | 1A-5-2 | Resist materials for EUV lithography (Invited) | S. Tarutani, Fujifilm, Japan |
| Symp. A: Extream Ultraviolet Lithography & Extentions II | 1A-5-3 | Challenges of EB Writer for EUV Mask (Invited) | S. Yoshitake, NuFlare Technol., Japan |
| Lithography and Metrology | 1A-6-1 | Plasmon-Enhanced Photochemical Reactions on Nano-Engineered Gold Particles (Invited) | K. Ueno, Hokkaido Univ. and JST-PRESTO, Japan |
| Material & Process for MEMS I | 1B-5-1 | Experimental Nano Mechanics for Silicon & Carbon Nanomaterials Using MEMS Technology (Invited) | Y. Isono, Kobe Univ., Japan |
| Material & Process for MEMS II | 1B-6-1 | Micromachining Techniques for Wider Variety of 3D Devices (Invited) | M. Sasaki and S. Kumagai, Toyota Technological Inst., Japan |
| Nanoimprint, Nanoprint and Rising Lithography I | 1C-4-1 | Continuous and high-throughput patterning techniques and their applications in photonics and transparent conductors (Invited) | L.J. Guo, S.H. Ahn, J.G. Ok and M.K. Kwak, Univ. of Micigan, USA |
| Functional Nanodevice | 1C-6-1 | Single Atom Electronics For Computing (Invited) | M.Y. Simmons, Univ. of New South Wales, Australia |
| Nano-Tool | 1D-6-1 | High-speed Robotic Tools integrated with Microfluidic Chip for Biomedical Innovation (Invited) | F. Arai, Nagoya Univ., Japan |
| Symp. C: Directed Self Assembly I | 2A-8-1 | Self-Assembled Lithography and Potential Applications to Electronic Devices (Invited) | K. Asakawa, A. Hieno, S. Hattori, H. Nakamura, T. Nakanishi, R. Kitagawa and A. Fujimoto |
| Symp. C: Directed Self Assembly I | 2A-8-2 | Chemical Epitaxy of Highly Segregating Block Copolymers for Single-digit Nano Patterning (Invited) | H. Yoshida, Hitachi, Japan |
| Symp. C: Directed Self Assembly I | 2A-8-3 | Directed Self-Assembly for Functional Carbon Nanostructures (Invited) | S.O. Kim, KAIST, Korea |
| Symp. C: Directed Self Assembly II | 2A-9-1 | A Lab-on-Chip System for Rapid SNP Diagnostics from Human Blood (Invited) |
J. Cheng 1, J. Pitera 1, G. Doerk 1, C.-C. Liu 1, M. Tjio 1, C. Rettner 1, H. Troung 1, H. Tsai 2, K. Lai 3, M. Guillorn 2 and D. Sanders 1, 1 IBM Almaden Res. Ctr., 2 IBM Watson Res. Ctr. and 3 IBM Semicon. Res. and Develop. Ctr., USA |
| Symp. C: Directed Self Assembly II | 2A-9-2 | Lithography Processes using Directed Self-Assembly (Invited) | M. Muramatsu 1, K. Tanouchi 1, M. Tomita 1, T. Kitano 1 and S. Nagahara 2, 1 Tokyo Electron Kyushu and 2 Tokyo Electron, Japan |
| Symp. C: Directed Self Assembly II | 2A-9-3 | Block Copolymer Orientation Control using a Top-Coat Surface Treatment (Invited) | T. Seshimo, C.M. Baates, M.J. Maher, W.J. Durand, J.D. Cushen, L.M. Dean, G. Blachut, C.J. Ellison, C.G. Willson, Univ. of Texas at Austin, USA |
| Resist and DSA Materials and Processing | 2A-10-1 | EUV Resist Materials and Process Development for 16nm Half Pitch (Invited) | M. Shimizu and T. Kimura, JSR, Japan |
| BioMEMS, Lab on a Chip II | 2B-9-1 | A Lab-on-Chip System for Rapid SNP Diagnostics from Human Blood (Invited) | I. Yamashita and P. Fiorini 2, 1 Panasonic, Japan and 2 IMEC, Belgium I. Yamashita, Panasonic, Japan --> M. Hiraoka, Panasonic, Japan |
| BioMEMS, Lab on a Chip III | 2B-10-1 | Paper-based ELISA for Detecting Various Diseases (Invited) | C.-M. Cheng, National Tsing Hua Univ., Taiwan |
| Nanofabrication III | 2D-10-1 | Integration of III-V Nanowires on Si and Device Applications (Invited) | K. Tomioka 1,2, M. Yoshimura 1 and T. Fukui 1, 1 Hokkaido Univ. and 2 JST-PRESTO, Japan |
| Nanofabrication II | 2D-9-1 | Nanopore Based Ionic Field Effect transistor for DNA Manipulation (Invited) | M.-H. Lee, K.-B. Park, D.-J. Lee, H.-M. Kim and K.-B. Kim, Seoul Natl. Univ., Korea |