MNC 2009 Session Schedule | ||
Monday, November 16, 2009 | ||
Room A (3F) | ||
13:00-17:50
MNC 2009 Technical Seiminar in Japanese MNC 2009 技術セミナー北大GCOE企画「ナノ・バイオ・ITの融合」「ナノインプリント技術」 |
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Room D-1 (2F) | ||
18:00-20:00 MNC 2009 Get Together Party (Free for every participants) |
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Tuesday, November 17 | ||
Room P (3F) | ||
17P-1:Opening Session 9:30-9:50: Opening Remark and 2008 Award Presentation 9:50-10:30 S. Wurm (SEMATEC, USA) 10:30-11:10 A. Neureuter (Univ. of CA, Berkeley, USA) 11:10-11:50 T. Fukui (Hokkaido Univ.) |
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Lunch | ||
Room A (3F) | Room B (3F) | Room C (3F) |
17A-2: 13:30-15:20 DUV, EUV Lithography and Metrology |
17B-2: 13:30-15:10 Symp. B. Graphene: Growth & Characterization I |
17C-2: 13:30-15:20 Nanoimprint, Nanoprint and Rising Lithography I |
17A-2: 15:20-15:35, Author's Interview | ||
Room D-1 and D-2 (2F) | ||
Coffee Break | ||
Room A (3F) | Room B (3F) | Room C (3F) |
17A-3: 15:40-17:50 Bio MEMS, Lab on a Chip |
17B-3:
15:30-17:10 Symp. B. Graphene: Growth & Characterization II |
17C-3: 15:40-17:30 Nanoimprint, Nanoprint and Rising Lithography II |
17A-3: 17:50-18:05, Author's Interview | 17B-2, 3: 17:10-17:25, Author's Interview | 17C-2, 3: 17:30-17:45, Author's Interview |
Wednesday, November 18 | ||
Room A (3F) | Room B (3F) | Room C (3F) |
18A-4: 9:00-10:40 Dr. Hiroshi Ito Tribute Symp. A. Computational Lithography I |
18B-4: 9:00-10:30 Nanomaterials I |
18C-4: 9:00-10:40 Microsystem Technology and MEMS I |
Room D-1 and D-2 (2F) | ||
Coffee Break | ||
Room A (3F) | Room B (3F) | Room C (3F) |
18A-5: 11:00-12:40 Symp. A. Computational Lithography II |
18B-5: 11:00-12:50 Nanomaterials II |
18C-5: 11:00-12:40 Microsystem Technology and MEMS II |
18C-4, 5: 12:40-12:55, Author's Interview | ||
Lunch | ||
18A-6: 14:00-15:30 Symp. A. Computational Lithography III |
18B-6:
13:50-15:30 Nanomaterials III |
18C-6: 13:35-15:45 NanoTool |
18A-4, 5, 6: 15:30-15:45, Author's Interview | 18B-4, 5, 6: 15:30-15:45, Author's Interview | 18C-6: 15:45-16:00, Author's Interview |
Room D-1 and D-2 (2F) | ||
18D-7: 16:00-18:00 Poster Session I DUV, EUV Lithography and Metrology, Electron- and Ion-Beam Lithography Resist Materials and Processing, Nanodevices, Nanofabrication, Nanomaterials Nano-Tool, Nanoimprint, Nanoprint and Rising Lithography, Bio MEMS, Lab on a Chip Microsystem Technology and MEMS |
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Room A (3F) | ||
18:15-20:15 Banquet |
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Thursday, November 19 | ||
Room A (3F) | Room B (3F) | Room C (3F) |
19A-8: 9:00-10:50 Nano-Carbon Devices |
19B-8: 9:00-10:40 Nanofabrication I |
19C-8: 9:00-10:50 Electron- and Ion-Beam Lithography |
19C-8: 10:50-11:05, Author's Interview | ||
Room D-1 and D-2 (2F) | ||
Coffee Break | ||
Room A (3F) | Room B (3F) | Room C (3F) |
19A-9: 11:10-12:50 Nanowire Devices |
19B-9:
11:00-12:50 Nanofabrication II |
19C-9: 11:10-13:00 Resist Materials and Processing I |
19A-8, 9: 12:50-13:05, Author's Interview | 19B-8, 9: 12:50-13:05, Author's Interview | |
Lunch | ||
Room D-1 and D-2 (2F) | 19C-10: 14:10-16:10 Resist Materials and Processing II |
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19D-10: 14:10-16:10 Poster Session II (114件) Nanodevices, Nanofabrication, Nanomaterials,Nano-Tool Nanoimprint, Nanoprint and Rising Lithography, Bio MEMS, Lab on a Chip Microsystem Technology and MEMS |
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19C-9, 10: 16:10-16:25, Author's Interview |