| PLENARY SPEAKERS | |
| Lithography for the 22 nm Half-Pitch and Beyond | |
| Stefan Wurm (SEMATECH) | |
| Modeling Optical Lithography Physics | |
| Andy Neureuter (Univ. of CA, Berkeley) | |
| III-V Semiconductor Nanowires: From Growth to Device Applications | |
| Takashi Fukui (Hokkaido Univ.) | |
| INVITED SPEAKERS | |
| DUV, EUV Lithography and Metrology Session | |
| Current Status and Challenges of Optical Lithography | |
| Takayuki Uchiyama (NEC Electronics) | |
| Electron and Ion Beam Lithography Session | |
| Projection Charged Particle Nanolithography and Nanopatterning | |
| Hans Loeschner (IMS Nanofabrication) | |
| Resist Materials and Processing Session | |
| Non-Chemically Amplified Negative Resist for EUV Lithography | |
| Masamitsu Shirai (Osaka Pref. Univ.) | |
| Nanodevice Session | |
| GHz Graphene Transistor for RF Application | |
| Yu-Min Lin (IBM) | |
| Nanofabrication Session | |
| Development of Nanogap Switching Devices for Memories | |
| Masatoshi Ono (Funai Electric Adv. Appl. Tech. Res. Inst.) | |
| Nanomaterials Session | |
| Design of Photo-controllable Magnetic Materials | |
| Yasuaki Einaga (Keio Univ.) | |
| Semiconductor Quantum Dots in Metallic Nanostructures | |
| Ikuo Suemune (Hokkaido Univ.) | |
| Nano-Tool Session | |
| Sorting and Functional Analysis of Single Biomolecules by Micro- and Nano-Devices | |
| Takashi Funatsu (Univ. of Tokyo) | |
| Nanoimprint, Nanoprint and Rising Lithography Session | |
| Nanopatterning of 3-Dimensional Nanosurfaces Based on Nanoimprint Lithography. | |
| Helmut Schift (Paul Scherrer Inst.) | |
| Memristors and Memristor-Based Circuits Enabled by Nanoimprint Lithography | |
| Qiangfei Xia (HP) | |
| Bio MEMS, Lab on a Chip | |
| Small''Tools for Neuroscience and Stem Cell Research: Controlling Cellular Microenvironments with Microfluidics | |
| Noo Li Jeon (Soul National Univ.) | |
| Symposium A. Computational Lithography | |
| Lowering of Lithography k1 by Computational Scaling Technology | |
| Kafai Lai (IBM) | |
| Modeling of Mask and Wafer Side Scattering Effects in Advanced Optical and EUV-Lithography | |
| Andreas Erdmann (Fraunhofer) | |
| A Study of Source Mask Optimization for Future Optical Lithography | |
| Tomoyuki Matsuyama (Nikon) | |
| Optical lithography extension by Computational Lithography | |
| Tadahiro Takigawa (Brion Technologies) | |
| Computational Lithography and its Applications Implemented through Level Set Methods based Inverse Lithography Technology (ILT) Framework | |
| Linyong Leo Pang (Luminescent Technologies) | |
| Use of Physics-Based Resist Models to Predict Real-World Lithographic Effects | |
| Mark D. Smith (KLA-Tencor) | |
| The Role of Physical Lithography Simulation in Manufacturing Flows | |
| Wolfgang Demmerle (Synopsys) | |
| Dr. Hiroshi Ito Toribute | |
| Seiichi Tagawa (Osaka Univ.) | |
| Symosium B. Graphene: Growth & Characterization | |
| Structure and Electronic Properties of Epitaxial Graphene Grown on SiC Studied by Surface Electron Microscopy | |
| Hiroki Hibino (NTT) | |
| Heteroepitaxial Graphene on Silicon: Process&Device Technology for Ultra-high Frequency Devices | |
| Taiichi Otsuji(Tohoku Univ.) | |
| Electrical Properties of CVD-grown Multi-layer Graphene for Carbon-based Interconnects | |
| Mizuhisa Nihei (Fujitsu) | |
| Epitaxial Graphene on SiC: Structure and Electronic Properties | |
| Ulrich Starke (Max-Planck-Institut) | |